Daisuke Kawamura

Person

Matsudo-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern forming method
- Patent number 9,880,464
- Issue date Jan 30, 2018
- TOSHIBA MEMORY CORPORATION
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material for imprinting, pattern formation method, and impri...
- Patent number 9,023,432
- Issue date May 5, 2015
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method, semiconductor device manufacturing method,...
- Patent number 8,865,580
- Issue date Oct 21, 2014
- Kabushiki Kaisha Toshiba
- Katsutoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method
- Patent number 8,673,771
- Issue date Mar 18, 2014
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus, manufacturing management system and method...
- Patent number 8,122,848
- Issue date Feb 28, 2012
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrate, method for conveying substrate, and...
- Patent number 7,973,907
- Issue date Jul 5, 2011
- Kabushiki Kaisha Toshiba
- Kentaro Matsunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method to form resist pattern
- Patent number 7,968,272
- Issue date Jun 28, 2011
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing method, substrate processing apparatus, and ma...
- Patent number 7,794,923
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method and method of manufacturing semiconductor de...
- Patent number 7,794,922
- Issue date Sep 14, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of generating writing pattern, method of forming resist patt...
- Patent number 7,749,665
- Issue date Jul 6, 2010
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 7,742,150
- Issue date Jun 22, 2010
- Kabushiki Kaisha Toshiba
- Shinichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern forming method and manufacturing method of semicondu...
- Patent number 7,687,227
- Issue date Mar 30, 2010
- Kabushiki Kaisha Toshiba
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask data correction method, photomask manufacturing method, comput...
- Patent number 7,685,556
- Issue date Mar 23, 2010
- Kabushiki Kaisha Toshiba
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and method of manufacturing semiconductor de...
- Patent number 7,662,543
- Issue date Feb 16, 2010
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,662,546
- Issue date Feb 16, 2010
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Immersion exposure method and immersion exposure apparatus which tr...
- Patent number 7,652,747
- Issue date Jan 26, 2010
- Kabushiki Kaisha Toshiba
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Film forming apparatus, manufacturing management system and method...
- Patent number 7,638,001
- Issue date Dec 29, 2009
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and liquid immersion l...
- Patent number 7,630,053
- Issue date Dec 8, 2009
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device manufacturing method
- Patent number 7,459,264
- Issue date Dec 2, 2008
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simulator of lithography tool for correcting focus error and critic...
- Patent number 7,336,341
- Issue date Feb 26, 2008
- Kabushiki Kaisha Toshiba
- Shoji Mimotogi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of selecting pattern to be measured, pattern inspection meth...
- Patent number 7,075,098
- Issue date Jul 11, 2006
- Kabushiki Kaisha Toshiba
- Takahiro Ikeda
- G01 - MEASURING TESTING
Information Patent Grant
Pattern forming method and method for manufacturing semiconductor d...
- Patent number 7,026,099
- Issue date Apr 11, 2006
- Kabushiki Kaisha Toshiba
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,005,238
- Issue date Feb 28, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 7,005,249
- Issue date Feb 28, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Apparatus for processing substrate and method of processing the same
- Patent number 6,881,058
- Issue date Apr 19, 2005
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for determining optical constant of antireflective layer, an...
- Patent number 6,841,404
- Issue date Jan 11, 2005
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask used in manufacturing of semiconductor device, photomask...
- Patent number 6,627,356
- Issue date Sep 30, 2003
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing exposure mask, exposure apparatus and semi...
- Patent number 6,558,853
- Issue date May 6, 2003
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN FORMING METHOD
- Publication number 20170184958
- Publication date Jun 29, 2017
- Kabushiki Kaisha Toshiba
- Daisuke KAWAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY ORIGINAL CHECKING DEVICE, LITHOGRAPHY ORIGINAL CHECKING...
- Publication number 20140232032
- Publication date Aug 21, 2014
- Kabushiki Kaisha Toshiba
- Ryoji Yoshikawa
- G01 - MEASURING TESTING
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20130230981
- Publication date Sep 5, 2013
- Daisuke KAWAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD,...
- Publication number 20130217217
- Publication date Aug 22, 2013
- Katsutoshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST MATERIAL FOR IMPRINTING, PATTERN FORMATION METHOD, AND IMPRI...
- Publication number 20130059090
- Publication date Mar 7, 2013
- Daisuke KAWAMURA
- B82 - NANO-TECHNOLOGY
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...
- Publication number 20110229826
- Publication date Sep 22, 2011
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND EXPOSURE APPARATUS
- Publication number 20110102755
- Publication date May 5, 2011
- Daisuke KAWAMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Forming Method and Method of Manufacturing Semiconductor De...
- Publication number 20110039214
- Publication date Feb 17, 2011
- Kabushiki Kaisha Toshiba
- Shinichi ITO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100196828
- Publication date Aug 5, 2010
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film forming apparatus, manufacturing management system and method...
- Publication number 20100116204
- Publication date May 13, 2010
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern forming method and method of manufacturing semiconductor de...
- Publication number 20100099036
- Publication date Apr 22, 2010
- Kabushiki Kaisha Toshiba
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20100081091
- Publication date Apr 1, 2010
- Koji HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD
- Publication number 20090220896
- Publication date Sep 3, 2009
- Katsutoshi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TREATING SUBSTRATE, METHOD FOR CONVEYING SUBSTRATE, AND...
- Publication number 20090115978
- Publication date May 7, 2009
- Kentaro MATSUNAGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing semiconductor device and liquid immersion l...
- Publication number 20070229789
- Publication date Oct 4, 2007
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing method, substrate processing apparatus, and ma...
- Publication number 20070190462
- Publication date Aug 16, 2007
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method of semiconductor device
- Publication number 20070188733
- Publication date Aug 16, 2007
- Shinichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor device manufacturing method to form resist pattern, a...
- Publication number 20070128554
- Publication date Jun 7, 2007
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming method and manufacturing method of semicondu...
- Publication number 20070042297
- Publication date Feb 22, 2007
- Eishi Shiobara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion exposure method and immersion exposure apparatus which tr...
- Publication number 20070008507
- Publication date Jan 11, 2007
- Takuya Kono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method of manufacturing semiconductor de...
- Publication number 20060263726
- Publication date Nov 23, 2006
- Shinichi Ito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist pattern forming method and semiconductor device manufacturin...
- Publication number 20060194155
- Publication date Aug 31, 2006
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method of manufacturing semiconductor de...
- Publication number 20060177777
- Publication date Aug 10, 2006
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for processing substrate and method of processing the same
- Publication number 20060102614
- Publication date May 18, 2006
- Kabushiki Kaisha Toshiba
- Kenji Kawano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing semiconductor device
- Publication number 20060008746
- Publication date Jan 12, 2006
- Yasunobu Onishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Device manufacturing method
- Publication number 20060008747
- Publication date Jan 12, 2006
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film forming apparatus, manufacturing management system and method...
- Publication number 20050263067
- Publication date Dec 1, 2005
- Daisuke Kawamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of generating writing pattern, method of forming resist patt...
- Publication number 20050248741
- Publication date Nov 10, 2005
- Daisuke Kawamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method for manufacturing semiconductor d...
- Publication number 20050214695
- Publication date Sep 29, 2005
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask data correction method, photomask manufacturing method, comput...
- Publication number 20050188341
- Publication date Aug 25, 2005
- Kazuya Fukuhara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Daisuke Kawamura

Person

Patents Grantslast 30 patents

Pattern forming method

Resist material for imprinting, pattern formation method, and impri...

Pattern forming method, semiconductor device manufacturing method,...

Pattern forming method

Film forming apparatus, manufacturing management system and method...

Method for treating substrate, method for conveying substrate, and...

Semiconductor device manufacturing method to form resist pattern

Substrate processing method, substrate processing apparatus, and ma...

Pattern forming method and method of manufacturing semiconductor de...

Method of generating writing pattern, method of forming resist patt...

Manufacturing method of semiconductor device

Resist pattern forming method and manufacturing method of semicondu...

Mask data correction method, photomask manufacturing method, comput...

Pattern forming method and method of manufacturing semiconductor de...

Apparatus for processing substrate and method of processing the same

Immersion exposure method and immersion exposure apparatus which tr...

Film forming apparatus, manufacturing management system and method...

Method of manufacturing semiconductor device and liquid immersion l...

Device manufacturing method

Simulator of lithography tool for correcting focus error and critic...

Method of selecting pattern to be measured, pattern inspection meth...

Pattern forming method and method for manufacturing semiconductor d...

Apparatus for processing substrate and method of processing the same

Apparatus for processing substrate and method of processing the same

Apparatus for processing substrate and method of processing the same

Method for determining optical constant of antireflective layer, an...

Photomask used in manufacturing of semiconductor device, photomask...

Method for manufacturing exposure mask, exposure apparatus and semi...

Patents Applicationslast 30 patents

PATTERN FORMING METHOD

LITHOGRAPHY ORIGINAL CHECKING DEVICE, LITHOGRAPHY ORIGINAL CHECKING...

PATTERN FORMING METHOD

PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD,...

RESIST MATERIAL FOR IMPRINTING, PATTERN FORMATION METHOD, AND IMPRI...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD TO FORM RESIST PATTERN, A...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND EXPOSURE APPARATUS

Pattern Forming Method and Method of Manufacturing Semiconductor De...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Film forming apparatus, manufacturing management system and method...

Pattern forming method and method of manufacturing semiconductor de...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

PATTERN FORMING METHOD

METHOD FOR TREATING SUBSTRATE, METHOD FOR CONVEYING SUBSTRATE, AND...

Method of manufacturing semiconductor device and liquid immersion l...

Substrate processing method, substrate processing apparatus, and ma...

Manufacturing method of semiconductor device

Semiconductor device manufacturing method to form resist pattern, a...

Resist pattern forming method and manufacturing method of semicondu...

Immersion exposure method and immersion exposure apparatus which tr...

Pattern forming method and method of manufacturing semiconductor de...

Resist pattern forming method and semiconductor device manufacturin...

Pattern forming method and method of manufacturing semiconductor de...

Apparatus for processing substrate and method of processing the same

Method for manufacturing semiconductor device

Device manufacturing method

Film forming apparatus, manufacturing management system and method...

Method of generating writing pattern, method of forming resist patt...

Pattern forming method and method for manufacturing semiconductor d...

Mask data correction method, photomask manufacturing method, comput...