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Chitoshi Kawaguchi
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Souraku, JP
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last 30 patents
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Patent Grant
Process for exposing a photosensitive resin composition to light
Patent number
5,330,882
Issue date
Jul 19, 1994
Nippon Paint Co., Ltd.
Chitoshi Kawaguchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polyether acrylamide and active energy ray curable resin composition
Patent number
5,317,080
Issue date
May 31, 1994
Ajinomto Co., Inc.
Seiji Arimatsu
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive resin composition
Patent number
5,221,589
Issue date
Jun 22, 1993
Nippon Paint Co., Ltd.
Osamu Nanba
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Water developable photosensitive resin composition, and resin or pr...
Patent number
5,100,763
Issue date
Mar 31, 1992
Nippon Paint Co., Ltd.
Koichi Kimoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Water-developable photosensitive resin composition and resin or pri...
Patent number
4,935,333
Issue date
Jun 19, 1990
Nippon Paint Co., Ltd.
Koichi Kimoto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY