Christophe Pierrat

Person

Watchung, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Handling of flat data for phase processing including growing shapes...
- Patent number 8,977,989
- Issue date Mar 10, 2015
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout of phase shifting photolithographic masks with refined shift...
- Patent number 8,566,757
- Issue date Oct 22, 2013
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography modeling and applications
- Patent number 8,479,125
- Issue date Jul 2, 2013
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for compressed post-OPC data
- Patent number 8,423,925
- Issue date Apr 16, 2013
- Cadence Design Systems, Inc.
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for compressed post-OPC data
- Patent number 8,423,924
- Issue date Apr 16, 2013
- Cadence Design Systems, Inc.
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for applying phase effects of mask diffraction pa...
- Patent number 8,316,326
- Issue date Nov 20, 2012
- Cadence Design Systems, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spacer double patterning for lithography operations
- Patent number 8,278,156
- Issue date Oct 2, 2012
- Cadence Design Systems, Inc.
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-alignment for semiconductor patterns
- Patent number 8,252,693
- Issue date Aug 28, 2012
- Cadence Design Systems, Inc.
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned VIAS for semiconductor devices
- Patent number 8,198,188
- Issue date Jun 12, 2012
- Cadence Design Systems, Inc.
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for compressed design phase contour data
- Patent number 8,103,984
- Issue date Jan 24, 2012
- Cadence Design Systems, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contact or proximity printing using a magnified mask image
- Patent number 7,932,020
- Issue date Apr 26, 2011
- Takumi Technology Corporation
- Christophe Pierrat
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Spacer double patterning for lithography operations
- Patent number 7,927,928
- Issue date Apr 19, 2011
- Cadence Design Systems, Inc.
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity for semiconductor patterning operations
- Patent number 7,926,001
- Issue date Apr 12, 2011
- Cadence Design Systems, Inc.
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Displacing edge segments on a fabrication layout based on proximity...
- Patent number 7,926,004
- Issue date Apr 12, 2011
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-alignment for semiconductor patterns
- Patent number 7,902,613
- Issue date Mar 8, 2011
- Cadence Design Systems, Inc.
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,739,649
- Issue date Jun 15, 2010
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full phase shifting mask in damascene process
- Patent number 7,659,042
- Issue date Feb 9, 2010
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control for phase shifting photolithographic masks
- Patent number 7,629,109
- Issue date Dec 8, 2009
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask data preparation
- Patent number 7,614,033
- Issue date Nov 3, 2009
- Takumi Technology Corp.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask including sub-resolution assist features for isola...
- Patent number 7,585,595
- Issue date Sep 8, 2009
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Displacing edge segments on a fabrication layout based on proximity...
- Patent number 7,562,319
- Issue date Jul 14, 2009
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Full phase shifting mask in damascene process
- Patent number 7,534,531
- Issue date May 19, 2009
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Handling of flat data for phase processing including growing shapes...
- Patent number 7,500,217
- Issue date Mar 3, 2009
- Synopsys, Inc.
- Michel Luc Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Effective proximity effect correction methodology
- Patent number 7,458,056
- Issue date Nov 25, 2008
- Takumi Technology Corp.
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,435,513
- Issue date Oct 14, 2008
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure control for phase shifting photolithographic masks
- Patent number 7,422,841
- Issue date Sep 9, 2008
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,348,108
- Issue date Mar 25, 2008
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Design and layout of phase shifting photolithographic masks
- Patent number 7,312,003
- Issue date Dec 25, 2007
- Synopsys, Inc.
- Michel L. Côté
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method of correcting proximity effects in a tri-tone...
- Patent number 7,236,916
- Issue date Jun 26, 2007
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating phase shift mask design conflict resolution
- Patent number 7,178,128
- Issue date Feb 13, 2007
- Synopsys Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Lithography Modeling And Applications
- Publication number 20130346037
- Publication date Dec 26, 2013
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Contact or proximity printing using a magnified mask image
- Publication number 20110207056
- Publication date Aug 25, 2011
- Christophe Pierrat
- B82 - NANO-TECHNOLOGY
Information Patent Application
SPACER DOUBLE PATTERNING FOR LITHOGRAPHY OPERATIONS
- Publication number 20110018146
- Publication date Jan 27, 2011
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER DOUBLE PATTERNING FOR LITHOGRAPHY OPERATIONS
- Publication number 20110012237
- Publication date Jan 20, 2011
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORMITY FOR SEMICONDUCTOR PATTERNING OPERATIONS
- Publication number 20100299646
- Publication date Nov 25, 2010
- Christophe Pierrat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lithography Modelling And Applications
- Publication number 20100251202
- Publication date Sep 30, 2010
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR COMPRESSED POST-OPC DATA
- Publication number 20100218156
- Publication date Aug 26, 2010
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Design and Layout of Phase Shifting Photolithographic Masks
- Publication number 20100050149
- Publication date Feb 25, 2010
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure control for phase shifting photolithographic masks
- Publication number 20100040965
- Publication date Feb 18, 2010
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Displacing Edge Segments On A Fabrication Layout Based On Proximity...
- Publication number 20090249266
- Publication date Oct 1, 2009
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Handling Of Flat Data For Phase Processing Including Growing Shapes...
- Publication number 20090125867
- Publication date May 14, 2009
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Full Phase Shifting Mask In Damascene Process
- Publication number 20080286664
- Publication date Nov 20, 2008
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure control for phase shifting photolithographic masks
- Publication number 20080187869
- Publication date Aug 7, 2008
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and Layout of Phase Shifting Photolithographic Masks
- Publication number 20080076042
- Publication date Mar 27, 2008
- Synopsys, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Displacing Edge Segments On A Fabrication Layout Based On Proximity...
- Publication number 20070006118
- Publication date Jan 4, 2007
- Synopsys Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask data preparation
- Publication number 20060218520
- Publication date Sep 28, 2006
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for cleaning and sealing display packages
- Publication number 20060205100
- Publication date Sep 14, 2006
- KAREN HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for cleaning and sealing display packages
- Publication number 20060201539
- Publication date Sep 14, 2006
- KAREN HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Effective proximity effect correction methodology
- Publication number 20060129968
- Publication date Jun 15, 2006
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR CLEANING AND SEALING DISPLAY PACKAGES
- Publication number 20060105494
- Publication date May 18, 2006
- KAREN HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Design data format and hierarchy management for processing
- Publication number 20050166173
- Publication date Jul 28, 2005
- Synopsys, Inc.
- Michel L. Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Full phase shifting mask in damascene process
- Publication number 20050123841
- Publication date Jun 9, 2005
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask data preparation
- Publication number 20050091632
- Publication date Apr 28, 2005
- Fortis Systems Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design-manufacturing interface via a unified model
- Publication number 20050076316
- Publication date Apr 7, 2005
- Fortis Systems Inc.
- Christophe Pierrat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Contact printing using a magnified mask image
- Publication number 20050068639
- Publication date Mar 31, 2005
- Fortis Systems Inc.
- Christophe Pierrat
- G02 - OPTICS
Information Patent Application
Phase shift mask including sub-resolution assist features for isola...
- Publication number 20050042527
- Publication date Feb 24, 2005
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and layout of phase shifting photolithographic masks
- Publication number 20050031971
- Publication date Feb 10, 2005
- Numerical Technologies, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Design and layout of phase shifting photolithographic masks
- Publication number 20050031972
- Publication date Feb 10, 2005
- Numerical Technologies, Inc.
- Michel Luc Cote
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contact or proximity printing using a magnified mask image
- Publication number 20050007567
- Publication date Jan 13, 2005
- Fortis Systems Inc.
- Christophe Pierrat
- B82 - NANO-TECHNOLOGY
Information Patent Application
Dissection of edges with projection points in a fabrication layout...
- Publication number 20040221255
- Publication date Nov 4, 2004
- Numerical Technologies, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christophe Pierrat

Person

Patents Grantslast 30 patents

Handling of flat data for phase processing including growing shapes...

Layout of phase shifting photolithographic masks with refined shift...

Lithography modeling and applications

System and method for compressed post-OPC data

System and method for compressed post-OPC data

System and method for applying phase effects of mask diffraction pa...

Spacer double patterning for lithography operations

Self-alignment for semiconductor patterns

Self-aligned VIAS for semiconductor devices

System and method for compressed design phase contour data

Contact or proximity printing using a magnified mask image

Spacer double patterning for lithography operations

Uniformity for semiconductor patterning operations

Displacing edge segments on a fabrication layout based on proximity...

Self-alignment for semiconductor patterns

Design and layout of phase shifting photolithographic masks

Full phase shifting mask in damascene process

Exposure control for phase shifting photolithographic masks

Mask data preparation

Phase shift mask including sub-resolution assist features for isola...

Displacing edge segments on a fabrication layout based on proximity...

Full phase shifting mask in damascene process

Handling of flat data for phase processing including growing shapes...

Effective proximity effect correction methodology

Design and layout of phase shifting photolithographic masks

Exposure control for phase shifting photolithographic masks

Design and layout of phase shifting photolithographic masks

Design and layout of phase shifting photolithographic masks

Structure and method of correcting proximity effects in a tri-tone...

Alternating phase shift mask design conflict resolution

Patents Applicationslast 30 patents

Lithography Modeling And Applications

Contact or proximity printing using a magnified mask image

SPACER DOUBLE PATTERNING FOR LITHOGRAPHY OPERATIONS

SPACER DOUBLE PATTERNING FOR LITHOGRAPHY OPERATIONS

UNIFORMITY FOR SEMICONDUCTOR PATTERNING OPERATIONS

Lithography Modelling And Applications

SYSTEM AND METHOD FOR COMPRESSED POST-OPC DATA

Design and Layout of Phase Shifting Photolithographic Masks

Exposure control for phase shifting photolithographic masks

Displacing Edge Segments On A Fabrication Layout Based On Proximity...

Handling Of Flat Data For Phase Processing Including Growing Shapes...

Full Phase Shifting Mask In Damascene Process

Exposure control for phase shifting photolithographic masks

Design and Layout of Phase Shifting Photolithographic Masks

Displacing Edge Segments On A Fabrication Layout Based On Proximity...

Mask data preparation

Method and apparatus for cleaning and sealing display packages

Method and apparatus for cleaning and sealing display packages

Effective proximity effect correction methodology

METHOD AND APPARATUS FOR CLEANING AND SEALING DISPLAY PACKAGES

Design data format and hierarchy management for processing

Full phase shifting mask in damascene process

Mask data preparation

Design-manufacturing interface via a unified model

Contact printing using a magnified mask image

Phase shift mask including sub-resolution assist features for isola...

Design and layout of phase shifting photolithographic masks

Design and layout of phase shifting photolithographic masks

Contact or proximity printing using a magnified mask image

Dissection of edges with projection points in a fabrication layout...