Curt T. Dundas

Person

Albuquerque, NM, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for low temperature annealing of metallization micro-structu...
- Patent number 7,462,269
- Issue date Dec 9, 2008
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for rinsing and drying
- Patent number 7,429,537
- Issue date Sep 30, 2008
- Semitool, Inc.
- Brian K. Aegerter
- B08 - CLEANING
Information Patent Grant
Selective treatment of microelectric workpiece surfaces
- Patent number 7,399,713
- Issue date Jul 15, 2008
- Semitool, Inc.
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing microelectronic workpieces usi...
- Patent number 7,102,763
- Issue date Sep 5, 2006
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low-temperature annealing of metallization...
- Patent number 7,001,471
- Issue date Feb 21, 2006
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for low temperature annealing of metallization...
- Patent number 6,994,776
- Issue date Feb 7, 2006
- Semitool Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,794,291
- Issue date Sep 21, 2004
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,692,613
- Issue date Feb 17, 2004
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Selective treatment of microelectronic workpiece surfaces
- Patent number 6,632,292
- Issue date Oct 14, 2003
- Semitool, Inc.
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for low-temperature annealing of metallization microstruc...
- Patent number 6,508,920
- Issue date Jan 21, 2003
- Semitool, Inc.
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,447,633
- Issue date Sep 10, 2002
- Semitdol, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Reactor for processing a semiconductor wafer
- Patent number 6,423,642
- Issue date Jul 23, 2002
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Grant
Selective treatment of the surface of a microelectronic workpiece
- Patent number 6,413,436
- Issue date Jul 2, 2002
- Semitool, Inc.
- Brian Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Methods and apparatus for rinsing and drying
- Publication number 20060070638
- Publication date Apr 6, 2006
- Brian K. Aegerter
- B08 - CLEANING
Information Patent Application
Processes for removing residue from a workpiece
- Publication number 20050233589
- Publication date Oct 20, 2005
- Brian K. Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective processing of microelectronic workpiece surfaces
- Publication number 20050217707
- Publication date Oct 6, 2005
- Brian K. Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for processing a semiconductor wafer
- Publication number 20050032391
- Publication date Feb 10, 2005
- Semitool, Inc.
- Steven L. Peace
- B08 - CLEANING
Information Patent Application
Selective treatment of the surface of a microelectronic workpiece
- Publication number 20050020001
- Publication date Jan 27, 2005
- Brian Aegerter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective treatment of microelectronic workpiece surfaces
- Publication number 20040035448
- Publication date Feb 26, 2004
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective treatment of microelectronic workpiece surfaces
- Publication number 20040023494
- Publication date Feb 5, 2004
- Semitool, Inc.
- Brian K. Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for processing microelectronic workpieces usi...
- Publication number 20030020928
- Publication date Jan 30, 2003
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reactor for processing a semiconductor wafer
- Publication number 20020189652
- Publication date Dec 19, 2002
- Semitool, Inc.
- Steven L. Peace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reactor for processing a semiconductor wafer
- Publication number 20020185163
- Publication date Dec 12, 2002
- Semitool, Inc.
- Steven L. Peace
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective treatment of the surface of a microelectronic workpiece
- Publication number 20020168863
- Publication date Nov 14, 2002
- Semitool, Inc.
- Brian Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective treatment of the surface of a microelectronic workpiece
- Publication number 20020144973
- Publication date Oct 10, 2002
- Semitool, Inc.
- Brian Aegerter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for low temperature annealing of metallization...
- Publication number 20020074233
- Publication date Jun 20, 2002
- Semitool, Inc.
- Thomas L. Ritzdorf
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method and apparatus for low temperature annealing of metallization...
- Publication number 20020037641
- Publication date Mar 28, 2002
- Thomas L. Ritzdorf
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR LOW-TEMPERATURE ANNEALING OF METALLIZATION...
- Publication number 20020000271
- Publication date Jan 3, 2002
- Semitool, Inc.
- THOMAS RITZDORF
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Curt T. Dundas

Person

Patents Grantslast 30 patents

Method for low temperature annealing of metallization micro-structu...

Methods and apparatus for rinsing and drying

Selective treatment of microelectric workpiece surfaces

Methods and apparatus for processing microelectronic workpieces usi...

Method and apparatus for low-temperature annealing of metallization...

Method and apparatus for low temperature annealing of metallization...

Reactor for processing a semiconductor wafer

Reactor for processing a semiconductor wafer

Selective treatment of microelectronic workpiece surfaces

Apparatus for low-temperature annealing of metallization microstruc...

Reactor for processing a semiconductor wafer

Reactor for processing a semiconductor wafer

Selective treatment of the surface of a microelectronic workpiece

Patents Applicationslast 30 patents

Methods and apparatus for rinsing and drying

Processes for removing residue from a workpiece

Selective processing of microelectronic workpiece surfaces

Method for processing a semiconductor wafer

Selective treatment of the surface of a microelectronic workpiece

Selective treatment of microelectronic workpiece surfaces

Selective treatment of microelectronic workpiece surfaces

Methods and apparatus for processing microelectronic workpieces usi...

Reactor for processing a semiconductor wafer

Reactor for processing a semiconductor wafer

Selective treatment of the surface of a microelectronic workpiece

Selective treatment of the surface of a microelectronic workpiece

Method and apparatus for low temperature annealing of metallization...

Method and apparatus for low temperature annealing of metallization...

METHOD AND APPARATUS FOR LOW-TEMPERATURE ANNEALING OF METALLIZATION...