Cyrus E. Tabery

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Voltage contrast metrology mark
- Patent number 12,169,366
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 12,055,904
- Issue date Aug 6, 2024
- ASML Netherlands B.V.
- Youping Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing devices
- Patent number 12,044,980
- Issue date Jul 23, 2024
- ASML Netherlands B.V.
- Abraham Slachter
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,947,266
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Nicolaas Petrus Marcus Brantjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining root cause affecting yield in a semiconducto...
- Patent number 11,803,127
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Chenxi Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,714,357
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a control parameter for an apparatus utilize...
- Patent number 11,181,829
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Cyrus Emil Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to predict yield of a device manufacturing process
- Patent number 11,086,229
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for forming integrated circuit
- Patent number 8,629,535
- Issue date Jan 14, 2014
- GLOBALFOUNDRIES Inc.
- Richard J. Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double and triple gate MOSFET devices and methods for making same
- Patent number 8,580,660
- Issue date Nov 12, 2013
- Advanced Micro Devices, Inc.
- Ming-Ren Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Double and triple gate MOSFET devices and methods for making same
- Patent number 8,222,680
- Issue date Jul 17, 2012
- Advanced Micro Devices, Inc.
- Ming-Ren Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming small contacts
- Patent number 7,915,160
- Issue date Mar 29, 2011
- GLOBALFOUNDRIES Inc.
- Cyrus E. Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer assembly having a contrast enhancing top anti-reflecting coat...
- Patent number 7,855,048
- Issue date Dec 21, 2010
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removal of immersion lithography medium in immersion lit...
- Patent number 7,741,012
- Issue date Jun 22, 2010
- Advanced Micro Devices, Inc.
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,657,864
- Issue date Feb 2, 2010
- GLOBALFOUNDRIES Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for designing an integrated circuit device
- Patent number 7,543,256
- Issue date Jun 2, 2009
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for forming integrated circuit
- Patent number 7,521,304
- Issue date Apr 21, 2009
- Advanced Micro Devices, Inc.
- Richard J. Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of semiconductor devices to achieve <100> channel orienta...
- Patent number 7,432,558
- Issue date Oct 7, 2008
- Advanced Micro Devices, Inc.
- Shibly S. Ahmed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for fabricating contact holes
- Patent number 7,384,725
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Anna M. Minvielle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning laser thermal annealing
- Patent number 7,351,638
- Issue date Apr 1, 2008
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimizing an integrated circuit layout by taking into consideratio...
- Patent number 7,313,769
- Issue date Dec 25, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithography mask utilizing asymmetric light source
- Patent number 7,276,328
- Issue date Oct 2, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,269,804
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Localized halo implant region formed using tilt pre-amorphization i...
- Patent number 7,211,489
- Issue date May 1, 2007
- Advanced Micro Devices, Inc.
- Qi Xiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for metrology recipe generation and review and an...
- Patent number 7,207,017
- Issue date Apr 17, 2007
- Advanced Micro Devices, Inc.
- Cyrus Tabery
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for design rule creation and selection
- Patent number 7,194,725
- Issue date Mar 20, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for forming small contacts
- Patent number 7,183,223
- Issue date Feb 27, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using carbon spacers for critical dimension (CD) reduction
- Patent number 7,169,711
- Issue date Jan 30, 2007
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning with rigid organic under-layer
- Patent number 7,122,455
- Issue date Oct 17, 2006
- Advanced Micro Devices, Inc.
- Christopher F. Lyons
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protection of charge trapping dielectric flash memory devices from...
- Patent number 7,118,967
- Issue date Oct 10, 2006
- Spansion, LLC
- Minh V. Ngo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING MARK STRUCTURE FOR OVERLAY FINGERPRINTS
- Publication number 20230408931
- Publication date Dec 21, 2023
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...
- Publication number 20230341784
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Tijmen Pieter COLLIGNON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR PULSED VOLTAGE CONTRAST DETECTION AND CAPTU...
- Publication number 20230335374
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Benoit Herve GAURY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLASSIFYING SEMICONDUCTOR WAFERS
- Publication number 20230316103
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Vahid BASTANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...
- Publication number 20220026810
- Publication date Jan 27, 2022
- ASML NETHERLANDS B.V.
- Nicolaas Petrus Marcus BRANTJES
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20220011728
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Youping ZHANG
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD OF MANUFACTURING DEVICES
- Publication number 20210397172
- Publication date Dec 23, 2021
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G05 - CONTROLLING REGULATING
Information Patent Application
METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...
- Publication number 20210389677
- Publication date Dec 16, 2021
- ASML NETHERLANDS B.V.
- Chenxi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20210325788
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZE...
- Publication number 20210132508
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Cyrus Emil TABERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VOLTAGE CONTRAST METROLOGY MARK
- Publication number 20210088917
- Publication date Mar 25, 2021
- ASML NETHERLANDS B.V.
- Cyrus Emil TABERY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS
- Publication number 20200103761
- Publication date Apr 2, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOUBLE AND TRIPLE GATE MOSFET DEVICES AND METHODS FOR MAKING SAME
- Publication number 20120252193
- Publication date Oct 4, 2012
- Advanced Micro Devices, Inc.
- Ming-Ren LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK FOR FORMING INTEGRATED CIRCUIT
- Publication number 20120007221
- Publication date Jan 12, 2012
- GLOBALFOUNDRIES INC.
- Richard J. Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR MONITORING OPTICAL PROXIMITY CORRECTION PE...
- Publication number 20090144692
- Publication date Jun 4, 2009
- Jason P. Cain
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MONITORING MARGINAL LAYOUT DESIGN RULES
- Publication number 20090144686
- Publication date Jun 4, 2009
- KEVIN R. LENSING
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...
- Publication number 20070209030
- Publication date Sep 6, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for integrated circuit device design and manufact...
- Publication number 20050229125
- Publication date Oct 13, 2005
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for fabricating contact holes
- Publication number 20050221233
- Publication date Oct 6, 2005
- Anna M. Minvielle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Self aligned damascene gate
- Publication number 20050104091
- Publication date May 19, 2005
- Cyrus E. Tabery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for elimination of bubbles in immersion medium...
- Publication number 20050048223
- Publication date Mar 3, 2005
- Adam R. Pawloski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Planarizing gate material to improve gate critical dimension in sem...
- Publication number 20040092062
- Publication date May 13, 2004
- Shibly S. Ahmed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of using an amorphous carbon layer for improved reticle fabr...
- Publication number 20040079726
- Publication date Apr 29, 2004
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Double and triple gate MOSFET devices and methods for making same
- Publication number 20040075122
- Publication date Apr 22, 2004
- Ming-Ren Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Post etch overlay metrology to avoid absorbing layers preventing me...
- Publication number 20040063008
- Publication date Apr 1, 2004
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Low-temperature post-dopant activation process
- Publication number 20030082880
- Publication date May 1, 2003
- Advanced Micro Devices, Inc.
- Bin Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-situ or ex-situ profile monitoring of phase openings on alternat...
- Publication number 20030052084
- Publication date Mar 20, 2003
- Cyrus E. Tabery
- G01 - MEASURING TESTING

Cyrus E. Tabery

Person

Patents Grantslast 30 patents

Voltage contrast metrology mark

Method to predict yield of a device manufacturing process

Method of manufacturing devices

Method for controlling a manufacturing process and associated appar...

Method for determining root cause affecting yield in a semiconducto...

Method to predict yield of a device manufacturing process

Method for determining a control parameter for an apparatus utilize...

Method to predict yield of a device manufacturing process

Mask for forming integrated circuit

Double and triple gate MOSFET devices and methods for making same

Double and triple gate MOSFET devices and methods for making same

Methods for forming small contacts

Wafer assembly having a contrast enhancing top anti-reflecting coat...

Method for removal of immersion lithography medium in immersion lit...

System and method for integrated circuit device design and manufact...

System and method for designing an integrated circuit device

Method for forming integrated circuit

Formation of semiconductor devices to achieve <100> channel orienta...

System and method for fabricating contact holes

Scanning laser thermal annealing

Optimizing an integrated circuit layout by taking into consideratio...

Lithography mask utilizing asymmetric light source

System and method for integrated circuit device design and manufact...

Localized halo implant region formed using tilt pre-amorphization i...

Method and system for metrology recipe generation and review and an...

System and method for design rule creation and selection

Methods for forming small contacts

Method of using carbon spacers for critical dimension (CD) reduction

Patterning with rigid organic under-layer

Protection of charge trapping dielectric flash memory devices from...

Patents Applicationslast 30 patents

METHOD OF DETERMINING MARK STRUCTURE FOR OVERLAY FINGERPRINTS

METHOD AND APPARATUS FOR IDENTIFYING CONTAMINATION IN A SEMICONDUCT...

SYSTEMS AND METHODS FOR PULSED VOLTAGE CONTRAST DETECTION AND CAPTU...

METHOD FOR CLASSIFYING SEMICONDUCTOR WAFERS

METHOD FOR CONTROLLING A MANUFACTURING PROCESS AND ASSOCIATED APPAR...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD OF MANUFACTURING DEVICES

METHOD FOR DETERMINING ROOT CAUSE AFFECTING YIELD IN A SEMICONDUCTO...

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

METHOD FOR DETERMINING A CONTROL PARAMETER FOR AN APPARATUS UTILIZE...

VOLTAGE CONTRAST METROLOGY MARK

METHOD TO PREDICT YIELD OF A DEVICE MANUFACTURING PROCESS

DOUBLE AND TRIPLE GATE MOSFET DEVICES AND METHODS FOR MAKING SAME

MASK FOR FORMING INTEGRATED CIRCUIT

METHOD AND APPARATUS FOR MONITORING OPTICAL PROXIMITY CORRECTION PE...

METHOD AND APPARATUS FOR MONITORING MARGINAL LAYOUT DESIGN RULES

SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...

System and method for integrated circuit device design and manufact...

System and method for fabricating contact holes

Self aligned damascene gate

Method and apparatus for elimination of bubbles in immersion medium...

Planarizing gate material to improve gate critical dimension in sem...

Method of using an amorphous carbon layer for improved reticle fabr...

Double and triple gate MOSFET devices and methods for making same

Post etch overlay metrology to avoid absorbing layers preventing me...

Low-temperature post-dopant activation process

In-situ or ex-situ profile monitoring of phase openings on alternat...