Christopher F. Lyons

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Charge storage device for detecting alpha particles
- Patent number 8,748,800
- Issue date Jun 10, 2014
- Spansion LLC
- Timothy Z. Hossain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for detecting particles with a semiconductor device
- Patent number 8,436,289
- Issue date May 7, 2013
- Spansion LLC
- Timothy Z. Hossain
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer dielectrics for memory element array interconnect
- Patent number 7,608,855
- Issue date Oct 27, 2009
- Spansion LLC
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Grant
Methods for designing grating structures for use in situ scatterome...
- Patent number 7,427,457
- Issue date Sep 23, 2008
- Advanced Micro Devices, Inc.
- Marina V. Plat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for semiconductor gate line dimension reduction
- Patent number 7,268,066
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using carbon spacers for critical dimension (CD) reduction
- Patent number 7,169,711
- Issue date Jan 30, 2007
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion lithographic process using a conforming immersion medium
- Patent number 7,125,652
- Issue date Oct 24, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning with rigid organic under-layer
- Patent number 7,122,455
- Issue date Oct 17, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SO2 treatment of oxidized CuO for copper sulfide formation of memor...
- Patent number 7,115,440
- Issue date Oct 3, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Grant
Negative resist or dry develop process for forming middle of line i...
- Patent number 7,112,489
- Issue date Sep 26, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation polish stop layer for reduced topography
- Patent number 7,056,804
- Issue date Jun 6, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method using in situ scatterometry to detect photoresist...
- Patent number 7,052,921
- Issue date May 30, 2006
- Advanced Micro Devices, Inc.
- Marina V. Plat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning for elongated VSS contact flash memory
- Patent number 7,018,922
- Issue date Mar 28, 2006
- Advanced Micro Devices, Inc.
- Hung-eil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sidewall formation for high density polymer memory element array
- Patent number 7,015,504
- Issue date Mar 21, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Grant
Metal bridging monitor for etch and CMP endpoint detection
- Patent number 7,011,762
- Issue date Mar 14, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damascene process for a T-shaped gate electrode
- Patent number 7,008,832
- Issue date Mar 7, 2006
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation to modulate amorphous carbon stress
- Patent number 6,989,332
- Issue date Jan 24, 2006
- Advanced Micro Devices, Inc.
- Scott A. Bell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scatterometry with grating to observe resist removal rate during etch
- Patent number 6,982,043
- Issue date Jan 3, 2006
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrical critical dimension measurement and defect detection for...
- Patent number 6,972,576
- Issue date Dec 6, 2005
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory element formation with photosensitive polymer dielectric
- Patent number 6,955,939
- Issue date Oct 18, 2005
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for a lithographic lens
- Patent number 6,906,777
- Issue date Jun 14, 2005
- Advanced Micro Devices, Inc.
- Jongwook Kye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning for elliptical Vss contact on flash memory
- Patent number 6,900,124
- Issue date May 31, 2005
- Advanced Micro Devices, Inc.
- Hung-eil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive polymeric memory elements
- Patent number 6,878,961
- Issue date Apr 12, 2005
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Grant
E-beam flood exposure of spin-on material to eliminate voids in vias
- Patent number 6,869,888
- Issue date Mar 22, 2005
- Advanced Micro Devices, Inc.
- Marina V. Plat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV reflective mask having a carbon film and a method of making suc...
- Patent number 6,869,734
- Issue date Mar 22, 2005
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Real-time control of chemically-amplified resist processing on wafer
- Patent number 6,864,024
- Issue date Mar 8, 2005
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
CVD organic polymer film for advanced gate patterning
- Patent number 6,864,556
- Issue date Mar 8, 2005
- Advanced Micro Devices, Inc.
- Lu You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Amorphous carbon absorber/shifter film for attenuated phase shift mask
- Patent number 6,852,455
- Issue date Feb 8, 2005
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for semiconductor gate line dimension reduction
- Patent number 6,849,530
- Issue date Feb 1, 2005
- Advanced Micro Devices
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of forming a passive layer by a CMP process
- Patent number 6,836,398
- Issue date Dec 28, 2004
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G11 - INFORMATION STORAGE

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR DETECTING PARTICLES WITH A SEMICONDUCTOR DEVICE
- Publication number 20130193537
- Publication date Aug 1, 2013
- SPANSION LLC
- Timothy Z. HOSSAIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Polymer dielectrics for memory element array interconnect
- Publication number 20050224922
- Publication date Oct 13, 2005
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Application
Immersion lithographic process using a conforming immersion medium
- Publication number 20050122497
- Publication date Jun 9, 2005
- Christopher F. Lyons
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contact etch resistant spacers
- Publication number 20050121738
- Publication date Jun 9, 2005
- Calvin T. Gabriel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sidewall formation for high density polymer memory element array
- Publication number 20050092983
- Publication date May 5, 2005
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Application
PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS
- Publication number 20050045877
- Publication date Mar 3, 2005
- Christopher F. Lyons
- G11 - INFORMATION STORAGE
Information Patent Application
Method for semiconductor gate line dimension reduction
- Publication number 20050020019
- Publication date Jan 27, 2005
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of using an amorphous carbon layer for improved reticle fabr...
- Publication number 20040079726
- Publication date Apr 29, 2004
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Post etch overlay metrology to avoid absorbing layers preventing me...
- Publication number 20040063008
- Publication date Apr 1, 2004
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for semiconductor gate line dimension reduction
- Publication number 20040043590
- Publication date Mar 4, 2004
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for reducing pattern deformation and photoresist poisoning i...
- Publication number 20040023475
- Publication date Feb 5, 2004
- Advanced Micro Devices, Inc.
- Douglas J. Bonser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIDEWALL SPACER DEFINITION OF GATES
- Publication number 20030003751
- Publication date Jan 2, 2003
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual damascene using removable via studs
- Publication number 20020164544
- Publication date Nov 7, 2002
- Advanced Micro Devices, Inc.
- Todd P. Luckanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pellicle for use in small wavelength lithography and a method for m...
- Publication number 20020127477
- Publication date Sep 12, 2002
- Advanced Micro Devices, Inc.
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Two mask via pattern to improve pattern definition
- Publication number 20020106587
- Publication date Aug 8, 2002
- Advanced Micro Devices, Inc.
- Todd Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Dual damascene process utilizing a bi-layer imaging layer
- Publication number 20020061470
- Publication date May 23, 2002
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-THIN RESIST COATING QUALITYBY BY INCREASING SURFACE ROUGHNESS...
- Publication number 20020004300
- Publication date Jan 10, 2002
- MARINA V. PLAT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS
- Publication number 20010046791
- Publication date Nov 29, 2001
- RAMKUMAR SUBRAMANIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-THIN RESIST SHALLOW TRENCH PROCESS USING METAL HARD MASK
- Publication number 20010038972
- Publication date Nov 8, 2001
- Christopher F. Lyons
- CHRISTOPHER F. LYONS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-THIN RESIST SHALLOW TRENCH PROCESS USING HIGH SELECTIVITY NIT...
- Publication number 20010014512
- Publication date Aug 16, 2001
- CHRISTOPHER F. LYONS
- H01 - BASIC ELECTRIC ELEMENTS

Christopher F. Lyons

Person

Patents Grantslast 30 patents

Charge storage device for detecting alpha particles

System and method for detecting particles with a semiconductor device

Polymer dielectrics for memory element array interconnect

Methods for designing grating structures for use in situ scatterome...

Method for semiconductor gate line dimension reduction

Method of using carbon spacers for critical dimension (CD) reduction

Immersion lithographic process using a conforming immersion medium

Patterning with rigid organic under-layer

SO2 treatment of oxidized CuO for copper sulfide formation of memor...

Negative resist or dry develop process for forming middle of line i...

Shallow trench isolation polish stop layer for reduced topography

System and method using in situ scatterometry to detect photoresist...

Patterning for elongated VSS contact flash memory

Sidewall formation for high density polymer memory element array

Metal bridging monitor for etch and CMP endpoint detection

Damascene process for a T-shaped gate electrode

Ion implantation to modulate amorphous carbon stress

Scatterometry with grating to observe resist removal rate during etch

Electrical critical dimension measurement and defect detection for...

Memory element formation with photosensitive polymer dielectric

Pellicle for a lithographic lens

Patterning for elliptical Vss contact on flash memory

Photosensitive polymeric memory elements

E-beam flood exposure of spin-on material to eliminate voids in vias

EUV reflective mask having a carbon film and a method of making suc...

Real-time control of chemically-amplified resist processing on wafer

CVD organic polymer film for advanced gate patterning

Amorphous carbon absorber/shifter film for attenuated phase shift mask

Method for semiconductor gate line dimension reduction

System and method of forming a passive layer by a CMP process

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR DETECTING PARTICLES WITH A SEMICONDUCTOR DEVICE

Polymer dielectrics for memory element array interconnect

Immersion lithographic process using a conforming immersion medium

Contact etch resistant spacers

Sidewall formation for high density polymer memory element array

PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS

Method for semiconductor gate line dimension reduction

Method of using an amorphous carbon layer for improved reticle fabr...

Post etch overlay metrology to avoid absorbing layers preventing me...

Method for semiconductor gate line dimension reduction

Method for reducing pattern deformation and photoresist poisoning i...

SIDEWALL SPACER DEFINITION OF GATES

Dual damascene using removable via studs

Pellicle for use in small wavelength lithography and a method for m...

Two mask via pattern to improve pattern definition

Dual damascene process utilizing a bi-layer imaging layer

ULTRA-THIN RESIST COATING QUALITYBY BY INCREASING SURFACE ROUGHNESS...

USE OF SILICON OXYNITRIDE ARC FOR METAL LAYERS

ULTRA-THIN RESIST SHALLOW TRENCH PROCESS USING METAL HARD MASK

ULTRA-THIN RESIST SHALLOW TRENCH PROCESS USING HIGH SELECTIVITY NIT...