Clinton L. Montgomery

Person

Copell, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Post high voltage gate oxide pattern high-vacuum outgas surface tre...
- Patent number 7,402,524
- Issue date Jul 22, 2008
- Texas Instruments Incorporated
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual-gate integrated circuit semiconductor device
- Patent number 7,339,240
- Issue date Mar 4, 2008
- Texas Instruments Incorporated
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced hydrogen sidewall spacer oxide
- Patent number 7,306,995
- Issue date Dec 11, 2007
- Texas Instruments Incorporated
- Haowen Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduced hydrogen sidewall spacer oxide
- Patent number 7,173,296
- Issue date Feb 6, 2007
- Texas Instruments Incorporated
- Haowen Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post high voltage gate dielectric pattern plasma surface treatment
- Patent number 7,049,242
- Issue date May 23, 2006
- Texas Instruments Incorporated
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Post high voltage gate oxide pattern high-vacuum outgas surface tre...
- Patent number 7,018,925
- Issue date Mar 28, 2006
- Texas Instruments Incorporated
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nickel silicide—silicon nitride adhesion through surface pa...
- Patent number 6,831,008
- Issue date Dec 14, 2004
- Texas Instruments Incorporated
- Jiong-Ping Lu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Post high voltage gate dielectric pattern plasma surface treatment
- Publication number 20060183337
- Publication date Aug 17, 2006
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post high voltage gate oxide pattern high-vacuum outgas surface tre...
- Publication number 20060084229
- Publication date Apr 20, 2006
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced hydrogen sidewall spacer oxide
- Publication number 20050133876
- Publication date Jun 23, 2005
- Haowen Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced hydrogen sidewall spacer oxide
- Publication number 20050133835
- Publication date Jun 23, 2005
- Haowen Bu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nickel silicide - silicon nitride adhesion through surface passivation
- Publication number 20050090087
- Publication date Apr 28, 2005
- Jiong-Ping Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post high voltage gate oxide pattern high-vacuum outgas surface tre...
- Publication number 20040266113
- Publication date Dec 30, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post high voltage gate dielectric pattern plasma surface treatment
- Publication number 20040142570
- Publication date Jul 22, 2004
- TEXAS INSTRUMENTS INCORPORATED
- Brian K. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nickel silicide - silicon nitride adhesion through surface passivation
- Publication number 20040061184
- Publication date Apr 1, 2004
- Jiong-Ping Lu
- H01 - BASIC ELECTRIC ELEMENTS

Clinton L. Montgomery

Person

Patents Grantslast 30 patents

Post high voltage gate oxide pattern high-vacuum outgas surface tre...

Dual-gate integrated circuit semiconductor device

Reduced hydrogen sidewall spacer oxide

Reduced hydrogen sidewall spacer oxide

Post high voltage gate dielectric pattern plasma surface treatment

Post high voltage gate oxide pattern high-vacuum outgas surface tre...

Nickel silicide&#x02014;silicon nitride adhesion through surface pa...

Patents Applicationslast 30 patents

Post high voltage gate dielectric pattern plasma surface treatment

Post high voltage gate oxide pattern high-vacuum outgas surface tre...

Reduced hydrogen sidewall spacer oxide

Reduced hydrogen sidewall spacer oxide

Nickel silicide - silicon nitride adhesion through surface passivation

Post high voltage gate oxide pattern high-vacuum outgas surface tre...

Post high voltage gate dielectric pattern plasma surface treatment

Nickel silicide - silicon nitride adhesion through surface passivation

Nickel silicide—silicon nitride adhesion through surface pa...