Daniel Peter

Person

Campbell, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective etch using deposition of a metalloid or metal containing...
- Patent number 12,341,021
- Issue date Jun 24, 2025
- Lam Research Corporation
- Samantha Siamhwa Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective etch using a sacrificial mask
- Patent number 12,027,375
- Issue date Jul 2, 2024
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively etching for nanowires
- Patent number 11,521,860
- Issue date Dec 6, 2022
- Lam Research Corporation
- Jun Xue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of self assembled monolayer for enabling selective depos...
- Patent number 11,450,532
- Issue date Sep 20, 2022
- Lam Research Corporation
- Younghee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective self-aligned patterning of silicon germanium, germanium a...
- Patent number 10,741,405
- Issue date Aug 11, 2020
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective self-aligned patterning of silicon germanium, germanium a...
- Patent number 10,043,672
- Issue date Aug 7, 2018
- Lam Research Corporation
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...
- Publication number 20240355650
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST
- Publication number 20240036474
- Publication date Feb 1, 2024
- LAM RESEARCH CORPORATION
- Daniel PETER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DRY BACKSIDE AND BEVEL EDGE CLEAN OF PHOTORESIST
- Publication number 20230314954
- Publication date Oct 5, 2023
- LAM RESEARCH CORPORATION
- Daniel PETER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING...
- Publication number 20230118701
- Publication date Apr 20, 2023
- LAM RESEARCH CORPORATION
- Samantha SiamHwa TAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALLOY FILM ETCH
- Publication number 20230047486
- Publication date Feb 16, 2023
- LAM RESEARCH CORPORATION
- Younghee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY CHAMBER CLEAN OF PHOTORESIST FILMS
- Publication number 20220344136
- Publication date Oct 27, 2022
- LAM RESEARCH CORPORATION
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20220244645
- Publication date Aug 4, 2022
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DEPOSITION OF SELF ASSEMBLED MONOLAYER FOR ENABLING SELECTIVE DEPOS...
- Publication number 20220208555
- Publication date Jun 30, 2022
- LAM RESEARCH CORPORATION
- Younghee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE ETCH USING A SACRIFICIAL MASK
- Publication number 20220122848
- Publication date Apr 21, 2022
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVELY ETCHING FOR NANOWIRES
- Publication number 20210335626
- Publication date Oct 28, 2021
- LAM RESEARCH CORPORATION
- Jun XUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVELY ETCHING FOR NANOWIRES
- Publication number 20210272814
- Publication date Sep 2, 2021
- LAM RESEARCH CORPORATION
- Daniel PETER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SELF-ALIGNED PATTERNING OF SILICON GERMANIUM, GERMANIUM A...
- Publication number 20180342399
- Publication date Nov 29, 2018
- LAM RESEARCH CORPORATION
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SELF-ALIGNED PATTERNING OF SILICON GERMANIUM, GERMANIUM A...
- Publication number 20170287724
- Publication date Oct 5, 2017
- LAM RESEARCH CORPORATION
- Daniel Peter
- H01 - BASIC ELECTRIC ELEMENTS

Daniel Peter

Person

Patents Grantslast 30 patents

Selective etch using deposition of a metalloid or metal containing...

Photoresist development with halide chemistries

Selective etch using a sacrificial mask

Selectively etching for nanowires

Deposition of self assembled monolayer for enabling selective depos...

Selective self-aligned patterning of silicon germanium, germanium a...

Selective self-aligned patterning of silicon germanium, germanium a...

Patents Applicationslast 30 patents

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

DRY DEVELOPMENT APPARATUS AND METHODS FOR VOLATILIZATION OF DRY DEV...

CONTROL OF METALLIC CONTAMINATION FROM METAL-CONTAINING PHOTORESIST

DRY BACKSIDE AND BEVEL EDGE CLEAN OF PHOTORESIST

SELECTIVE ETCH USING DEPOSITION OF A METALLOID OR METAL CONTAINING...

ALLOY FILM ETCH

DRY CHAMBER CLEAN OF PHOTORESIST FILMS

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

DEPOSITION OF SELF ASSEMBLED MONOLAYER FOR ENABLING SELECTIVE DEPOS...

SELECTIVE ETCH USING A SACRIFICIAL MASK

SELECTIVELY ETCHING FOR NANOWIRES

SELECTIVELY ETCHING FOR NANOWIRES

SELECTIVE SELF-ALIGNED PATTERNING OF SILICON GERMANIUM, GERMANIUM A...

SELECTIVE SELF-ALIGNED PATTERNING OF SILICON GERMANIUM, GERMANIUM A...