CHUNG-SHIH PAN

Person

PALO ALTO, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 10,088,438
- Issue date Oct 2, 2018
- Hermes-Microvision, Inc.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 10,054,556
- Issue date Aug 21, 2018
- Hermes Microvision Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting and grounding an EUV mask
- Patent number 9,859,089
- Issue date Jan 2, 2018
- Hermes Microvision Inc.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 9,572,237
- Issue date Feb 14, 2017
- Hermes Microvision Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for inspecting an EUV mask
- Patent number 9,485,846
- Issue date Nov 1, 2016
- Hermes Microvision Inc.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Discharging method for charged particle beam imaging
- Patent number 9,460,887
- Issue date Oct 4, 2016
- Hermes Microvision, Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle operation system
- Patent number 9,164,399
- Issue date Oct 20, 2015
- Hermes-Microvision, Inc.
- Youjin Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure electron beam inspection system for inspecting extreme ul...
- Patent number 9,113,538
- Issue date Aug 18, 2015
- Hermes-Microvision, Inc.
- You-Jin Wang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of controlling particle absorption on a wafer sample being i...
- Patent number 8,604,428
- Issue date Dec 10, 2013
- Hermes-Microvision, Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure for discharging extreme ultraviolet mask
- Patent number 8,575,573
- Issue date Nov 5, 2013
- Hermes-Microvision, Inc.
- You-Jin Wang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Charged particle system for reticle/wafer defects inspection and re...
- Patent number 8,519,333
- Issue date Aug 27, 2013
- Hermes Microvision Inc.
- Chiyan Kuan
- G01 - MEASURING TESTING
Information Patent Grant
Method of controlling particle absorption on a wafer sample being i...
- Patent number 8,110,818
- Issue date Feb 7, 2012
- Hermes-Microvision, Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam defect review system
- Patent number 8,094,924
- Issue date Jan 10, 2012
- Hermes-Microvision, Inc.
- Jack Jau
- G01 - MEASURING TESTING
Information Patent Grant
Z-stage configuration and application thereof
- Patent number 8,031,344
- Issue date Oct 4, 2011
- Hermes-Microvision, Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and handling apparatus for placing patterning device on supp...
- Patent number 7,868,303
- Issue date Jan 11, 2011
- Hermes-Microvision, Inc.
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning device holding apparatus and application thereof
- Patent number 7,838,848
- Issue date Nov 23, 2010
- Hermes-Microvision, Inc.
- Hsuan-Bin Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of using a scanning electron microscope in semico...
- Patent number 6,791,095
- Issue date Sep 14, 2004
- Hermes-Microvision (Taiwan) Inc.
- Chung-Shih Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection system and method
- Patent number 5,502,306
- Issue date Mar 26, 1996
- KLA Instruments Corporation
- Dan Meisburger
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20190170671
- Publication date Jun 6, 2019
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20170052129
- Publication date Feb 23, 2017
- HERMES MICROVISION, INC.
- Guochong Weng
- G01 - MEASURING TESTING
Information Patent Application
STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...
- Publication number 20170053774
- Publication date Feb 23, 2017
- HERMES MICROVISION INC.
- You-Jin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Inspecting an EUV Mask
- Publication number 20150325402
- Publication date Nov 12, 2015
- HERMES MICROVISION INC.
- Guochong Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...
- Publication number 20150305131
- Publication date Oct 22, 2015
- HERMES MICROVISION INC.
- You-Jin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR INSPECTING AN EUV MASK
- Publication number 20150102220
- Publication date Apr 16, 2015
- HERMES MICROVISION INC.
- Guoching Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK
- Publication number 20140027634
- Publication date Jan 30, 2014
- HERMES MICROVISION, INC.
- You-Jin WANG
- G01 - MEASURING TESTING
Information Patent Application
Reticle Operation System
- Publication number 20130176549
- Publication date Jul 11, 2013
- Youjin Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK
- Publication number 20120292509
- Publication date Nov 22, 2012
- You-Jin WANG
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND...
- Publication number 20120280125
- Publication date Nov 8, 2012
- HERMES MICROVISION INC.
- CHIYAN KUAN
- G01 - MEASURING TESTING
Information Patent Application
METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING I...
- Publication number 20120006984
- Publication date Jan 12, 2012
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Z-STAGE CONFIGURATION AND APPLICATION THEREOF
- Publication number 20110101222
- Publication date May 5, 2011
- Hermes-Microvision, Inc.
- YOU-JIN WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISCHAGING METHOD FOR CHARGED PARTICLE BEAM IMAGING
- Publication number 20100288923
- Publication date Nov 18, 2010
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM DEFECT REVIEW SYSTEM
- Publication number 20100150429
- Publication date Jun 17, 2010
- Hermes-Microvision, Inc.
- Jack JAU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERNING DEVICE HOLDING APPARATUS AND APPLICATION THEREOF
- Publication number 20100102226
- Publication date Apr 29, 2010
- HERMES MICROVISION, INC.
- Hsuan-Bin HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND HANDLING APPARATUS FOR PLACING PATTERNING DEVICE ON SUP...
- Publication number 20100090107
- Publication date Apr 15, 2010
- You-Jin WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING I...
- Publication number 20100084554
- Publication date Apr 8, 2010
- You-Jin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLUSTER E-BEAM LITHOGRAPHY SYSTEM
- Publication number 20090121159
- Publication date May 14, 2009
- HERMES-MICROVISION, INC.
- ARCHI HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system of using a scanning electron microscope in semico...
- Publication number 20030178576
- Publication date Sep 25, 2003
- Chung-Shih Pan
- H01 - BASIC ELECTRIC ELEMENTS

CHUNG-SHIH PAN

Person

Patents Grantslast 30 patents

Method and system for inspecting an EUV mask

Structure electron beam inspection system for inspecting extreme ul...

Method and system for inspecting and grounding an EUV mask

Structure electron beam inspection system for inspecting extreme ul...

Method and system for inspecting an EUV mask

Discharging method for charged particle beam imaging

Reticle operation system

Structure electron beam inspection system for inspecting extreme ul...

Method of controlling particle absorption on a wafer sample being i...

Structure for discharging extreme ultraviolet mask

Charged particle system for reticle/wafer defects inspection and re...

Method of controlling particle absorption on a wafer sample being i...

E-beam defect review system

Z-stage configuration and application thereof

Method and handling apparatus for placing patterning device on supp...

Patterning device holding apparatus and application thereof

Method and system of using a scanning electron microscope in semico...

Electron beam inspection system and method

Patents Applicationslast 30 patents

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...

Method and System for Inspecting an EUV Mask

STRUCTURE ELECTRON BEAM INSPECTION SYSTEM FOR INSPECTING EXTREME UL...

METHOD AND SYSTEM FOR INSPECTING AN EUV MASK

STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK

Reticle Operation System

STRUCTURE FOR DISCHARGING EXTREME ULTRAVIOLET MASK

CHARGED PARTICLE SYSTEM FOR RETICLE / WAFER DEFECTS INSPECTION AND...

METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING I...

Z-STAGE CONFIGURATION AND APPLICATION THEREOF

DISCHAGING METHOD FOR CHARGED PARTICLE BEAM IMAGING

E-BEAM DEFECT REVIEW SYSTEM

PATTERNING DEVICE HOLDING APPARATUS AND APPLICATION THEREOF

METHOD AND HANDLING APPARATUS FOR PLACING PATTERNING DEVICE ON SUP...

METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING I...

CLUSTER E-BEAM LITHOGRAPHY SYSTEM

Method and system of using a scanning electron microscope in semico...