Damon F. Kvamme

Person

Los Gatos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
EUV in-situ linearity calibration for TDI image sensors using test...
- Patent number 11,733,605
- Issue date Aug 22, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Vapor as a protectant and lifetime extender in optical systems
- Patent number 11,624,904
- Issue date Apr 11, 2023
- KLA Corporation
- David Jalil Zare
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system with non-circular pupil
- Patent number 11,112,691
- Issue date Sep 7, 2021
- KLA Corporation
- Damon F. Kvamme
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for polarizing reticle inspection
- Patent number 10,168,273
- Issue date Jan 1, 2019
- KLA-Tencor Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Source multiplexing illumination for mask inspection
- Patent number 9,625,810
- Issue date Apr 18, 2017
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single wavelength ellipsometry with improved spot size capability
- Patent number 9,574,992
- Issue date Feb 21, 2017
- KLA-Tencor Corporation
- Esen Salcin
- G01 - MEASURING TESTING
Information Patent Grant
Segmented mirror apparatus for imaging and method of using the same
- Patent number 9,448,343
- Issue date Sep 20, 2016
- KLA-Tencor Corporation
- Damon Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Deep ultra-violet light sources for wafer and reticle inspection sy...
- Patent number 9,318,870
- Issue date Apr 19, 2016
- KLA-Tencor Corporation
- Gang Lei
- G01 - MEASURING TESTING
Information Patent Grant
Illumination system with time multiplexed sources for reticle inspe...
- Patent number 9,151,718
- Issue date Oct 6, 2015
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Adaptable illuminating apparatus, system, and method for extreme ul...
- Patent number 9,046,500
- Issue date Jun 2, 2015
- KLA-Tencor Corporation
- Damon Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for EUV imaging and methods of using same
- Patent number 8,842,272
- Issue date Sep 23, 2014
- KLA-Tencor Corporation
- Daniel C. Wack
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam conditioning to reduce spatial coherence
- Patent number 7,926,959
- Issue date Apr 19, 2011
- KLA-Tencor Corporation
- Damon Kvamme
- G02 - OPTICS
Information Patent Grant
Methods for detecting and classifying defects on a reticle
- Patent number 7,738,093
- Issue date Jun 15, 2010
- KLA-Tencor Corp.
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple beam inspection apparatus and method
- Patent number 7,486,393
- Issue date Feb 3, 2009
- KLA Tencor
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Multiple beam inspection apparatus and method
- Patent number 7,352,457
- Issue date Apr 1, 2008
- KLA-Tencor Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Variable illuminator and speckle buster apparatus
- Patent number 7,292,393
- Issue date Nov 6, 2007
- KLA-Tencor Technologies Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Multiple beam inspection apparatus and method
- Patent number 7,075,638
- Issue date Jul 11, 2006
- KLA-Tenor Technologies Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Optical compensation in high numerical aperture photomask inspectio...
- Patent number 6,952,256
- Issue date Oct 4, 2005
- KLA-Tencor Technologies Corporation
- Ronald L. Roncone
- G01 - MEASURING TESTING
Information Patent Grant
Multiple beam inspection apparatus and method
- Patent number 6,879,390
- Issue date Apr 12, 2005
- KLA-Tencor Technologies Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for detecting phase defects in lithographic masks...
- Patent number 6,727,512
- Issue date Apr 27, 2004
- KLA-Tencor Technologies Corporation
- Stan Stokowski
- G01 - MEASURING TESTING
Information Patent Grant
Differential detector coupled with defocus for improved phase defec...
- Patent number 6,646,281
- Issue date Nov 11, 2003
- KLA-Tencor Corporation
- Matthias C. Krantz
- G01 - MEASURING TESTING
Information Patent Grant
Multiple beam inspection apparatus and method
- Patent number 6,636,301
- Issue date Oct 21, 2003
- KLA-Tencor Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,584,218
- Issue date Jun 24, 2003
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G01 - MEASURING TESTING
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,363,166
- Issue date Mar 26, 2002
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 6,052,478
- Issue date Apr 18, 2000
- KLA-Tencor Corporation
- Mark Joseph Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,737,072
- Issue date Apr 7, 1998
- KLA Instruments Corporation
- David Garth Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus
- Patent number 5,572,598
- Issue date Nov 5, 1996
- KLA Instruments Corporation
- Mark J. Wihl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated photomask inspection apparatus and method
- Patent number 5,563,702
- Issue date Oct 8, 1996
- KLA Instruments Corporation
- David G. Emery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lighting system for commercial refrigerator doors
- Patent number 5,471,372
- Issue date Nov 28, 1995
- Ardco, Inc.
- Richard A. Mamelson
- A47 - FURNITURE DOMESTIC ARTICLES OR APPLIANCES COFFEE MILLS SPICE MILLS SUCT...
Information Patent Grant
High-magnification wide-field-of-view telemicroscopic lens configur...
- Patent number 5,394,272
- Issue date Feb 28, 1995
- General Scientific Corporation
- Damon F. Kvamme
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20230341760
- Publication date Oct 26, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
VAPOR AS A PROTECTANT AND LIFETIME EXTENDER IN OPTICAL SYSTEMS
- Publication number 20210041689
- Publication date Feb 11, 2021
- KLA Corporation
- David Jalil Zare
- G02 - OPTICS
Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20200401037
- Publication date Dec 24, 2020
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
Inspection System with Non-Circular Pupil
- Publication number 20200225574
- Publication date Jul 16, 2020
- KLA-Tencor Corporation
- Damon F. Kvamme
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR POLARIZING RETICLE INSPECTION
- Publication number 20190003960
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
EXTREME ULTRA-VIOLET (EUV) INSPECTION SYSTEMS
- Publication number 20150192459
- Publication date Jul 9, 2015
- KLA-Tencor Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Application
SEGMENTED MIRROR APPARATUS FOR IMAGING AND METHOD OF USING THE SAME
- Publication number 20140264051
- Publication date Sep 18, 2014
- KLA-Tencor Corporation
- Damon Kvamme
- G02 - OPTICS
Information Patent Application
ADAPTABLE ILLUMINATING APPARATUS, SYSTEM, AND METHOD FOR EXTREME UL...
- Publication number 20140175308
- Publication date Jun 26, 2014
- KLA-Tencor Corporation
- Damon Kvamme
- G02 - OPTICS
Information Patent Application
DEEP ULTRA-VIOLET LIGHT SOURCES FOR WAFER AND RETICLE INSPECTION SY...
- Publication number 20140111799
- Publication date Apr 24, 2014
- KLA-Tencor Corporation
- Gang Lei
- G02 - OPTICS
Information Patent Application
Illumination System with Time Multiplexed Sources for Reticle Inspe...
- Publication number 20130242295
- Publication date Sep 19, 2013
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS FOR EUV IMAGING AND METHODS OF USING SAME
- Publication number 20130083321
- Publication date Apr 4, 2013
- KLA-Tencor Corporation
- Daniel C. Wack
- B82 - NANO-TECHNOLOGY
Information Patent Application
SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION
- Publication number 20120236281
- Publication date Sep 20, 2012
- KLA-Tencor Corporation
- Daimian Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE
- Publication number 20080304056
- Publication date Dec 11, 2008
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE BEAM INSPECTION APPARATUS AND METHOD
- Publication number 20080018883
- Publication date Jan 24, 2008
- KLA-Tencor Technologies Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Application
Multiple beam inspection apparatus and method
- Publication number 20060209298
- Publication date Sep 21, 2006
- KLA-Tencor Technologies Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Application
Variable illuminator and speckle buster apparatus
- Publication number 20060152810
- Publication date Jul 13, 2006
- KLA-Tencor Technologies Corporation
- Damon F. Kvamme
- G02 - OPTICS
Information Patent Application
Multiple beam inspection apparatus and method
- Publication number 20050174570
- Publication date Aug 11, 2005
- KLA-Tencor Technologies Corporation
- Damon F. Kvamme
- G01 - MEASURING TESTING
Information Patent Application
Optical compensation in high numerical aperture photomask inspectio...
- Publication number 20040042002
- Publication date Mar 4, 2004
- KLA-Tencor Technologies Corporation
- Ronald L. Roncone
- G01 - MEASURING TESTING
Information Patent Application
Method and system for detecting phase defects in lithographic masks...
- Publication number 20040016897
- Publication date Jan 29, 2004
- KLA-Tencor Technologies Corporation
- Stan Stokowski
- G01 - MEASURING TESTING
Information Patent Application
Automated photomask inspection apparatus
- Publication number 20020054702
- Publication date May 9, 2002
- Mark Joseph Wihl
- G01 - MEASURING TESTING

Damon F. Kvamme

Person

Patents Grantslast 30 patents

EUV in-situ linearity calibration for TDI image sensors using test...

Vapor as a protectant and lifetime extender in optical systems

Inspection system with non-circular pupil

Methods and apparatus for polarizing reticle inspection

Source multiplexing illumination for mask inspection

Single wavelength ellipsometry with improved spot size capability

Segmented mirror apparatus for imaging and method of using the same

Deep ultra-violet light sources for wafer and reticle inspection sy...

Illumination system with time multiplexed sources for reticle inspe...

Adaptable illuminating apparatus, system, and method for extreme ul...

Apparatus for EUV imaging and methods of using same

Beam conditioning to reduce spatial coherence

Methods for detecting and classifying defects on a reticle

Multiple beam inspection apparatus and method

Multiple beam inspection apparatus and method

Variable illuminator and speckle buster apparatus

Multiple beam inspection apparatus and method

Optical compensation in high numerical aperture photomask inspectio...

Multiple beam inspection apparatus and method

Method and system for detecting phase defects in lithographic masks...

Differential detector coupled with defocus for improved phase defec...

Multiple beam inspection apparatus and method

Automated photomask inspection apparatus

Automated photomask inspection apparatus

Automated photomask inspection apparatus

Automated photomask inspection apparatus and method

Automated photomask inspection apparatus

Automated photomask inspection apparatus and method

Lighting system for commercial refrigerator doors

High-magnification wide-field-of-view telemicroscopic lens configur...

Patents Applicationslast 30 patents

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

VAPOR AS A PROTECTANT AND LIFETIME EXTENDER IN OPTICAL SYSTEMS

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

Inspection System with Non-Circular Pupil

METHODS AND APPARATUS FOR POLARIZING RETICLE INSPECTION

EXTREME ULTRA-VIOLET (EUV) INSPECTION SYSTEMS

SEGMENTED MIRROR APPARATUS FOR IMAGING AND METHOD OF USING THE SAME

ADAPTABLE ILLUMINATING APPARATUS, SYSTEM, AND METHOD FOR EXTREME UL...

DEEP ULTRA-VIOLET LIGHT SOURCES FOR WAFER AND RETICLE INSPECTION SY...

Illumination System with Time Multiplexed Sources for Reticle Inspe...

APPARATUS FOR EUV IMAGING AND METHODS OF USING SAME

SOURCE MULTIPLEXING ILLUMINATION FOR MASK INSPECTION

METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE

MULTIPLE BEAM INSPECTION APPARATUS AND METHOD

Multiple beam inspection apparatus and method

Variable illuminator and speckle buster apparatus

Multiple beam inspection apparatus and method

Optical compensation in high numerical aperture photomask inspectio...

Method and system for detecting phase defects in lithographic masks...

Automated photomask inspection apparatus