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last 30 patents
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Patent Grant
Monomer, polymer, negative resist composition, photomask blank, and...
Patent number
11,548,844
Issue date
Jan 10, 2023
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Onium salt, negative resist composition, and resist pattern forming...
Patent number
11,429,023
Issue date
Aug 30, 2022
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and resist patterning process
Patent number
11,131,926
Issue date
Sep 28, 2021
Shin-Etsu Chemical Co., Ltd.
Takahiro Suzuki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Sulfonium compound, positive resist composition, and resist pattern...
Patent number
11,124,477
Issue date
Sep 21, 2021
Shin-Etsu Chemical Co., Ltd.
Naoya Inoue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and patterning process
Patent number
11,048,165
Issue date
Jun 29, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Onium salt, chemically amplified positive resist composition, and r...
Patent number
11,036,136
Issue date
Jun 15, 2021
Shin-Etsu Chemical Co., Ltd.
Naoya Inoue
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
10,968,175
Issue date
Apr 6, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, negative resist composition, and pattern forming process
Patent number
10,377,842
Issue date
Aug 13, 2019
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative-tone resist compositions and multifunctional polymers therein
Patent number
10,345,700
Issue date
Jul 9, 2019
International Business Machines Corporation
Luisa D. Bozano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer, positive resist composition, and pattern forming process
Patent number
10,191,372
Issue date
Jan 29, 2019
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Polymer compound, negative resist composition, laminate, patterning...
Patent number
9,969,829
Issue date
May 15, 2018
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Polymer compound, positive resist composition, laminate, and resist...
Patent number
9,944,738
Issue date
Apr 17, 2018
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified negative resist composition and patterning pro...
Patent number
RE46765
Issue date
Mar 27, 2018
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
Information
Patent Grant
Photomask blank, resist pattern forming process, and method for mak...
Patent number
9,904,169
Issue date
Feb 27, 2018
Shin-Etsu Chemical Co., Ltd.
Teppei Adachi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Shrink material and pattern forming process
Patent number
9,904,172
Issue date
Feb 27, 2018
Shin-Etsu Chemical Co., Ltd.
Kentaro Kumaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified negative resist composition and patterning pro...
Patent number
RE46736
Issue date
Feb 27, 2018
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
Information
Patent Grant
Chemically amplified negative resist composition using novel onium...
Patent number
9,740,098
Issue date
Aug 22, 2017
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified positive resist composition and pattern formin...
Patent number
9,720,323
Issue date
Aug 1, 2017
Shin-Etsu Chemical Co., Ltd.
Masaaki Kotake
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
9,709,890
Issue date
Jul 18, 2017
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Negative resist composition and pattern forming process
Patent number
9,645,493
Issue date
May 9, 2017
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Shrink material and pattern forming process
Patent number
9,632,417
Issue date
Apr 25, 2017
Shin-Etsu Chemical Co., Ltd.
Kentaro Kumaki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Sulfonium salt, resist composition and resist pattern forming process
Patent number
9,604,921
Issue date
Mar 28, 2017
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Onium salt, chemically amplified positive resist composition, and p...
Patent number
9,535,325
Issue date
Jan 3, 2017
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically-amplified positive resist composition and resist pattern...
Patent number
9,500,949
Issue date
Nov 22, 2016
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically-amplified negative resist composition and resist pattern...
Patent number
9,436,083
Issue date
Sep 6, 2016
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified resist composition and pattern forming process
Patent number
9,348,227
Issue date
May 24, 2016
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Chemically amplified negative resist composition and patterning pro...
Patent number
9,329,476
Issue date
May 3, 2016
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Sulfonium salt, resist composition and resist pattern forming process
Patent number
9,285,678
Issue date
Mar 15, 2016
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Chemically amplified negative resist composition and patterning pro...
Patent number
9,182,670
Issue date
Nov 10, 2015
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Negative resist composition and patterning process
Patent number
9,023,587
Issue date
May 5, 2015
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Patents Applications
last 30 patents
Information
Patent Application
MULTIFUNCTIONAL POLYMERS
Publication number
20200278607
Publication date
Sep 3, 2020
International Business Machines Corporation
Luisa D. Bozano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING...
Publication number
20200133121
Publication date
Apr 30, 2020
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
C07 - ORGANIC CHEMISTRY
Information
Patent Application
SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN...
Publication number
20200071268
Publication date
Mar 5, 2020
Shin-Etsu Chemical Co., Ltd.
Naoya Inoue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND...
Publication number
20190361347
Publication date
Nov 28, 2019
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
Publication number
20190361350
Publication date
Nov 28, 2019
Shin-Etsu Chemical Co., Ltd.
Naoya Inoue
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20190113842
Publication date
Apr 18, 2019
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20190113843
Publication date
Apr 18, 2019
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND RESIST PATTERNING PROCESS
Publication number
20190010119
Publication date
Jan 10, 2019
Shin-Etsu Chemical Co., Ltd.
Takahiro SUZUKI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
POLYMER, NEGATIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS
Publication number
20170355795
Publication date
Dec 14, 2017
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERN FORMING PROCESS
Publication number
20170343898
Publication date
Nov 30, 2017
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMER COMPOUND, NEGATIVE RESIST COMPOSITION, LAMINATE, PATTERNING...
Publication number
20170210836
Publication date
Jul 27, 2017
Shin-Etsu Chemical Co., Ltd.
Daisuke DOMON
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, LAMINATE, AND RESIST...
Publication number
20170037167
Publication date
Feb 9, 2017
Shin-Etsu Chemical Co., Ltd.
Daisuke DOMON
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM...
Publication number
20160299428
Publication date
Oct 13, 2016
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20160299430
Publication date
Oct 13, 2016
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...
Publication number
20160299431
Publication date
Oct 13, 2016
Shin-Etsu Chemical Co., Ltd.
Teppei Adachi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMIN...
Publication number
20160246175
Publication date
Aug 25, 2016
Shin-Etsu Chemical Co., Ltd.
Masaaki Kotake
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SHRINK MATERIAL AND PATTERN FORMING PROCESS
Publication number
20160161850
Publication date
Jun 9, 2016
Shin-Etsu Chemical Co., Ltd.
Kentaro Kumaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
SHRINK MATERIAL AND PATTERN FORMING PROCESS
Publication number
20160161851
Publication date
Jun 9, 2016
Shin-Etsu Chemical Co., Ltd.
Kentaro Kumaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAK...
Publication number
20160147142
Publication date
May 26, 2016
Shin-Etsu Chemical Co., Ltd.
Teppei Adachi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
Publication number
20160090355
Publication date
Mar 31, 2016
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20160085149
Publication date
Mar 24, 2016
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN
Publication number
20160070169
Publication date
Mar 10, 2016
SHIN-ETSU CHEMICAL CO., LTD.
Luisa D. Bozano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20150355544
Publication date
Dec 10, 2015
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY-AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20150268556
Publication date
Sep 24, 2015
Shin-Etsu Chemical Co., Ltd.
Daisuke DOMON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY-AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20150253664
Publication date
Sep 10, 2015
Shin-Etsu Chemical Co., Ltd.
Daisuke DOMON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
Publication number
20150198877
Publication date
Jul 16, 2015
Shin-Etsu Chemical Co., Ltd.
Daisuke DOMON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND P...
Publication number
20150198876
Publication date
Jul 16, 2015
Shin-Etsu Chemical Co., Ltd.
Daisuke DOMON
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
SULFONIUM SALT, RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
Publication number
20150168829
Publication date
Jun 18, 2015
Shin-Etsu Chemical Co., Ltd.
Daisuke Domon
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
Publication number
20140342274
Publication date
Nov 20, 2014
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PRO...
Publication number
20140329183
Publication date
Nov 6, 2014
Shin-Etsu Chemical Co., Ltd.
Keiichi MASUNAGA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...