TREA

Dana A. Gronbeck

Follow

Person

  • Holliston, MA, US
People

Patents Grantslast 30 patents

  • Information Patent Grant

    Antireflective hard mask compositions
    • Patent number 8,373,241
    • Issue date Feb 12, 2013
    • Rohm and Haas Electronic Materials LLC
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Electronic devices having air gaps
    • Patent number 7,723,850
    • Issue date May 25, 2010
    • Rohm and Haas Electronic Materials LLC
    • Michael K. Gallagher
    • B81 - MICRO-STRUCTURAL TECHNOLOGY
  • Information Patent Grant

    Antireflective hard mask compositions
    • Patent number 7,605,439
    • Issue date Oct 20, 2009
    • Rohm and Haas Electronic Materials LLC
    • Dana A. Gronbeck
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Multilayer photoresist systems
    • Patent number 7,582,412
    • Issue date Sep 1, 2009
    • Rohm and Haas Electronic Materials LLC
    • James F. Cameron
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Air gap formation
    • Patent number 7,256,127
    • Issue date Aug 14, 2007
    • Shipley Company, L.L.C.
    • Michael K. Gallagher
    • B81 - MICRO-STRUCTURAL TECHNOLOGY
  • Information Patent Grant

    Electronic device manufacture
    • Patent number 7,018,678
    • Issue date Mar 28, 2006
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Photoimageable composition
    • Patent number 6,803,171
    • Issue date Oct 12, 2004
    • Shipley Company LLC
    • Dana A. Gronbeck
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Reduction of inorganic contaminants in polymers and photoresist com...
    • Patent number 6,773,872
    • Issue date Aug 10, 2004
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Information Patent Grant

    Process for removing heavy metal ions by ion exchange
    • Patent number 5,702,611
    • Issue date Dec 30, 1997
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL

Patents Applicationslast 30 patents

  • Information Patent Application

    ANTIREFLECTIVE HARD MASK COMPOSITIONS
    • Publication number 20100297539
    • Publication date Nov 25, 2010
    • Rohm and Haas Electronic Materials, L.L.C.
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Air gap formation
    • Publication number 20080038518
    • Publication date Feb 14, 2008
    • Shipley Company, L.L.C.
    • Michael K. Gallagher
    • B81 - MICRO-STRUCTURAL TECHNOLOGY
  • Information Patent Application

    Antireflective hard mask compositions
    • Publication number 20070057253
    • Publication date Mar 15, 2007
    • Rohm and Haas Electronic Materials L.L.C.
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Electronic device manufacture
    • Publication number 20060204742
    • Publication date Sep 14, 2006
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    Memory devices based on electric field programmable films
    • Publication number 20050211978
    • Publication date Sep 29, 2005
    • Lujia Bu
    • G11 - INFORMATION STORAGE
  • Information Patent Application

    Photoimageable composition
    • Publication number 20050026077
    • Publication date Feb 3, 2005
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Multilayer photoresist systems
    • Publication number 20040253535
    • Publication date Dec 16, 2004
    • Shipley Company, L.L.C.
    • James F. Cameron
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Air gap formation
    • Publication number 20040137728
    • Publication date Jul 15, 2004
    • Shipley Company, L.L.C.
    • Michael K. Gallagher
    • B81 - MICRO-STRUCTURAL TECHNOLOGY
  • Information Patent Application

    Electronic device manufacture
    • Publication number 20040130032
    • Publication date Jul 8, 2004
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Dielectric materials
    • Publication number 20040109950
    • Publication date Jun 10, 2004
    • Shipley Company, L.L.C.
    • Timothy G. Adams
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Electronic device manufacture
    • Publication number 20040052948
    • Publication date Mar 18, 2004
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Electronic device manufacture
    • Publication number 20040033700
    • Publication date Feb 19, 2004
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
  • Information Patent Application

    Phenolic polymers, methods for synthesis thereof and photoresist co...
    • Publication number 20030235777
    • Publication date Dec 25, 2003
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Photoimageable composition
    • Publication number 20030099899
    • Publication date May 29, 2003
    • Dana A. Gronbeck
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Reduction of inorganic contaminants in polymers and photoresist com...
    • Publication number 20020142246
    • Publication date Oct 3, 2002
    • Shipley Company, L.L.C.
    • Dana A. Gronbeck
    • Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC