Cecilia Y. Mak

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Method for depositing porous films
- Patent number 7,220,685
- Issue date May 22, 2007
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing porous films
- Patent number 7,132,374
- Issue date Nov 7, 2006
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical integrated circuits (ICs)
- Patent number 7,087,179
- Issue date Aug 8, 2006
- Applied Materials, Inc.
- Cecilia Y. Mak
- G02 - OPTICS
Information Patent Grant
Method for plasma etching a dielectric layer
- Patent number 7,056,830
- Issue date Jun 6, 2006
- Applied Materials, Inc.
- Walter R. Merry
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Method for depositing porous films
- Publication number 20060252278
- Publication date Nov 9, 2006
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for depositing porous films
- Publication number 20060040507
- Publication date Feb 23, 2006
- Cecilia Y. Mak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for control of processing conditions in plasma pr...
- Publication number 20050220984
- Publication date Oct 6, 2005
- APPLIED MATERIALS INC., a Delaware corporation
- Sheng Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL INTEGRATED CIRCUITS (ICS)
- Publication number 20050115921
- Publication date Jun 2, 2005
- Cecilia Y. Mak
- G02 - OPTICS
Information Patent Application
Method for plasma etching a dielectric layer
- Publication number 20050048789
- Publication date Mar 3, 2005
- Walter R. Merry
- H01 - BASIC ELECTRIC ELEMENTS