Christopher F. Spence

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Measurement method and apparatus
- Patent number 11,953,823
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Christopher Alan Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coloring aware optimization
- Patent number 10,670,973
- Issue date Jun 2, 2020
- ASML Netherlands B.V.
- Yi Zou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Efficient optical proximity correction repair flow method and appar...
- Patent number 9,250,538
- Issue date Feb 2, 2016
- GLOBALFOUNDRIES Inc.
- Guoxiang Ning
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for optimizing an optical proximity correction...
- Patent number 7,788,609
- Issue date Aug 31, 2010
- GLOBALFOUNDRIES Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,657,864
- Issue date Feb 2, 2010
- GLOBALFOUNDRIES Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for designing an integrated circuit device
- Patent number 7,543,256
- Issue date Jun 2, 2009
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimizing an integrated circuit layout by taking into consideratio...
- Patent number 7,313,769
- Issue date Dec 25, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,269,804
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for metrology recipe generation and review and an...
- Patent number 7,207,017
- Issue date Apr 17, 2007
- Advanced Micro Devices, Inc.
- Cyrus Tabery
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for design rule creation and selection
- Patent number 7,194,725
- Issue date Mar 20, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for evaluation of reticle image using aerial image simulator
- Patent number 7,120,285
- Issue date Oct 10, 2006
- Advanced Micro Devices, Inc.
- Christopher A. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Predefined critical spaces in IC patterning to reduce line end pull...
- Patent number 7,071,085
- Issue date Jul 4, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device and method for determining an illumination intensity profile...
- Patent number 7,027,130
- Issue date Apr 11, 2006
- Advanced Micro Devices, Inc.
- Christopher A. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduce line end pull back by exposing and etching space after mask...
- Patent number 7,015,148
- Issue date Mar 21, 2006
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing resolution enhancement system and metho...
- Patent number 6,994,939
- Issue date Feb 7, 2006
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic photomask and method of manufacture to improve photoma...
- Patent number 6,974,652
- Issue date Dec 13, 2005
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of extending the areas of clear field phase shift generation
- Patent number 6,818,358
- Issue date Nov 16, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and enhancing clear field phase shift masks with border arou...
- Patent number 6,797,438
- Issue date Sep 28, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of enhancing clear field phase shift masks with chrome borde...
- Patent number 6,749,971
- Issue date Jun 15, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of enhancing clear field phase shift masks with border regio...
- Patent number 6,749,970
- Issue date Jun 15, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of enhancing clear field phase shift masks by adding paralle...
- Patent number 6,675,369
- Issue date Jan 6, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and system for improving stability of photomasks
- Patent number 6,627,355
- Issue date Sep 30, 2003
- Advanced Micro Devices, Inc.
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Utilizing electrical performance data to predict CD variations acro...
- Patent number 6,562,639
- Issue date May 13, 2003
- Advanced Micro Devices, Inc.
- Anna Minvielle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Characterization and synthesis of OPC structures by fourier space a...
- Patent number 6,492,066
- Issue date Dec 10, 2002
- Advanced Micro Devices, Inc.
- Luigi Capodieci
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous heating and exposure of reticle with pattern placement...
- Patent number 6,437,348
- Issue date Aug 20, 2002
- Advanced Micro Devices, Inc.
- Christopher F. Spence
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Piezo programmable reticle for EUV lithography
- Patent number 6,356,340
- Issue date Mar 12, 2002
- Advanced Micro Devices, Inc.
- Christopher A. Spence
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Sidelobe suppressing phase shift mask and method
- Patent number 6,291,113
- Issue date Sep 18, 2001
- Advanced Micro Devices, Inc.
- Christopher F. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for compensating for critical dimension variat...
- Patent number 6,255,125
- Issue date Jul 3, 2001
- Advanced Micro Devices, Inc.
- Regina T. Schmidt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Forming minimal size spaces in integrated circuit conductive lines
- Patent number 6,191,034
- Issue date Feb 20, 2001
- Advanced Micro Devices
- Richard K. Klein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask quality measurements by fourier space analysis
- Patent number 6,187,483
- Issue date Feb 13, 2001
- Advanced Micro Devices, Inc.
- Luigi Capodieci
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEASUREMENT METHOD AND APPARATUS
- Publication number 20210311384
- Publication date Oct 7, 2021
- ASML NETHERLANDS B.V.
- Christopher Alan SPENCE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EFFICIENT OPTICAL PROXIMITY CORRECTION REPAIR FLOW METHOD AND APPAR...
- Publication number 20150192866
- Publication date Jul 9, 2015
- GLOBALFOUNDRIES INC.
- Guoxiang NING
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZING AN OPTICAL PROXIMITY CORRECTION...
- Publication number 20090249261
- Publication date Oct 1, 2009
- HUNG-EIL KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...
- Publication number 20070209030
- Publication date Sep 6, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device and method for determining an illumination intensity profile...
- Publication number 20050243299
- Publication date Nov 3, 2005
- Christopher A. Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for integrated circuit device design and manufact...
- Publication number 20050229125
- Publication date Oct 13, 2005
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of enhancing clear field phase shift masks with chrome borde...
- Publication number 20040023123
- Publication date Feb 5, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of enhancing clear field phase shift masks with border regio...
- Publication number 20040009407
- Publication date Jan 15, 2004
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of and system for improving stability of photomasks
- Publication number 20020132171
- Publication date Sep 19, 2002
- Advanced Micro Devices, Inc.
- Harry J. Levinson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christopher F. Spence

Person

Patents Grantslast 30 patents

Measurement method and apparatus

Coloring aware optimization

Efficient optical proximity correction repair flow method and appar...

Method and apparatus for optimizing an optical proximity correction...

System and method for integrated circuit device design and manufact...

System and method for designing an integrated circuit device

Optimizing an integrated circuit layout by taking into consideratio...

System and method for integrated circuit device design and manufact...

Method and system for metrology recipe generation and review and an...

System and method for design rule creation and selection

Method for evaluation of reticle image using aerial image simulator

Predefined critical spaces in IC patterning to reduce line end pull...

Device and method for determining an illumination intensity profile...

Reduce line end pull back by exposing and etching space after mask...

Semiconductor manufacturing resolution enhancement system and metho...

Lithographic photomask and method of manufacture to improve photoma...

Method of extending the areas of clear field phase shift generation

Method and enhancing clear field phase shift masks with border arou...

Method of enhancing clear field phase shift masks with chrome borde...

Method of enhancing clear field phase shift masks with border regio...

Method of enhancing clear field phase shift masks by adding paralle...

Method of and system for improving stability of photomasks

Utilizing electrical performance data to predict CD variations acro...

Characterization and synthesis of OPC structures by fourier space a...

Simultaneous heating and exposure of reticle with pattern placement...

Piezo programmable reticle for EUV lithography

Sidelobe suppressing phase shift mask and method

Method and apparatus for compensating for critical dimension variat...

Forming minimal size spaces in integrated circuit conductive lines

Mask quality measurements by fourier space analysis

Patents Applicationslast 30 patents

MEASUREMENT METHOD AND APPARATUS

EFFICIENT OPTICAL PROXIMITY CORRECTION REPAIR FLOW METHOD AND APPAR...

METHOD AND APPARATUS FOR OPTIMIZING AN OPTICAL PROXIMITY CORRECTION...

SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...

Device and method for determining an illumination intensity profile...

System and method for integrated circuit device design and manufact...

Method of enhancing clear field phase shift masks with chrome borde...

Method of enhancing clear field phase shift masks with border regio...

Method of and system for improving stability of photomasks