Da Li

Person

Newark, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Atomic layer etch and selective deposition process for extreme ultr...
- Patent number 12,062,538
- Issue date Aug 13, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch using a sacrificial mask
- Patent number 12,027,375
- Issue date Jul 2, 2024
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,988,965
- Issue date May 21, 2024
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Underlayer for photoresist adhesion and dose reduction
- Patent number 11,314,168
- Issue date Apr 26, 2022
- Lam Research Corporation
- Samantha S. H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST
- Publication number 20250060674
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Da LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...
- Publication number 20240429045
- Publication date Dec 26, 2024
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...
- Publication number 20240329539
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...
- Publication number 20240329538
- Publication date Oct 3, 2024
- LAM RESEARCH CORPORATION
- Da Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20240255850
- Publication date Aug 1, 2024
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...
- Publication number 20240192590
- Publication date Jun 13, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST
- Publication number 20240036474
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Daniel PETER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY BACKSIDE AND BEVEL EDGE CLEAN OF PHOTORESIST
- Publication number 20230314954
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Daniel PETER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION
- Publication number 20230230811
- Publication date Jul 20, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST APPLICATION/EXPOSURE TREATMENTS TO IMPROVE DRY DEVELOPMENT PER...
- Publication number 20230031955
- Publication date Feb 2, 2023
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY CHAMBER CLEAN OF PHOTORESIST FILMS
- Publication number 20220344136
- Publication date Oct 27, 2022
- LAM RESEARCH CORPORATION
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20220244645
- Publication date Aug 4, 2022
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...
- Publication number 20220216050
- Publication date Jul 7, 2022
- LAM RESEARCH CORPORATION
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH USING A SACRIFICIAL MASK
- Publication number 20220122848
- Publication date Apr 21, 2022
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20220043334
- Publication date Feb 10, 2022
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION
- Publication number 20220035247
- Publication date Feb 3, 2022
- LAM RESEARCH CORPORATION
- Samantha S.H. Tan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Photoresist development with halide chemistries

Atomic layer etch and selective deposition process for extreme ultr...

Selective etch using a sacrificial mask

Underlayer for photoresist adhesion and dose reduction

Underlayer for photoresist adhesion and dose reduction

Patents Applicationslast 30 patents

ALL-IN-ONE DRY DEVELOPMENT FOR METAL-CONTAINING PHOTORESIST

ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

MULTI-STEP POST-EXPOSURE TREATMENT TO IMPROVE DRY DEVELOPMENT PERFO...

CYCLIC DEVELOPMENT OF METAL OXIDE BASED PHOTORESIST FOR ETCH STOP D...

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

APPARATUS AND PROCESS FOR EUV DRY RESIST SENSITIZATION BY GAS PHASE...

CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST

DRY BACKSIDE AND BEVEL EDGE CLEAN OF PHOTORESIST

SURFACE MODIFICATION FOR METAL-CONTAINING PHOTORESIST DEPOSITION

POST APPLICATION/EXPOSURE TREATMENTS TO IMPROVE DRY DEVELOPMENT PER...

DRY CHAMBER CLEAN OF PHOTORESIST FILMS

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

ATOMIC LAYER ETCH AND SELECTIVE DEPOSITION PROCESS FOR EXTREME ULTR...

SELECTIVE ETCH USING A SACRIFICIAL MASK

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION

UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION