Christopher P. Ausschnitt

Person

Naples, FL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Differential dose and focus monitor
- Patent number 9,411,249
- Issue date Aug 9, 2016
- GLOBALFOUNDRIES Inc.
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment data based process control system
- Patent number 9,360,858
- Issue date Jun 7, 2016
- GLOBALFOUNDRIES INC.
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Grant
Metrology marks for bidirectional grating superposition patterning...
- Patent number 9,257,351
- Issue date Feb 9, 2016
- GLOBALFOUNDRIES Inc.
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Target and method for mask-to-wafer CD, pattern placement and overl...
- Patent number 9,097,989
- Issue date Aug 4, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication of lithographic image fields using a proximity stitch m...
- Patent number 9,087,740
- Issue date Jul 21, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology marks for unidirectional grating superposition patterning...
- Patent number 9,059,102
- Issue date Jun 16, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Discrete sampling based nonlinear control system
- Patent number 8,874,249
- Issue date Oct 28, 2014
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Grant
Multi-layer chip overlay target and measurement
- Patent number 8,847,416
- Issue date Sep 30, 2014
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-calibrated alignment and overlay target and measurement
- Patent number 8,638,438
- Issue date Jan 28, 2014
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Discrete sampling based nonlinear control system
- Patent number 8,626,328
- Issue date Jan 7, 2014
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Grant
Multi-layer chip overlay target and measurement
- Patent number 8,361,683
- Issue date Jan 29, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer alignment and overlay target and measurement method
- Patent number 8,339,605
- Issue date Dec 25, 2012
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi layer alignment and overlay target and measurement method
- Patent number 8,107,079
- Issue date Jan 31, 2012
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Differential critical dimension and overlay metrology apparatus and...
- Patent number 8,035,824
- Issue date Oct 11, 2011
- International Business Machines Corporation
- Christopher Ausschnitt
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Methods for normalizing error in photolithographic processes
- Patent number 7,957,826
- Issue date Jun 7, 2011
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to control semiconductor device overlay using post etch imag...
- Patent number 7,879,515
- Issue date Feb 1, 2011
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi layer alignment and overlay target and measurement method
- Patent number 7,876,439
- Issue date Jan 25, 2011
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Differential critical dimension and overlay metrology apparatus and...
- Patent number 7,700,247
- Issue date Apr 20, 2010
- International Business Machines Corporation
- Christopher Ausschnitt
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Overlay target and measurement method using reference and sub-grids
- Patent number 7,626,702
- Issue date Dec 1, 2009
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to optimize grating test pattern for lithography monitoring...
- Patent number 7,585,601
- Issue date Sep 8, 2009
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer alignment and overlay target and measurement method
- Patent number 7,474,401
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of improving grating test pattern for lithography monitoring...
- Patent number 7,455,939
- Issue date Nov 25, 2008
- International Business Machines Corporation
- Timothy A. Brunner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Focus blur measurement and control method
- Patent number 7,439,001
- Issue date Oct 21, 2008
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay target and measurement method using reference and sub-grids
- Patent number 7,359,054
- Issue date Apr 15, 2008
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of patterning process metrology based on the intrinsic focus...
- Patent number 7,042,551
- Issue date May 9, 2006
- International Business Machines Corporation
- Christopher P Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining semiconductor overlay on groundrule devices
- Patent number 6,975,398
- Issue date Dec 13, 2005
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay target and measurement method using reference and sub-grids
- Patent number 6,937,337
- Issue date Aug 30, 2005
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single tone process window metrology target and method for lithogra...
- Patent number 6,879,400
- Issue date Apr 12, 2005
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated lithographic print and detection model for optical CD
- Patent number 6,869,739
- Issue date Mar 22, 2005
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shifted test pattern for monitoring focus and aberrations in...
- Patent number 6,842,237
- Issue date Jan 11, 2005
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
FABRICATION OF LITHOGRAPHIC IMAGE FIELDS USING A PROXIMITY STITCH M...
- Publication number 20150162249
- Publication date Jun 11, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DIFFERENTIAL DOSE AND FOCUS MONITOR
- Publication number 20150085266
- Publication date Mar 26, 2015
- International Business Machines Corporation
- CHRISTOPHER P. AUSSCHNITT
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY MARKS FOR BIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...
- Publication number 20150050755
- Publication date Feb 19, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY MARKS FOR UNIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...
- Publication number 20150048525
- Publication date Feb 19, 2015
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCRETE SAMPLING BASED NONLINEAR CONTROL SYSTEM
- Publication number 20140065733
- Publication date Mar 6, 2014
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT
- Publication number 20130075871
- Publication date Mar 28, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Calibrated Alignment and Overlay Target and Measurement
- Publication number 20130044320
- Publication date Feb 21, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT DATA BASED PROCESS CONTROL SYSTEM
- Publication number 20130041494
- Publication date Feb 14, 2013
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Application
DISCRETE SAMPLING BASED NONLINEAR CONTROL SYSTEM
- Publication number 20120191236
- Publication date Jul 26, 2012
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G05 - CONTROLLING REGULATING
Information Patent Application
MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT
- Publication number 20110248388
- Publication date Oct 13, 2011
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER ALIGNMENT AND OVERLAY TARGET AND MEASUREMENT METHOD
- Publication number 20110069314
- Publication date Mar 24, 2011
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI LAYER ALIGNMENT AND OVERLAY TARGET AND MEASUREMENT METHOD
- Publication number 20110058170
- Publication date Mar 10, 2011
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TARGET AND METHOD FOR MASK-TO-WAFER CD, PATTERN PLACEMENT AND OVERL...
- Publication number 20100190096
- Publication date Jul 29, 2010
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFERENTIAL CRITICAL DIMENSION AND OVERLAY METROLOGY APPARATUS AND...
- Publication number 20100103433
- Publication date Apr 29, 2010
- International Business Machines Corporation
- Christopher Ausschnitt
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Method To Control Semiconductor Device Overlay Using Post Etch Imag...
- Publication number 20090186286
- Publication date Jul 23, 2009
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS FOR NORMALIZING ERROR
- Publication number 20090053627
- Publication date Feb 26, 2009
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS BLUR MEASUREMENT AND CONTROL METHOD
- Publication number 20090011346
- Publication date Jan 8, 2009
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...
- Publication number 20090011342
- Publication date Jan 8, 2009
- International Business Machines Corporation
- Timothy A. BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI LAYER ALIGNMENT AND OVERLAY TARGET AND MEASUREMENT METHOD
- Publication number 20080259334
- Publication date Oct 23, 2008
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY TARGET AND MEASUREMENT METHOD USING REFERENCE AND SUB-GRIDS
- Publication number 20080144031
- Publication date Jun 19, 2008
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...
- Publication number 20080026298
- Publication date Jan 31, 2008
- International Business Machines Corporation
- Timothy A. BRUNNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Differential critical dimension and overlay metrology apparatus and...
- Publication number 20070105029
- Publication date May 10, 2007
- International Business Machines Corporation
- Christopher Ausschnitt
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Multi-layer Alignment and Overlay Target and Measurement Method
- Publication number 20070058169
- Publication date Mar 15, 2007
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Focus blur measurement and control method
- Publication number 20070041003
- Publication date Feb 22, 2007
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Overlay target and measurement method using reference and sub-grids
- Publication number 20050231722
- Publication date Oct 20, 2005
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of patterning process metrology based on the intrinsic focus...
- Publication number 20050168716
- Publication date Aug 4, 2005
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY TARGET AND MEASUREMENT METHOD USING REFERENCE AND SUB-GRIDS
- Publication number 20050105092
- Publication date May 19, 2005
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FOCUS CONTROL SYSTEM
- Publication number 20040070771
- Publication date Apr 15, 2004
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shifted test pattern for monitoring focus and aberrations in...
- Publication number 20030123052
- Publication date Jul 3, 2003
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G01 - MEASURING TESTING
Information Patent Application
Combined layer-to-layer and within-layer overlay control system
- Publication number 20030077527
- Publication date Apr 24, 2003
- International Business Machines Corporation
- Christopher P. Ausschnitt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Christopher P. Ausschnitt

Person

Patents Grantslast 30 patents

Differential dose and focus monitor

Alignment data based process control system

Metrology marks for bidirectional grating superposition patterning...

Target and method for mask-to-wafer CD, pattern placement and overl...

Fabrication of lithographic image fields using a proximity stitch m...

Metrology marks for unidirectional grating superposition patterning...

Discrete sampling based nonlinear control system

Multi-layer chip overlay target and measurement

Self-calibrated alignment and overlay target and measurement

Discrete sampling based nonlinear control system

Multi-layer chip overlay target and measurement

Multilayer alignment and overlay target and measurement method

Multi layer alignment and overlay target and measurement method

Differential critical dimension and overlay metrology apparatus and...

Methods for normalizing error in photolithographic processes

Method to control semiconductor device overlay using post etch imag...

Multi layer alignment and overlay target and measurement method

Differential critical dimension and overlay metrology apparatus and...

Overlay target and measurement method using reference and sub-grids

Method to optimize grating test pattern for lithography monitoring...

Multi-layer alignment and overlay target and measurement method

Method of improving grating test pattern for lithography monitoring...

Focus blur measurement and control method

Overlay target and measurement method using reference and sub-grids

Method of patterning process metrology based on the intrinsic focus...

Method for determining semiconductor overlay on groundrule devices

Overlay target and measurement method using reference and sub-grids

Single tone process window metrology target and method for lithogra...

Integrated lithographic print and detection model for optical CD

Phase shifted test pattern for monitoring focus and aberrations in...

Patents Applicationslast 30 patents

FABRICATION OF LITHOGRAPHIC IMAGE FIELDS USING A PROXIMITY STITCH M...

DIFFERENTIAL DOSE AND FOCUS MONITOR

METROLOGY MARKS FOR BIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...

METROLOGY MARKS FOR UNIDIRECTIONAL GRATING SUPERPOSITION PATTERNING...

DISCRETE SAMPLING BASED NONLINEAR CONTROL SYSTEM

MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT

Self-Calibrated Alignment and Overlay Target and Measurement

ALIGNMENT DATA BASED PROCESS CONTROL SYSTEM

DISCRETE SAMPLING BASED NONLINEAR CONTROL SYSTEM

MULTI-LAYER CHIP OVERLAY TARGET AND MEASUREMENT

MULTILAYER ALIGNMENT AND OVERLAY TARGET AND MEASUREMENT METHOD

MULTI LAYER ALIGNMENT AND OVERLAY TARGET AND MEASUREMENT METHOD

TARGET AND METHOD FOR MASK-TO-WAFER CD, PATTERN PLACEMENT AND OVERL...

DIFFERENTIAL CRITICAL DIMENSION AND OVERLAY METROLOGY APPARATUS AND...

Method To Control Semiconductor Device Overlay Using Post Etch Imag...

METHODS AND SYSTEMS FOR NORMALIZING ERROR

FOCUS BLUR MEASUREMENT AND CONTROL METHOD

METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...

MULTI LAYER ALIGNMENT AND OVERLAY TARGET AND MEASUREMENT METHOD

OVERLAY TARGET AND MEASUREMENT METHOD USING REFERENCE AND SUB-GRIDS

METHOD TO OPTIMIZE GRATING TEST PATTERN FOR LITHOGRAPHY MONITORING...

Differential critical dimension and overlay metrology apparatus and...

Multi-layer Alignment and Overlay Target and Measurement Method

Focus blur measurement and control method

Overlay target and measurement method using reference and sub-grids

Method of patterning process metrology based on the intrinsic focus...

OVERLAY TARGET AND MEASUREMENT METHOD USING REFERENCE AND SUB-GRIDS

FOCUS CONTROL SYSTEM

Phase shifted test pattern for monitoring focus and aberrations in...

Combined layer-to-layer and within-layer overlay control system