Christoph Zaczek

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for producing a mirror of a microlithographic projection exp...
- Patent number 12,117,731
- Issue date Oct 15, 2024
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element
- Patent number 11,520,087
- Issue date Dec 6, 2022
- Carl Zeiss SMT GmbH
- Konstantin Forcht
- G02 - OPTICS
Information Patent Grant
Optical element and method of making an optical element
- Patent number 11,474,281
- Issue date Oct 18, 2022
- Carl Zeiss Meditec AG
- Christian Beder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical element and method of making an optical element
- Patent number 10,698,135
- Issue date Jun 30, 2020
- Carl Zeiss Meditec AG
- Christian Beder
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,578,976
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
Catadioptric projection objective including a reflective optical co...
- Patent number 10,146,137
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Grant
EUV mirror and optical system comprising EUV mirror
- Patent number 9,915,876
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Thomas Schicketanz
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element with an antireflection coating, projection objectiv...
- Patent number 9,684,252
- Issue date Jun 20, 2017
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for the EUV wavelength range, substrate for such a mirror, p...
- Patent number 9,494,718
- Issue date Nov 15, 2016
- Carl Zeiss SMT GmbH
- Stephan Muellender
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective optical imaging system
- Patent number 9,188,771
- Issue date Nov 17, 2015
- Carl Zeiss SMT GmbH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Grant
Projection exposure system and projection exposure method
- Patent number 9,146,475
- Issue date Sep 29, 2015
- Carl Zeiss SMT GmbH
- Paul Gräupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for EUV lithography with a charged-particle source
- Patent number 8,546,776
- Issue date Oct 1, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element for reflection of UV radiation, method for manufact...
- Patent number 8,488,103
- Issue date Jul 16, 2013
- Carl Zeiss SMT GmbH
- Alexandra Pazidis
- G02 - OPTICS
Information Patent Grant
Method of processing an optical element and an optical element, in...
- Patent number 8,435,726
- Issue date May 7, 2013
- Carl Zeiss SMT GmbH
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element with an antireflection coating, projection objectiv...
- Patent number 8,049,964
- Issue date Nov 1, 2011
- Carl Zeiss SMT GmbH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Grant
Devices and methods for inspecting optical elements with a view to...
- Patent number 7,659,976
- Issue date Feb 9, 2010
- Carl Zeiss SMT AG
- Julian Kaller
- G01 - MEASURING TESTING
Information Patent Grant
Reflective optical element for ultraviolet radiation, projection op...
- Patent number 7,583,443
- Issue date Sep 1, 2009
- Carl Zeiss SMT AG
- Christoph Zaczek
- G02 - OPTICS
Information Patent Grant
Microlithographic exposure apparatus
- Patent number 7,518,797
- Issue date Apr 14, 2009
- Carl Zeiss SMT AG
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective for immersion lithography
- Patent number 7,460,206
- Issue date Dec 2, 2008
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Objective with crystal lenses
- Patent number 7,239,447
- Issue date Jul 3, 2007
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G02 - OPTICS
Information Patent Grant
Optical component and coating system for coating substrates for opt...
- Patent number 7,093,937
- Issue date Aug 22, 2006
- Carl Zeiss SMT AG
- Harry Bauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and coating system for coating substrates for optical compon...
- Patent number 6,863,398
- Issue date Mar 8, 2005
- Carl Zeiss SMT AG
- Harry Bauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Catadioptric objective
- Patent number 6,842,294
- Issue date Jan 11, 2005
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, M...
- Publication number 20240329285
- Publication date Oct 3, 2024
- Carl Zeiss SMT GMBH
- Tobias ULLSPERGER
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20240192605
- Publication date Jun 13, 2024
- Carl Zeiss SMT GMBH
- Christoph ZACZEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A LITHOGRAPHY SYSTEM
- Publication number 20240027730
- Publication date Jan 25, 2024
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20240019613
- Publication date Jan 18, 2024
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATI...
- Publication number 20230375939
- Publication date Nov 23, 2023
- Carl Zeiss SMT GMBH
- Christoph Zaczek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20210132269
- Publication date May 6, 2021
- Carl Zeiss SMT GMBH
- Konstantin FORCHT
- G02 - OPTICS
Information Patent Application
Optical Element and Method of Making an Optical Element
- Publication number 20200278480
- Publication date Sep 3, 2020
- Carl Zeiss Meditec AG
- Christian Beder
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20190101832
- Publication date Apr 4, 2019
- Carl Zeiss SMT GmbH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT AND METHOD OF MAKING AN OPTICAL ELEMENT
- Publication number 20170351007
- Publication date Dec 7, 2017
- Carl Zeiss Meditec AG
- Christian Beder
- G02 - OPTICS
Information Patent Application
EUV MIRROR AND OPTICAL SYSTEM COMPRISING EUV MIRROR
- Publication number 20160195648
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Thomas Schicketanz
- G02 - OPTICS
Information Patent Application
Projection Exposure System and Projection Exposure Method
- Publication number 20130182234
- Publication date Jul 18, 2013
- Carl Zeiss SMT GMBH
- Paul Graupner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM FOR EUV LITHOGRAPHY WITH A CHARGED-PARTICLE SOURCE
- Publication number 20130099132
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...
- Publication number 20130038929
- Publication date Feb 14, 2013
- Carl Zeiss SMT GMBH
- Stephan MUELLENDER
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL IMAGING SYSTEM
- Publication number 20120224160
- Publication date Sep 6, 2012
- Carl Zeiss SMT GMBH
- Aurelian Dodoc
- G02 - OPTICS
Information Patent Application
CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...
- Publication number 20120218536
- Publication date Aug 30, 2012
- Carl Zeiss SMT GMBH
- Sascha Bleidistel
- G02 - OPTICS
Information Patent Application
MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICRO...
- Publication number 20120212810
- Publication date Aug 23, 2012
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAP...
- Publication number 20120134015
- Publication date May 31, 2012
- Carl Zeiss SMT GMBH
- Hans-Jochen PAUL
- G02 - OPTICS
Information Patent Application
Optical Element With An Antireflection Coating, Projection Objectiv...
- Publication number 20120038897
- Publication date Feb 16, 2012
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACT...
- Publication number 20100290021
- Publication date Nov 18, 2010
- Carl Zeiss SMT AG
- Alexandra PAZIDIS
- G02 - OPTICS
Information Patent Application
METHODS FOR PRODUCING AN ANTIREFLECTION SURFACE ON AN OPTICAL ELEME...
- Publication number 20100149510
- Publication date Jun 17, 2010
- Carl Zeiss SMT AG
- Christoph ZACZEK
- G02 - OPTICS
Information Patent Application
Reflective optical element for ultraviolet radiation, projection op...
- Publication number 20090128894
- Publication date May 21, 2009
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
METHOD OF PROCESSING AN OPTICAL ELEMENT AND AN OPTICAL ELEMENT, IN...
- Publication number 20080309905
- Publication date Dec 18, 2008
- Carl Zeiss SMT AG
- Alexandra PAZIDIS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
- Publication number 20080297745
- Publication date Dec 4, 2008
- Carl Zeiss SMT AG
- Karl-Stefan WEISSENRIEDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY
- Publication number 20080291419
- Publication date Nov 27, 2008
- Carl Zeiss SMT AG
- Karl-Stefan Weissenrieder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Element with an Antireflection Coating, Projection Objectiv...
- Publication number 20080192335
- Publication date Aug 14, 2008
- Carl Zeiss SMT AG
- Christoph Zaczek
- G02 - OPTICS
Information Patent Application
Objective with crystal lenses
- Publication number 20070242250
- Publication date Oct 18, 2007
- Carl Zeiss SMT AG
- Aksel Goehnermeier
- G02 - OPTICS
Information Patent Application
Devices and methods for inspecting optical elements with a view to...
- Publication number 20070132989
- Publication date Jun 14, 2007
- Julian Kaller
- G01 - MEASURING TESTING
Information Patent Application
Microlithographic exposure apparatus
- Publication number 20070128453
- Publication date Jun 7, 2007
- Alexandra Pazidis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM
- Publication number 20070024982
- Publication date Feb 1, 2007
- Carl Zeiss SMT AG
- Franz Josef Stickel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical element, in particular for an objective or an illumination...
- Publication number 20070007491
- Publication date Jan 11, 2007
- Ralf Mueller
- G02 - OPTICS

Christoph Zaczek

Person

Patents Grantslast 30 patents

Method for producing a mirror of a microlithographic projection exp...

Reflective optical element

Optical element and method of making an optical element

Optical element and method of making an optical element

Catadioptric projection objective including a reflective optical co...

Catadioptric projection objective including a reflective optical co...

EUV mirror and optical system comprising EUV mirror

Optical element with an antireflection coating, projection objectiv...

Mirror for the EUV wavelength range, substrate for such a mirror, p...

Reflective optical imaging system

Projection exposure system and projection exposure method

Optical system for EUV lithography with a charged-particle source

Optical element for reflection of UV radiation, method for manufact...

Method of processing an optical element and an optical element, in...

Optical element with an antireflection coating, projection objectiv...

Devices and methods for inspecting optical elements with a view to...

Reflective optical element for ultraviolet radiation, projection op...

Microlithographic exposure apparatus

Projection objective for immersion lithography

Objective with crystal lenses

Optical component and coating system for coating substrates for opt...

Method and coating system for coating substrates for optical compon...

Catadioptric objective

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR PRODUCING AT LEAST ONE HOLLOW STRUCTURE, M...

METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...

METHOD FOR PRODUCING A MIRROR OF A LITHOGRAPHY SYSTEM

METHOD FOR PRODUCING A MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXP...

METHOD FOR PRODUCING A MULTI-PART MIRROR OF A PROJECTION ILLUMINATI...

REFLECTIVE OPTICAL ELEMENT

Optical Element and Method of Making an Optical Element

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

OPTICAL ELEMENT AND METHOD OF MAKING AN OPTICAL ELEMENT

EUV MIRROR AND OPTICAL SYSTEM COMPRISING EUV MIRROR

Projection Exposure System and Projection Exposure Method

OPTICAL SYSTEM FOR EUV LITHOGRAPHY WITH A CHARGED-PARTICLE SOURCE

MIRROR FOR THE EUV WAVELENGTH RANGE, SUBSTRATE FOR SUCH A MIRROR, P...

REFLECTIVE OPTICAL IMAGING SYSTEM

CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL CO...

MIRROR FOR THE EUV WAVELENGTH RANGE, PROJECTION OBJECTIVE FOR MICRO...

MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAP...

Optical Element With An Antireflection Coating, Projection Objectiv...

OPTICAL ELEMENT FOR REFLECTION OF UV RADIATION, METHOD FOR MANUFACT...

METHODS FOR PRODUCING AN ANTIREFLECTION SURFACE ON AN OPTICAL ELEME...

Reflective optical element for ultraviolet radiation, projection op...

METHOD OF PROCESSING AN OPTICAL ELEMENT AND AN OPTICAL ELEMENT, IN...

PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY

PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY

Optical Element with an Antireflection Coating, Projection Objectiv...

Objective with crystal lenses

Devices and methods for inspecting optical elements with a view to...

Microlithographic exposure apparatus

IMAGING SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM

Optical element, in particular for an objective or an illumination...