DANIEL KANDEL

Person

RAMAT GAN, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology target design for tilted device designs
- Patent number 12,117,347
- Issue date Oct 15, 2024
- KLA Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 11,763,181
- Issue date Sep 19, 2023
- Nova Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
TEM-based metrology method and system
- Patent number 11,710,616
- Issue date Jul 25, 2023
- Vladimir Machavariani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and system
- Patent number 11,450,541
- Issue date Sep 20, 2022
- Nova Ltd.
- Vladimir Machavariani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for providing a quality metric for improved proce...
- Patent number 11,372,340
- Issue date Jun 28, 2022
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
TEM-based metrology method and system
- Patent number 11,309,162
- Issue date Apr 19, 2022
- Nova Ltd.
- Vladimir Machavariani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology and process control for semiconductor manufacturing
- Patent number 11,093,840
- Issue date Aug 17, 2021
- Nova Measuring Instruments Ltd.
- Eitan Rothstein
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Device metrology targets and methods
- Patent number 11,054,752
- Issue date Jul 6, 2021
- KLA Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
TEM-based metrology method and system
- Patent number 10,916,404
- Issue date Feb 9, 2021
- Nova Measuring Instruments Ltd.
- Vladimir Machavariani
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of analyzing and utilizing landscapes to reduce or eliminate...
- Patent number 10,831,108
- Issue date Nov 10, 2020
- KLA Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology using overlay and yield critical patterns
- Patent number 10,685,165
- Issue date Jun 16, 2020
- KLA-Tencor Corporation
- Daniel Kandel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Symmetric target design in scatterometry overlay metrology
- Patent number 10,591,406
- Issue date Mar 17, 2020
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Device metrology targets and methods
- Patent number 10,571,811
- Issue date Feb 25, 2020
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scanning in angle-resolved reflectometry and algorithmically elimin...
- Patent number 10,533,940
- Issue date Jan 14, 2020
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Multi-layer overlay metrology target and complimentary overlay metr...
- Patent number 10,527,954
- Issue date Jan 7, 2020
- KLA-Tencor Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structured illumination for contrast enhancement in overlay metrology
- Patent number 10,274,425
- Issue date Apr 30, 2019
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Grant
Near field metrology
- Patent number 10,261,014
- Issue date Apr 16, 2019
- KLA-Tencor Corporation
- Noam Sapiens
- G02 - OPTICS
Information Patent Grant
Reflection symmetric scatterometry overlay targets and methods
- Patent number 10,234,280
- Issue date Mar 19, 2019
- KLA-Tencor Corporation
- Barak Bringoltz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Achieving a small pattern placement error in metrology targets
- Patent number 10,228,320
- Issue date Mar 12, 2019
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems for providing illumination in optical metrology
- Patent number 10,203,247
- Issue date Feb 12, 2019
- KLA-Tencor Corporation
- Gregory R. Brady
- F21 - LIGHTING
Information Patent Grant
Compound objectives for imaging and scatterometry overlay
- Patent number 10,139,528
- Issue date Nov 27, 2018
- KLA-Tencor Corporation
- Joel Seligson
- G02 - OPTICS
Information Patent Grant
Scanning in angle-resolved reflectometry and algorithmically elimin...
- Patent number 10,126,238
- Issue date Nov 13, 2018
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Self-moiré target design principles for measuring unresolved device...
- Patent number 10,101,592
- Issue date Oct 16, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Scanning in angle-resolved reflectometry and algorithmically elimin...
- Patent number 9,958,385
- Issue date May 1, 2018
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Focus measurements using scatterometry metrology
- Patent number 9,934,353
- Issue date Apr 3, 2018
- KLA-Tencor Corporation
- Mohamed El Kodadi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-layer overlay metrology target and complimentary overlay metr...
- Patent number 9,927,718
- Issue date Mar 27, 2018
- KLA-Tencor Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Feed forward of metrology data in a metrology system
- Patent number 9,903,711
- Issue date Feb 27, 2018
- KLA-Tencor Corporation
- Ady Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
On-device metrology
- Patent number 9,875,946
- Issue date Jan 23, 2018
- KLA-Tencor Corporation
- Andrei V. Shchegrov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reducing algorithmic inaccuracy in scatterometry overlay metrology
- Patent number 9,869,543
- Issue date Jan 16, 2018
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING
Information Patent Grant
Self-moire target design principles for measuring unresolved device...
- Patent number 9,864,209
- Issue date Jan 9, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
- Publication number 20250035489
- Publication date Jan 30, 2025
- KLA Corporation
- Myungjun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20240078450
- Publication date Mar 7, 2024
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EVALUATING X-RAY SIGNALS FROM A PERTURBED OBJECT
- Publication number 20240068964
- Publication date Feb 29, 2024
- NOVA LTD
- Shahar Gov
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND SYSTEM
- Publication number 20230074398
- Publication date Mar 9, 2023
- NOVA LTD
- VLADIMIR MACHAVARIANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Providing a Quality Metric for Improved Proce...
- Publication number 20230051705
- Publication date Feb 16, 2023
- KLA Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TEM-BASED METROLOGY METHOD AND SYSTEM
- Publication number 20220310356
- Publication date Sep 29, 2022
- NOVA LTD
- VLADIMIR MACHAVARIANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20220036218
- Publication date Feb 3, 2022
- NOVA LTD
- EITAN ROTHSTEIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEM-BASED METROLOGY METHOD AND SYSTEM
- Publication number 20210217581
- Publication date Jul 15, 2021
- NOVA MEASURING INSTRUMENTS LTD.
- VLADIMIR MACHAVARIANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
- Publication number 20210150387
- Publication date May 20, 2021
- NOVA MEASURING INSTRUMENTS LTD.
- EITAN ROTHSTEIN
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY METHOD AND SYSTEM
- Publication number 20200294829
- Publication date Sep 17, 2020
- NOVA MEASURING INSTRUMENTS LTD.
- VLADIMIR MACHAVARIANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TEM-BASED METROLOGY METHOD AND SYSTEM
- Publication number 20190393016
- Publication date Dec 26, 2019
- NOVA MEASURING INSTRUMENTS LTD.
- VLADIMIR MACHAVARIANI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Scanning in Angle-Resolved Reflectometry and Algorithmically Elimin...
- Publication number 20190094142
- Publication date Mar 28, 2019
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
DEVICE METROLOGY TARGETS AND METHODS
- Publication number 20190004438
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multi-Layer Overlay Metrology Target and Complimentary Overlay Metr...
- Publication number 20180275530
- Publication date Sep 27, 2018
- KLA-Tencor Corporation
- Daniel Kandel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMIN...
- Publication number 20180106723
- Publication date Apr 19, 2018
- KLA-Tencor Corporation
- Amnon MANASSEN
- G01 - MEASURING TESTING
Information Patent Application
Self-Moiré Target Design Principles for Measuring Unresolved Device...
- Publication number 20180081193
- Publication date Mar 22, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G02 - OPTICS
Information Patent Application
Structured Illumination for Contrast Enhancement in Overlay Metrology
- Publication number 20170307523
- Publication date Oct 26, 2017
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
Systems for Providing Illumination in Optical Metrology
- Publication number 20170146399
- Publication date May 25, 2017
- KLA-Tencor Corporation
- Gregory R. Brady
- G02 - OPTICS
Information Patent Application
Self-Moire Target Design Principles for Measuring Unresolved Device...
- Publication number 20170146810
- Publication date May 25, 2017
- KLA-Tencor Corporation
- Vladimir Levinski
- G02 - OPTICS
Information Patent Application
METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS
- Publication number 20170023358
- Publication date Jan 26, 2017
- KLA-Tencor Corporation
- Myungjun Lee
- G01 - MEASURING TESTING
Information Patent Application
METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...
- Publication number 20160313658
- Publication date Oct 27, 2016
- KLA-Tencor Corporation
- Tal Marciano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Feed Forward of Metrology Data in a Metrology System
- Publication number 20160290796
- Publication date Oct 6, 2016
- KLA-Tencor Corporation
- Ady Levy
- G01 - MEASURING TESTING
Information Patent Application
DEVICE METROLOGY TARGETS AND METHODS
- Publication number 20160266505
- Publication date Sep 15, 2016
- KLA-Tencor Corporation
- Eran Amit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY USING OVERLAY AND YIELD CRITICAL PATTERNS
- Publication number 20160253450
- Publication date Sep 1, 2016
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20160216197
- Publication date Jul 28, 2016
- KLA-Tencor Corporation
- Barak Bringoltz
- G02 - OPTICS
Information Patent Application
FOCUS MEASUREMENTS USING SCATTEROMETRY METROLOGY
- Publication number 20160103946
- Publication date Apr 14, 2016
- KLA-Tencor Corporation
- Mohamed El Kodadi
- G01 - MEASURING TESTING
Information Patent Application
Structured Illumination for Contrast Enhancement in Overlay Metrology
- Publication number 20160003735
- Publication date Jan 7, 2016
- KLA-Tencor Corporation
- Joel Seligson
- G01 - MEASURING TESTING
Information Patent Application
Apodization for Pupil Imaging Scatterometry
- Publication number 20150316783
- Publication date Nov 5, 2015
- KLA-Tencor Corporation
- Andrew V. Hill
- G02 - OPTICS
Information Patent Application
TARGET ELEMENT TYPES FOR PROCESS PARAMETER METROLOGY
- Publication number 20150309402
- Publication date Oct 29, 2015
- KLA-Tencor Corporation
- Vladimir LEVINSKI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY
- Publication number 20150233705
- Publication date Aug 20, 2015
- KLA-Tencor Corporation
- Barak Bringoltz
- G01 - MEASURING TESTING

DANIEL KANDEL

Person

Patents Grantslast 30 patents

Metrology target design for tilted device designs

Metrology and process control for semiconductor manufacturing

TEM-based metrology method and system

Metrology method and system

Method and system for providing a quality metric for improved proce...

TEM-based metrology method and system

Metrology and process control for semiconductor manufacturing

Device metrology targets and methods

TEM-based metrology method and system

Method of analyzing and utilizing landscapes to reduce or eliminate...

Metrology using overlay and yield critical patterns

Symmetric target design in scatterometry overlay metrology

Device metrology targets and methods

Scanning in angle-resolved reflectometry and algorithmically elimin...

Multi-layer overlay metrology target and complimentary overlay metr...

Structured illumination for contrast enhancement in overlay metrology

Near field metrology

Reflection symmetric scatterometry overlay targets and methods

Achieving a small pattern placement error in metrology targets

Systems for providing illumination in optical metrology

Compound objectives for imaging and scatterometry overlay

Scanning in angle-resolved reflectometry and algorithmically elimin...

Self-moiré target design principles for measuring unresolved device...

Scanning in angle-resolved reflectometry and algorithmically elimin...

Focus measurements using scatterometry metrology

Multi-layer overlay metrology target and complimentary overlay metr...

Feed forward of metrology data in a metrology system

On-device metrology

Reducing algorithmic inaccuracy in scatterometry overlay metrology

Self-moire target design principles for measuring unresolved device...

Patents Applicationslast 30 patents

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

EVALUATING X-RAY SIGNALS FROM A PERTURBED OBJECT

METROLOGY METHOD AND SYSTEM

Method and System for Providing a Quality Metric for Improved Proce...

TEM-BASED METROLOGY METHOD AND SYSTEM

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

TEM-BASED METROLOGY METHOD AND SYSTEM

METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING

METROLOGY METHOD AND SYSTEM

TEM-BASED METROLOGY METHOD AND SYSTEM

Scanning in Angle-Resolved Reflectometry and Algorithmically Elimin...

DEVICE METROLOGY TARGETS AND METHODS

Multi-Layer Overlay Metrology Target and Complimentary Overlay Metr...

SCANNING IN ANGLE-RESOLVED REFLECTOMETRY AND ALGORITHMICALLY ELIMIN...

Self-Moiré Target Design Principles for Measuring Unresolved Device...

Structured Illumination for Contrast Enhancement in Overlay Metrology

Systems for Providing Illumination in Optical Metrology

Self-Moire Target Design Principles for Measuring Unresolved Device...

METROLOGY TARGET DESIGN FOR TILTED DEVICE DESIGNS

METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINAT...

Feed Forward of Metrology Data in a Metrology System

DEVICE METROLOGY TARGETS AND METHODS

METROLOGY USING OVERLAY AND YIELD CRITICAL PATTERNS

SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY

FOCUS MEASUREMENTS USING SCATTEROMETRY METROLOGY

Structured Illumination for Contrast Enhancement in Overlay Metrology

Apodization for Pupil Imaging Scatterometry

TARGET ELEMENT TYPES FOR PROCESS PARAMETER METROLOGY

REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY