Christopher S. Ngai

Person

Burlingame, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Lithography process window enhancement for photoresist patterning
- Patent number 11,914,299
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Huixiong Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film structure for electric field guided photoresist patterning pro...
- Patent number 11,880,137
- Issue date Jan 23, 2024
- Applied Materials, Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spin-orbit torque MRAM structure and manufacture thereof
- Patent number 11,723,283
- Issue date Aug 8, 2023
- Applied Materials, Inc.
- Minrui Yu
- G11 - INFORMATION STORAGE
Information Patent Grant
Film structure for electric field guided photoresist patterning pro...
- Patent number 11,650,506
- Issue date May 16, 2023
- Applied Materials Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for verification and re-use of process fluids
- Patent number 11,609,505
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Mangesh Ashok Bangar
- G01 - MEASURING TESTING
Information Patent Grant
Contact over active gate structure
- Patent number 11,437,284
- Issue date Sep 6, 2022
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography process window enhancement for photoresist patterning
- Patent number 11,429,026
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Huixiong Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing amorphous silicon layers or silicon oxycarbi...
- Patent number 11,313,034
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Weimin Zeng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a layer
- Patent number 10,957,590
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for patterning substrates using asymmetric ph...
- Patent number 10,927,450
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structure
- Patent number 10,930,555
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact over active gate structure
- Patent number 10,930,556
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,865,464
- Issue date Jan 9, 2018
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Roll to roll wafer backside particle and contamination removal
- Patent number 9,815,091
- Issue date Nov 14, 2017
- APPLIED MATERIALS, INC.
- Christopher S. Ngai
- B08 - CLEANING
Information Patent Grant
Multi materials and selective removal enabled reverse tone process
- Patent number 9,728,406
- Issue date Aug 8, 2017
- Applied Materials, Inc.
- Huixiong Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanocrystalline diamond carbon film for 3D NAND hardmask application
- Patent number 9,502,262
- Issue date Nov 22, 2016
- Applied Materials, Inc.
- Yongmei Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for critical dimension reduction using conformal carbon films
- Patent number 9,337,051
- Issue date May 10, 2016
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line edge roughness reduction and double patterning
- Patent number 8,501,395
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device having silicon carbide and conductive pathway...
- Patent number 8,183,150
- Issue date May 22, 2012
- Applied Materials, Inc.
- Judy H. Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 7,335,462
- Issue date Feb 26, 2008
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 7,223,526
- Issue date May 29, 2007
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ashable layers for reducing critical dimensions of integrated circu...
- Patent number 7,105,442
- Issue date Sep 12, 2006
- Applied Materials, Inc.
- Hongching Shan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon carbide deposition for use as a low dielectric constant ant...
- Patent number 6,951,826
- Issue date Oct 4, 2005
- Applied Materials, Inc.
- Christopher Bencher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma treatment for copper oxide reduction
- Patent number 6,946,401
- Issue date Sep 20, 2005
- Applied Materials, Inc.
- Judy H. Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing an amorphous carbon layer
- Patent number 6,841,341
- Issue date Jan 11, 2005
- Applied Materials, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of nitrogen doping of fluorinated silicate glass (FSG) while...
- Patent number 6,797,646
- Issue date Sep 28, 2004
- Applied Materials Inc.
- Christopher Ngai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Airgap for semiconductor devices
- Patent number 6,780,753
- Issue date Aug 24, 2004
- Applied Materials Inc.
- Ian S. Latchford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having reduced oxidation interface
- Patent number 6,700,202
- Issue date Mar 2, 2004
- Applied Materials, Inc.
- Judy H. Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming silicon containing layers on a substrate
- Patent number 6,656,840
- Issue date Dec 2, 2003
- Applied Materials Inc.
- Nagarajan Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon carbide deposition for use as a low-dielectric constant ant...
- Patent number 6,635,583
- Issue date Oct 21, 2003
- Applied Materials, Inc.
- Christopher Bencher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF
- Publication number 20230389441
- Publication date Nov 30, 2023
- Applied Materials, Inc.
- Minrui YU
- G11 - INFORMATION STORAGE
Information Patent Application
FILM STRUCTURE FOR ELECTRIC FIELD GUIDED PHOTORESIST PATTERNING PRO...
- Publication number 20230229089
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Huixiong DAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY PROCESS WINDOW ENHANCEMENT FOR PHOTORESIST PATTERNING
- Publication number 20220413387
- Publication date Dec 29, 2022
- Applied Materials, Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURE
- Publication number 20220367285
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS
- Publication number 20220317579
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Mangesh Ashok BANGAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM STRUCTURE FOR ELECTRIC FIELD ASSISTED BAKE PROCESS
- Publication number 20220091513
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Mangesh Ashok BANGAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF
- Publication number 20210351342
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Minrui YUI
- G11 - INFORMATION STORAGE
Information Patent Application
LITHOGRAPHY PROCESS WINDOW ENHANCEMENT FOR PHOTORESIST PATTERNING
- Publication number 20210294216
- Publication date Sep 23, 2021
- Applied Materials, Inc.
- Huixiong Dai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY SIMULATION AND OPTICAL PROXIMITY CORRECTION
- Publication number 20210088896
- Publication date Mar 25, 2021
- Applied Materials, Inc.
- Huixiong DAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS CONTROL OF ELECTRIC FIELD GUIDED PHOTORESIST BAKING PROCESS
- Publication number 20210041785
- Publication date Feb 11, 2021
- Applied Materials, Inc.
- Huixiong DAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM STRUCTURE FOR ELECTRIC FIELD GUIDED PHOTORESIST PATTERNING PRO...
- Publication number 20200233307
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Huixiong DAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...
- Publication number 20200199741
- Publication date Jun 25, 2020
- Applied Materials, Inc.
- BENCHERKI MEBARKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A LAYER
- Publication number 20200161181
- Publication date May 21, 2020
- Applied Materials, Inc.
- Wenhui WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...
- Publication number 20200135464
- Publication date Apr 30, 2020
- Applied Materials, Inc.
- SREE RANGASAI V. KESAPRAGADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Contact Over Active Gate Structure
- Publication number 20200075408
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Over Active Gate Structure
- Publication number 20200075409
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Over Active Gate Structure
- Publication number 20200075422
- Publication date Mar 5, 2020
- Applied Materials, Inc.
- Wenhui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PVD Films For EUV Lithography
- Publication number 20190212656
- Publication date Jul 11, 2019
- Applied Materials, Inc.
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DEPOSITING AMORPHOUS SILICON LAYERS OR SILICON OXYCARBI...
- Publication number 20180142343
- Publication date May 24, 2018
- Weimin ZENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Surface Treatment For EUV Lithography
- Publication number 20180135183
- Publication date May 17, 2018
- Applied Materials, Inc.
- Weimin Zeng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION
- Publication number 20170062216
- Publication date Mar 2, 2017
- Applied Materials, Inc.
- Yongmei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION
- Publication number 20160064500
- Publication date Mar 3, 2016
- Applied Materials, Inc.
- Yongmei CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CRITICAL DIMENSION REDUCTION USING CONFORMAL CARBON FILMS
- Publication number 20160049305
- Publication date Feb 18, 2016
- Applied Materials, Inc.
- Bencherki MEBARKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI MATERIALS AND SELECTIVE REMOVAL ENABLED RESERVE TONE PROCESS
- Publication number 20160042950
- Publication date Feb 11, 2016
- Applied Materials, Inc.
- Huixiong DAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROLL TO ROLL WAFER BACKSIDE PARTICLE AND CONTAMINATION REMOVAL
- Publication number 20150371879
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- Christopher S. NGAI
- B08 - CLEANING
Information Patent Application
Dry Etch Processes
- Publication number 20130115778
- Publication date May 9, 2013
- Applied Materials, Inc.
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED TRIPLE PATTERNING
- Publication number 20120085733
- Publication date Apr 12, 2012
- Applied Materials, Inc.
- Bencherki Mebarki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line edge roughness reduction and double patterning
- Publication number 20090142926
- Publication date Jun 4, 2009
- Huixiong Dai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE HAVING SILICON CARBIDE AND CONDUCTIVE PATHWAY...
- Publication number 20090050902
- Publication date Feb 26, 2009
- Judy H. Huang
- B08 - CLEANING
Information Patent Application
METHOD OF DEPOSITING AN AMORPHOUS CARBON LAYER
- Publication number 20070128538
- Publication date Jun 7, 2007
- APPLIED MATERIALS, INC.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Christopher S. Ngai

Person

Patents Grantslast 30 patents

Lithography process window enhancement for photoresist patterning

Film structure for electric field guided photoresist patterning pro...

Spin-orbit torque MRAM structure and manufacture thereof

Film structure for electric field guided photoresist patterning pro...

Apparatus and methods for verification and re-use of process fluids

Contact over active gate structure

Lithography process window enhancement for photoresist patterning

Methods for depositing amorphous silicon layers or silicon oxycarbi...

Method for forming a layer

Methods and apparatus for patterning substrates using asymmetric ph...

Contact over active gate structure

Contact over active gate structure

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Roll to roll wafer backside particle and contamination removal

Multi materials and selective removal enabled reverse tone process

Nanocrystalline diamond carbon film for 3D NAND hardmask application

Method for critical dimension reduction using conformal carbon films

Line edge roughness reduction and double patterning

Semiconductor device having silicon carbide and conductive pathway...

Method of depositing an amorphous carbon layer

Method of depositing an amorphous carbon layer

Ashable layers for reducing critical dimensions of integrated circu...

Silicon carbide deposition for use as a low dielectric constant ant...

Plasma treatment for copper oxide reduction

Method of depositing an amorphous carbon layer

Method of nitrogen doping of fluorinated silicate glass (FSG) while...

Airgap for semiconductor devices

Semiconductor device having reduced oxidation interface

Method for forming silicon containing layers on a substrate

Silicon carbide deposition for use as a low-dielectric constant ant...

Patents Applicationslast 30 patents

SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF

FILM STRUCTURE FOR ELECTRIC FIELD GUIDED PHOTORESIST PATTERNING PRO...

LITHOGRAPHY PROCESS WINDOW ENHANCEMENT FOR PHOTORESIST PATTERNING

CONTACT OVER ACTIVE GATE STRUCTURE

APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS

FILM STRUCTURE FOR ELECTRIC FIELD ASSISTED BAKE PROCESS

SPIN-ORBIT TORQUE MRAM STRUCTURE AND MANUFACTURE THEREOF

LITHOGRAPHY PROCESS WINDOW ENHANCEMENT FOR PHOTORESIST PATTERNING

LITHOGRAPHY SIMULATION AND OPTICAL PROXIMITY CORRECTION

PROCESS CONTROL OF ELECTRIC FIELD GUIDED PHOTORESIST BAKING PROCESS

FILM STRUCTURE FOR ELECTRIC FIELD GUIDED PHOTORESIST PATTERNING PRO...

METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...

METHOD FOR FORMING A LAYER

METHODS AND APPARATUS FOR PATTERNING SUBSTRATES USING ASYMMETRIC PH...

Contact Over Active Gate Structure

Contact Over Active Gate Structure

Contact Over Active Gate Structure

PVD Films For EUV Lithography

METHODS FOR DEPOSITING AMORPHOUS SILICON LAYERS OR SILICON OXYCARBI...

Surface Treatment For EUV Lithography

NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION

NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION

METHOD FOR CRITICAL DIMENSION REDUCTION USING CONFORMAL CARBON FILMS

MULTI MATERIALS AND SELECTIVE REMOVAL ENABLED RESERVE TONE PROCESS

ROLL TO ROLL WAFER BACKSIDE PARTICLE AND CONTAMINATION REMOVAL

Dry Etch Processes

SELF ALIGNED TRIPLE PATTERNING

Line edge roughness reduction and double patterning

SEMICONDUCTOR DEVICE HAVING SILICON CARBIDE AND CONDUCTIVE PATHWAY...

METHOD OF DEPOSITING AN AMORPHOUS CARBON LAYER