Chris E. Barns

Person

Tigard, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology system
- Patent number 12,146,736
- Issue date Nov 19, 2024
- INDUSTRIAL METROLOGY SOLUTIONS LLC
- Derek Aqui
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system
- Patent number 11,486,689
- Issue date Nov 1, 2022
- DWFritz Automation, Inc.
- Derek Aqui
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system
- Patent number 10,598,521
- Issue date Mar 24, 2020
- DWFritz Automation, Inc.
- Derek Aqui
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for precision insertion
- Patent number 9,190,796
- Issue date Nov 17, 2015
- DWFritz Automation Inc.
- Christopher E. Barns
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Complementary metal oxide semiconductor integrated circuit using ra...
- Patent number 8,148,786
- Issue date Apr 3, 2012
- Intel Corporation
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS device with metal and silicide gate electrodes and a method fo...
- Patent number 7,883,951
- Issue date Feb 8, 2011
- Intel Corporation
- Justin K. Brask
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Preventing silicide formation at the gate electrode in a replacemen...
- Patent number 7,754,552
- Issue date Jul 13, 2010
- Intel Corporation
- Chris E. Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a semiconductor device having a high-k dielectric...
- Patent number 7,671,471
- Issue date Mar 2, 2010
- Intel Corporation
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Introducing nanotubes in trenches and structures formed thereby
- Patent number 7,666,465
- Issue date Feb 23, 2010
- Intel Corporation
- Paul B. Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Complementary metal oxide semiconductor integrated circuit using ra...
- Patent number 7,569,443
- Issue date Aug 4, 2009
- Intel Corporation
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facilitating removal of sacrificial layers via implantation to form...
- Patent number 7,422,936
- Issue date Sep 9, 2008
- Intel Corporation
- Chris E. Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making semiconductor device having a high-k gate dielect...
- Patent number 7,355,281
- Issue date Apr 8, 2008
- Intel Corporation
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrating n-type and p-type metal gate transistors
- Patent number 7,316,949
- Issue date Jan 8, 2008
- Intel Corporation
- Mark Doczy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for selective deposition
- Patent number 7,294,931
- Issue date Nov 13, 2007
- Intel Corporation
- Chris Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch stop and hard mask film property matching to enable improved r...
- Patent number 7,271,045
- Issue date Sep 18, 2007
- Intel Corporation
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively converted inter-layer dielectric
- Patent number 7,239,019
- Issue date Jul 3, 2007
- Intel Corporation
- Jihperng Leu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for selective deposition
- Patent number 7,238,610
- Issue date Jul 3, 2007
- Intel Corporation
- Chris Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a semiconductor device with a metal gate electrod...
- Patent number 7,220,635
- Issue date May 22, 2007
- Intel Corporation
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for integrating replacement metal gate structures
- Patent number 7,217,611
- Issue date May 15, 2007
- Intel Corporation
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement gate process for making a semiconductor device that inc...
- Patent number 7,208,361
- Issue date Apr 24, 2007
- Intel Corporation
- Uday Shah
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate polishing methods and equipment
- Patent number 7,205,236
- Issue date Apr 17, 2007
- Intel Corporation
- Paul B. Fischer
- B24 - GRINDING POLISHING
Information Patent Grant
Method for making a semiconductor device that includes a metal gate...
- Patent number 7,183,184
- Issue date Feb 27, 2007
- Intel Corporation
- Mark L. Doczy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Poly open polish process
- Patent number 7,166,506
- Issue date Jan 23, 2007
- Intel Corporation
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a semiconductor device having a high-k gate diele...
- Patent number 7,157,378
- Issue date Jan 2, 2007
- Intel Corporation
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CMOS device with metal and silicide gate electrodes and a method fo...
- Patent number 7,153,734
- Issue date Dec 26, 2006
- Intel Corporation
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making a semiconductor device having a high-k gate diele...
- Patent number 7,153,784
- Issue date Dec 26, 2006
- Intel Corporation
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polysilicon opening polish
- Patent number 7,144,816
- Issue date Dec 5, 2006
- Intel Corporation
- Chris E. Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Planarizing a semiconductor structure to form replacement metal gates
- Patent number 7,138,323
- Issue date Nov 21, 2006
- Intel Corporation
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer metal gate electrode
- Patent number 7,126,199
- Issue date Oct 24, 2006
- Intel Corporation
- Mark L. Doczy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sacrificial dielectric planarization layer
- Patent number 7,109,557
- Issue date Sep 19, 2006
- Intel Corporation
- Chris E. Barns
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRODE AND SEPARATOR STACKING MACHINES FOR HIGH-SPEED BATTERY PR...
- Publication number 20240234823
- Publication date Jul 11, 2024
- DWFritz Automation, LLC
- Derek Graham AQUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE AND SEPARATOR STACKING MACHINES FOR HIGH-SPEED BATTERY PR...
- Publication number 20240136591
- Publication date Apr 25, 2024
- DWFritz Automation, LLC
- Derek Graham AQUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-CONTACT OPTICAL MEASUREMENT DEVICES AND EXCHANGEABLE OPTICAL PR...
- Publication number 20220373323
- Publication date Nov 24, 2022
- DWFritz Automation, Inc.
- Shawn A. BOLING
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM
- Publication number 20220316851
- Publication date Oct 6, 2022
- DWFritz Automation, Inc.
- Derek Aqui
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SYSTEM
- Publication number 20200209021
- Publication date Jul 2, 2020
- DWFritz Automation, Inc.
- Derek Aqui
- G01 - MEASURING TESTING
Information Patent Application
MICRO ASSEMBLY USING MICRO MULTI-TOOLS
- Publication number 20190351516
- Publication date Nov 21, 2019
- DWFritz Automation, Inc.
- Brian P. Phillips
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHODS AND APPARATUS FOR PRECISION INSERTION
- Publication number 20140041215
- Publication date Feb 13, 2014
- DWFritz Automation Inc.
- Christopher E. Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS DEVICE WITH METAL AND SILICIDE GATE ELECTRODES AND A METHOD FO...
- Publication number 20090280608
- Publication date Nov 12, 2009
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Complementary Metal Oxide Semiconductor Integrated Circuit Using Ra...
- Publication number 20090261391
- Publication date Oct 22, 2009
- Jack KAVALIEROS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF LINE EDGE ROUGHNESS BY CHEMICAL MECHANICAL POLISHING
- Publication number 20080160256
- Publication date Jul 3, 2008
- Robert L. Bristol
- B24 - GRINDING POLISHING
Information Patent Application
METHOD FOR MAKING A SEMICONDUCTOR DEVICE HAVING A HIGH-K DIELECTRIC...
- Publication number 20080135952
- Publication date Jun 12, 2008
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thin III-V semiconductor films with high electron mobility
- Publication number 20080132081
- Publication date Jun 5, 2008
- Mohamad A. Shaheen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS DEVICE WITH METAL AND SILICIDE GATE ELECTRODES AND A METHOD FO...
- Publication number 20080124857
- Publication date May 29, 2008
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etch stop and hard mask film property matching to enable improved r...
- Publication number 20070077765
- Publication date Apr 5, 2007
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Planarizing a semiconductor structure to form replacement metal gates
- Publication number 20070037372
- Publication date Feb 15, 2007
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Complementary metal oxide semiconductor integrated circuit using ra...
- Publication number 20060286729
- Publication date Dec 21, 2006
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate polishing methods and equipment
- Publication number 20060272773
- Publication date Dec 7, 2006
- Paul B. Fischer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Replacement gate flow facilitating high yield and incorporation of...
- Publication number 20060237804
- Publication date Oct 26, 2006
- Robert S. Chau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for making a semiconductor device with a metal gate electrod...
- Publication number 20060183277
- Publication date Aug 17, 2006
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for making a semiconductor device having a high-k gate diele...
- Publication number 20060180878
- Publication date Aug 17, 2006
- Justin K. Brask
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Introducing nanotubes in trenches and structures formed thereby
- Publication number 20060141222
- Publication date Jun 29, 2006
- Paul B. Fischer
- B82 - NANO-TECHNOLOGY
Information Patent Application
Poly open polish process
- Publication number 20060134916
- Publication date Jun 22, 2006
- Matthew J. Prince
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Novel slurry for chemical mechanical polishing of metals
- Publication number 20060099817
- Publication date May 11, 2006
- Intel Corporation
- A. Daniel Feller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Novel slurry for chemical mechanical polishing of metals
- Publication number 20060097347
- Publication date May 11, 2006
- Intel Corporation
- A. Daniel Feller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metal gate electrode semiconductor device
- Publication number 20060065939
- Publication date Mar 30, 2006
- Mark L. Doczy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor substrate polishing methods and equipment
- Publication number 20060065633
- Publication date Mar 30, 2006
- Paul B. Fischer
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Facilitating removal of sacrificial layers to form replacement meta...
- Publication number 20060046523
- Publication date Mar 2, 2006
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Facilitating removal of sacrificial layers via implantation to form...
- Publication number 20060046448
- Publication date Mar 2, 2006
- Chris E. Barns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrating n-type and p-type metal gate transistors
- Publication number 20060030104
- Publication date Feb 9, 2006
- Mark Doczy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Planarizing a semiconductor structure to form replacement metal gates
- Publication number 20060022277
- Publication date Feb 2, 2006
- Jack Kavalieros
- H01 - BASIC ELECTRIC ELEMENTS

Chris E. Barns

Person

Patents Grantslast 30 patents

Metrology system

Metrology system

Metrology system

Apparatus for precision insertion

Complementary metal oxide semiconductor integrated circuit using ra...

CMOS device with metal and silicide gate electrodes and a method fo...

Preventing silicide formation at the gate electrode in a replacemen...

Method for making a semiconductor device having a high-k dielectric...

Introducing nanotubes in trenches and structures formed thereby

Complementary metal oxide semiconductor integrated circuit using ra...

Facilitating removal of sacrificial layers via implantation to form...

Method for making semiconductor device having a high-k gate dielect...

Integrating n-type and p-type metal gate transistors

Method and apparatus for selective deposition

Etch stop and hard mask film property matching to enable improved r...

Selectively converted inter-layer dielectric

Method and apparatus for selective deposition

Method for making a semiconductor device with a metal gate electrod...

Methods for integrating replacement metal gate structures

Replacement gate process for making a semiconductor device that inc...

Semiconductor substrate polishing methods and equipment

Method for making a semiconductor device that includes a metal gate...

Poly open polish process

Method for making a semiconductor device having a high-k gate diele...

CMOS device with metal and silicide gate electrodes and a method fo...

Method for making a semiconductor device having a high-k gate diele...

Polysilicon opening polish

Planarizing a semiconductor structure to form replacement metal gates

Multilayer metal gate electrode

Sacrificial dielectric planarization layer

Patents Applicationslast 30 patents

ELECTRODE AND SEPARATOR STACKING MACHINES FOR HIGH-SPEED BATTERY PR...

ELECTRODE AND SEPARATOR STACKING MACHINES FOR HIGH-SPEED BATTERY PR...

NON-CONTACT OPTICAL MEASUREMENT DEVICES AND EXCHANGEABLE OPTICAL PR...

METROLOGY SYSTEM

METROLOGY SYSTEM

MICRO ASSEMBLY USING MICRO MULTI-TOOLS

METHODS AND APPARATUS FOR PRECISION INSERTION

CMOS DEVICE WITH METAL AND SILICIDE GATE ELECTRODES AND A METHOD FO...

Complementary Metal Oxide Semiconductor Integrated Circuit Using Ra...

REDUCTION OF LINE EDGE ROUGHNESS BY CHEMICAL MECHANICAL POLISHING

METHOD FOR MAKING A SEMICONDUCTOR DEVICE HAVING A HIGH-K DIELECTRIC...

Thin III-V semiconductor films with high electron mobility

CMOS DEVICE WITH METAL AND SILICIDE GATE ELECTRODES AND A METHOD FO...

Etch stop and hard mask film property matching to enable improved r...

Planarizing a semiconductor structure to form replacement metal gates

Complementary metal oxide semiconductor integrated circuit using ra...

Semiconductor substrate polishing methods and equipment

Replacement gate flow facilitating high yield and incorporation of...

Method for making a semiconductor device with a metal gate electrod...

Method for making a semiconductor device having a high-k gate diele...

Introducing nanotubes in trenches and structures formed thereby

Poly open polish process

Novel slurry for chemical mechanical polishing of metals

Novel slurry for chemical mechanical polishing of metals

Metal gate electrode semiconductor device

Semiconductor substrate polishing methods and equipment

Facilitating removal of sacrificial layers to form replacement meta...

Facilitating removal of sacrificial layers via implantation to form...

Integrating n-type and p-type metal gate transistors

Planarizing a semiconductor structure to form replacement metal gates