Christopher J. Leavitt

Person

Gloucester, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cover ring to mitigate carbon contamination in plasma doping chamber
- Patent number 12,165,852
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and techniques
- Patent number 11,615,945
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and techniques
- Patent number 11,120,973
- Issue date Sep 14, 2021
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron implanting using a co-gas
- Patent number 10,290,466
- Issue date May 14, 2019
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron implanting using a co-gas
- Patent number 9,865,430
- Issue date Jan 9, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving ion beam quality in a non-mass-analyzed ion imp...
- Patent number 9,840,772
- Issue date Dec 12, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of cleaning an extraction electrode assembly using pulsed bi...
- Patent number 9,711,316
- Issue date Jul 18, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Christopher J. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving ion beam quality in a non-mass-analyzed ion imp...
- Patent number 9,677,171
- Issue date Jun 13, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hardware plasma interlock system
- Patent number 9,060,411
- Issue date Jun 16, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for implant productivity enhancement
- Patent number 9,034,743
- Issue date May 19, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for maskless patterned implantation
- Patent number 8,907,307
- Issue date Dec 9, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Christopher J. Leavitt
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method and system for controlling critical dimension and roughness...
- Patent number 8,698,109
- Issue date Apr 15, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Technique and apparatus for monitoring ion mass, energy, and angle...
- Patent number 8,698,107
- Issue date Apr 15, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving ion beam quality in an implant system
- Patent number 8,669,538
- Issue date Mar 11, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,623,171
- Issue date Jan 7, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for charge neutralization during processing of...
- Patent number 8,461,554
- Issue date Jun 11, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and system for controlling critical dimension and roughness...
- Patent number 8,354,655
- Issue date Jan 15, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Faraday dose and uniformity monitor for plasma based ion implantation
- Patent number 7,132,672
- Issue date Nov 7, 2006
- Varian Semiconductor Equipment Associates, Inc.
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COVER RING TO MITIGATE CARBON CONTAMINATION IN PLASMA DOPING CHAMBER
- Publication number 20230282451
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND TECHNIQUES
- Publication number 20210375590
- Publication date Dec 2, 2021
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND TECHNIQUES
- Publication number 20200357611
- Publication date Nov 12, 2020
- Applied Materials, Inc.
- Vikram M. Bhosle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Imp...
- Publication number 20180087148
- Publication date Mar 29, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Boron Implanting Using A Co-Gas
- Publication number 20180068830
- Publication date Mar 8, 2018
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Imp...
- Publication number 20170247791
- Publication date Aug 31, 2017
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Boron Implanting Using A Co-Gas
- Publication number 20160163510
- Publication date Jun 9, 2016
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Imp...
- Publication number 20150354056
- Publication date Dec 10, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Bon-Woong Koo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method Of Cleaning An Extraction Electrode Assembly Using Pulsed Bi...
- Publication number 20150101634
- Publication date Apr 16, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Christopher J. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method For Implant Productivity Enhancement
- Publication number 20150024580
- Publication date Jan 22, 2015
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDWARE PLASMA INTERLOCK SYSTEM
- Publication number 20140265849
- Publication date Sep 18, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BEAMLINE ELECTRODE VOLTAGE MODULATION FOR ION BEAM GLITCH RECOVERY
- Publication number 20140021373
- Publication date Jan 23, 2014
- Varian Semiconductor Equipment Associates, Inc.
- Piotr Lubicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CHARGE NEUTRALIZATION DURING PROCESSING OF...
- Publication number 20130146790
- Publication date Jun 13, 2013
- Varian Semiconductor Equipment Associates, Inc.
- Peter F. Kurunczi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...
- Publication number 20130135598
- Publication date May 30, 2013
- VARIAN SEMICONDUCTOR EQUIPMENT ASSCOCIATES, INC.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...
- Publication number 20120280140
- Publication date Nov 8, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR MASKLESS PATTERNED IMPLANTION
- Publication number 20120228515
- Publication date Sep 13, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Christopher J. Leavitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUE AND APPARATUS FOR MONITORING ION MASS, ENERGY, AND ANGLE...
- Publication number 20120175518
- Publication date Jul 12, 2012
- Varian Semiconductor Equipment Associates, Inc.
- Ludovic Godet
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL APPARATUS FOR PLASMA IMMERSION ION IMPLANTATION OF A DIELEC...
- Publication number 20120000421
- Publication date Jan 5, 2012
- VARIAN SEMICONDUTOR EQUIPMENT ASSOCIATES, INC.
- Timothy Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20100255683
- Publication date Oct 7, 2010
- Varian Semiconductor Equipment Associates
- Ludovic GODET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA DOSE MEASUREMENT
- Publication number 20100155600
- Publication date Jun 24, 2010
- Varian Semiconductor Equipment Associates, Inc.
- Joseph P Dzengeleski
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA...
- Publication number 20080160212
- Publication date Jul 3, 2008
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Faraday dose and uniformity monitor for plasma based ion implantation
- Publication number 20050223991
- Publication date Oct 13, 2005
- Steven R. Walther
- H01 - BASIC ELECTRIC ELEMENTS

Christopher J. Leavitt

Person

Patents Grantslast 30 patents

Cover ring to mitigate carbon contamination in plasma doping chamber

Plasma processing apparatus and techniques

Plasma processing apparatus and techniques

Boron implanting using a co-gas

Boron implanting using a co-gas

Method of improving ion beam quality in a non-mass-analyzed ion imp...

Method of cleaning an extraction electrode assembly using pulsed bi...

Method of improving ion beam quality in a non-mass-analyzed ion imp...

Hardware plasma interlock system

Method for implant productivity enhancement

Apparatus and method for maskless patterned implantation

Method and system for controlling critical dimension and roughness...

Technique and apparatus for monitoring ion mass, energy, and angle...

Method of improving ion beam quality in an implant system

Plasma processing apparatus

Apparatus and method for charge neutralization during processing of...

Method and system for controlling critical dimension and roughness...

Faraday dose and uniformity monitor for plasma based ion implantation

Patents Applicationslast 30 patents

COVER RING TO MITIGATE CARBON CONTAMINATION IN PLASMA DOPING CHAMBER

PLASMA PROCESSING APPARATUS AND TECHNIQUES

PLASMA PROCESSING APPARATUS AND TECHNIQUES

Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Imp...

Boron Implanting Using A Co-Gas

Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Imp...

Boron Implanting Using A Co-Gas

Method Of Improving Ion Beam Quality In A Non-Mass-Analyzed Ion Imp...

Method Of Cleaning An Extraction Electrode Assembly Using Pulsed Bi...

Method For Implant Productivity Enhancement

HARDWARE PLASMA INTERLOCK SYSTEM

BEAMLINE ELECTRODE VOLTAGE MODULATION FOR ION BEAM GLITCH RECOVERY

APPARATUS AND METHOD FOR CHARGE NEUTRALIZATION DURING PROCESSING OF...

METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...

METHOD AND SYSTEM FOR CONTROLLING CRITICAL DIMENSION AND ROUGHNESS...

APPARATUS AND METHOD FOR MASKLESS PATTERNED IMPLANTION

TECHNIQUE AND APPARATUS FOR MONITORING ION MASS, ENERGY, AND ANGLE...

CONTROL APPARATUS FOR PLASMA IMMERSION ION IMPLANTATION OF A DIELEC...

PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR PLASMA DOSE MEASUREMENT

METHOD AND APPARATUSES FOR PROVIDING ELECTRICAL CONTACT FOR PLASMA...

Faraday dose and uniformity monitor for plasma based ion implantation