Craig Alan Roderick

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma reactor having RF power applicator and a dual-purpose window
- Patent number 6,790,311
- Issue date Sep 14, 2004
- Kenneth S Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Patent number 6,736,931
- Issue date May 18, 2004
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor using inductive RF coupling, and processes
- Patent number 6,545,420
- Issue date Apr 8, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor using inductive RF coupling, and processes
- Patent number 6,518,195
- Issue date Feb 11, 2003
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal control apparatus for inductively coupled RF plasma reactor...
- Patent number 6,514,376
- Issue date Feb 4, 2003
- Applied Materials Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic confinement in a plasma reactor having an RF bias electrode
- Patent number 6,488,807
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF Plasma reactor having an overhead solenoidal...
- Patent number 6,454,898
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF plasma reactor having an antenna adjacent a...
- Patent number 6,444,085
- Issue date Sep 3, 2002
- Applied Materials Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,440,866
- Issue date Aug 27, 2002
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor having a dual mode RF power application
- Patent number 6,365,063
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- Kenneth S Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma system with a balanced source
- Patent number 6,353,206
- Issue date Mar 5, 2002
- Applied Materials, Inc.
- Craig A. Roderick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch processes
- Patent number 6,251,792
- Issue date Jun 26, 2001
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF tuning method for an RF plasma reactor using frequency servoing...
- Patent number 6,252,354
- Issue date Jun 26, 2001
- Applied Materials, Inc.
- Kenneth Collins
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,218,312
- Issue date Apr 17, 2001
- Applied Materials Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF plasma reactor having an overhead solenoidal...
- Patent number 6,165,311
- Issue date Dec 26, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled RF plasma reactor having an overhead solenoidal...
- Patent number 6,074,512
- Issue date Jun 13, 2000
- Applied Materials, Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma chamber support having an electrically coupled collar ring
- Patent number 6,074,488
- Issue date Jun 13, 2000
- Applied Materials, Inc.
- Craig A. Roderick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process used in an RF coupled plasma reactor
- Patent number 6,068,784
- Issue date May 30, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal control apparatus for inductively coupled RF plasma reactor...
- Patent number 6,063,233
- Issue date May 16, 2000
- Applied Materials, Inc.
- Kenneth Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for exciting a plasma in a semiconductor wafer processing...
- Patent number 6,043,607
- Issue date Mar 28, 2000
- Applied Materials, Inc.
- Craig A. Roderick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,036,877
- Issue date Mar 14, 2000
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 6,024,826
- Issue date Feb 15, 2000
- Applied Materials, Inc.
- Kenneth Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with heated source of a polymer-hardening precursor...
- Patent number 5,990,017
- Issue date Nov 23, 1999
- Applied Materials, Inc.
- Kenneth Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for directly measuring component values within an RF circuit
- Patent number 5,872,456
- Issue date Feb 16, 1999
- Applied Materials, Inc.
- Craig Alan Roderick
- G01 - MEASURING TESTING
Information Patent Grant
Electrostatic chuck usable in high density plasma
- Patent number 5,583,737
- Issue date Dec 10, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronically tuned matching networks using adjustable inductance...
- Patent number 5,574,410
- Issue date Nov 12, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Electronically tuned matching networks using adjustable inductance...
- Patent number 5,572,170
- Issue date Nov 5, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Silicon scavenger in an inductively coupled RF plasma reactor
- Patent number 5,556,501
- Issue date Sep 17, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck usable in high density plasma
- Patent number 5,539,609
- Issue date Jul 23, 1996
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronically tuned matching networks using adjustable inductance...
- Patent number 5,392,018
- Issue date Feb 21, 1995
- Applied Materials, Inc.
- Kenneth S. Collins
- H03 - BASIC ELECTRONIC CIRCUITRY

Patents Applicationslast 30 patents

Information Patent Application
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Publication number 20040163764
- Publication date Aug 26, 2004
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma reactor having RF power applicator and a dual-purpose window
- Publication number 20020096259
- Publication date Jul 25, 2002
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively coupled RF plasma reactor and plasma chamber enclosure...
- Publication number 20020020499
- Publication date Feb 21, 2002
- APPLIED MATERIALS, INC.
- Kenneth S. Collins
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSES USED IN AN INDUCTIVELY COUPLED PLASMA REACTOR
- Publication number 20020004309
- Publication date Jan 10, 2002
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMAL CONTROL APPARATUS FOR INDUCTIVELY COUPLED RF PLASMA REACTOR...
- Publication number 20010054483
- Publication date Dec 27, 2001
- KENNETH S. COLLINS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Craig Alan Roderick

Person

Patents Grantslast 30 patents

Plasma reactor having RF power applicator and a dual-purpose window

Inductively coupled RF plasma reactor and plasma chamber enclosure...

Plasma reactor using inductive RF coupling, and processes

Plasma reactor using inductive RF coupling, and processes

Thermal control apparatus for inductively coupled RF plasma reactor...

Magnetic confinement in a plasma reactor having an RF bias electrode

Inductively coupled RF Plasma reactor having an overhead solenoidal...

Inductively coupled RF plasma reactor having an antenna adjacent a...

Plasma reactor with heated source of a polymer-hardening precursor...

Plasma reactor having a dual mode RF power application

Plasma system with a balanced source

Plasma etch processes

RF tuning method for an RF plasma reactor using frequency servoing...

Plasma reactor with heated source of a polymer-hardening precursor...

Inductively coupled RF plasma reactor having an overhead solenoidal...

Inductively coupled RF plasma reactor having an overhead solenoidal...

Plasma chamber support having an electrically coupled collar ring

Process used in an RF coupled plasma reactor

Thermal control apparatus for inductively coupled RF plasma reactor...

Apparatus for exciting a plasma in a semiconductor wafer processing...

Plasma reactor with heated source of a polymer-hardening precursor...

Plasma reactor with heated source of a polymer-hardening precursor...

Plasma reactor with heated source of a polymer-hardening precursor...

Apparatus for directly measuring component values within an RF circuit

Electrostatic chuck usable in high density plasma

Electronically tuned matching networks using adjustable inductance...

Electronically tuned matching networks using adjustable inductance...

Silicon scavenger in an inductively coupled RF plasma reactor

Electrostatic chuck usable in high density plasma

Electronically tuned matching networks using adjustable inductance...

Patents Applicationslast 30 patents

Inductively coupled RF plasma reactor and plasma chamber enclosure...

Plasma reactor having RF power applicator and a dual-purpose window

Inductively coupled RF plasma reactor and plasma chamber enclosure...

PROCESSES USED IN AN INDUCTIVELY COUPLED PLASMA REACTOR

THERMAL CONTROL APPARATUS FOR INDUCTIVELY COUPLED RF PLASMA REACTOR...