Christopher E. Osuch

Person

Mine Hill, NJ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive acrylate composition and waveguide device
- Patent number 7,327,925
- Issue date Feb 5, 2008
- E. I. Du Pont de Nemours and Company
- Fang Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive acrylate composition and waveguide device
- Patent number 7,078,445
- Issue date Jul 18, 2006
- E. I. Du Pont de Nemours and Company
- Chuck C. Xu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated photopolymer composition and waveguide device
- Patent number 6,929,899
- Issue date Aug 16, 2005
- E. I. Du Pont de Nemours and Company
- Indira S. Pottebaum
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for heat absorption using polyoxymethylene polymer compositions
- Patent number 6,899,161
- Issue date May 31, 2005
- Honeywell International, Inc.
- Jane Ren
- G11 - INFORMATION STORAGE
Information Patent Grant
Method for heat absorption using polyoxymethylene polymer compositions
- Patent number 6,365,244
- Issue date Apr 2, 2002
- Honeywell International, Inc.
- Jane Ren
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Enclosure for dissipating heat away from a heat sensitive device us...
- Patent number 6,143,978
- Issue date Nov 7, 2000
- AlliedSignal Inc.
- Jane Ren
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for dissipating heat away from a heat sensitive device using...
- Patent number 6,078,011
- Issue date Jun 20, 2000
- AlliedSignal Inc.
- Jane Ren
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for dissipating heat away from a heat sensitive device using...
- Patent number 5,932,839
- Issue date Aug 3, 1999
- Jane Ren
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 5,200,529
- Issue date Apr 6, 1993
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 5,081,001
- Issue date Jan 14, 1992
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photochemical image process of positive photoresist element with ma...
- Patent number 5,059,513
- Issue date Oct 22, 1991
- Hoechst Celanese Corporation
- Frederick R. Hopf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution photoresist of imide containing polymers
- Patent number 4,968,581
- Issue date Nov 6, 1990
- Hoechst Celanese Corporation
- Chengjiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 4,962,171
- Issue date Oct 9, 1990
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution photoresist based on imide containing polymers
- Patent number 4,912,018
- Issue date Mar 27, 1990
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist thermally stable compositions and elements hav...
- Patent number 4,857,435
- Issue date Aug 15, 1989
- Hoechst Celanese Corporation
- Frederick R. Hopf
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High resolution photoresist of imide containing polymers
- Patent number 4,837,124
- Issue date Jun 6, 1989
- Hoechst Celanese Corporation
- Chengjiu Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Blocked monomer and polymers therefrom for use as photoresists
- Patent number 4,810,613
- Issue date Mar 7, 1989
- Hoechst Celanese Corporation
- Christopher E. Osuch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive acrylate composition and waveguide device
- Publication number 20060229379
- Publication date Oct 12, 2006
- Fang Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR HEAT ABSORPTION USING POLYOXYMETHYLENE POLYMER COMPOSITIONS
- Publication number 20050006621
- Publication date Jan 13, 2005
- AlliedSignal, Inc.
- Jane Ren
- G11 - INFORMATION STORAGE
Information Patent Application
Fluorinated photopolymer composition and waveguide device
- Publication number 20020136526
- Publication date Sep 26, 2002
- Indira S. Pottebaum
- G02 - OPTICS
Information Patent Application
Photosensitive acrylate composition and waveguide device
- Publication number 20020106582
- Publication date Aug 8, 2002
- Chuck C. Xu
- G02 - OPTICS

Christopher E. Osuch

Person

Patents Grantslast 30 patents

Photosensitive acrylate composition and waveguide device

Photosensitive acrylate composition and waveguide device

Fluorinated photopolymer composition and waveguide device

Method for heat absorption using polyoxymethylene polymer compositions

Method for heat absorption using polyoxymethylene polymer compositions

Enclosure for dissipating heat away from a heat sensitive device us...

Method for dissipating heat away from a heat sensitive device using...

Method for dissipating heat away from a heat sensitive device using...

Blocked monomer and polymers therefrom for use as photoresists

Blocked monomer and polymers therefrom for use as photoresists

Photochemical image process of positive photoresist element with ma...

High resolution photoresist of imide containing polymers

Blocked monomer and polymers therefrom for use as photoresists

High resolution photoresist based on imide containing polymers

Positive photoresist thermally stable compositions and elements hav...

High resolution photoresist of imide containing polymers

Blocked monomer and polymers therefrom for use as photoresists

Patents Applicationslast 30 patents

Photosensitive acrylate composition and waveguide device

METHOD FOR HEAT ABSORPTION USING POLYOXYMETHYLENE POLYMER COMPOSITIONS

Fluorinated photopolymer composition and waveguide device

Photosensitive acrylate composition and waveguide device