Daniel S. Abrams

Person

Mountain View, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photo-mask and wafer image reconstruction
- Patent number 8,644,588
- Issue date Feb 4, 2014
- Luminescent Technologies, Inc.
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photo-mask and wafer image reconstruction
- Patent number 8,331,645
- Issue date Dec 11, 2012
- Luminescent Technologies, Inc.
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photo-mask and wafer image reconstruction
- Patent number 8,280,146
- Issue date Oct 2, 2012
- Luminescent Technologies, Inc.
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photo-mask and wafer image reconstruction
- Patent number 8,260,032
- Issue date Sep 4, 2012
- Luminescent Technologies, Inc.
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Write-pattern determination for maskless lithography
- Patent number 8,245,162
- Issue date Aug 14, 2012
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-mask and wafer image reconstruction
- Patent number 8,208,712
- Issue date Jun 26, 2012
- Luminescent Technologies, Inc.
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photo-mask and wafer image reconstruction
- Patent number 8,204,295
- Issue date Jun 19, 2012
- Luminescent Technologies, Inc.
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photo-mask and wafer image reconstruction
- Patent number 8,200,002
- Issue date Jun 12, 2012
- Luminescent Technologies, Inc.
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Write-pattern determination for maskless lithography
- Patent number 8,111,380
- Issue date Feb 7, 2012
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 8,056,021
- Issue date Nov 8, 2011
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,992,109
- Issue date Aug 2, 2011
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,984,391
- Issue date Jul 19, 2011
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask-pattern determination using topology types
- Patent number 7,921,385
- Issue date Apr 5, 2011
- Luminescent Technologies Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask-patterns including intentional breaks
- Patent number 7,793,253
- Issue date Sep 7, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography verification using guard bands
- Patent number 7,788,627
- Issue date Aug 31, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,757,201
- Issue date Jul 13, 2010
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems, masks, and methods for photolithography
- Patent number 7,707,541
- Issue date Apr 27, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Technique for determining a mask pattern corresponding to a photo-mask
- Patent number 7,703,068
- Issue date Apr 20, 2010
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System, masks, and methods for photomasks optimized with approximat...
- Patent number 7,703,049
- Issue date Apr 20, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems, masks, and methods for manufacturable masks using a functi...
- Patent number 7,698,665
- Issue date Apr 13, 2010
- Luminescent Technologies, Inc.
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimized photomasks for photolithography
- Patent number 7,571,423
- Issue date Aug 4, 2009
- Luminescent Technologies, Inc.
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimized photomasks for photolithography
- Patent number 7,480,889
- Issue date Jan 20, 2009
- Luminescent Technologies, Inc.
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,441,227
- Issue date Oct 21, 2008
- Luminescent Technologies Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,178,127
- Issue date Feb 13, 2007
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for time-evolving rectilinear contours representing photo masks
- Patent number 7,124,394
- Issue date Oct 17, 2006
- Luminescent Technologies, Inc.
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTO-MASK AND WAFER IMAGE RECONSTRUCTION
- Publication number 20120189187
- Publication date Jul 26, 2012
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20100275175
- Publication date Oct 28, 2010
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20100275176
- Publication date Oct 28, 2010
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20100251203
- Publication date Sep 30, 2010
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO-MASK AND WAFER IMAGE RECONSTRUCTION
- Publication number 20100135568
- Publication date Jun 3, 2010
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-Mask and Wafer Image Reconstruction
- Publication number 20100119143
- Publication date May 13, 2010
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-Mask and Wafer Image Reconstruction
- Publication number 20100086195
- Publication date Apr 8, 2010
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-Mask and Wafer Image Reconstruction
- Publication number 20100080443
- Publication date Apr 1, 2010
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-Mask and Wafer Image Reconstruction
- Publication number 20100021824
- Publication date Jan 28, 2010
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-Mask and Wafer Image Reconstruction
- Publication number 20100021042
- Publication date Jan 28, 2010
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Photo-Mask and Wafer Image Reconstruction
- Publication number 20100021043
- Publication date Jan 28, 2010
- Moshe E. Preil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Write-Pattern Determination for Maskless Lithography
- Publication number 20090077526
- Publication date Mar 19, 2009
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Write-Pattern Determination for Maskless Lithography
- Publication number 20090073413
- Publication date Mar 19, 2009
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask-Patterns Including Intentional Breaks
- Publication number 20070196742
- Publication date Aug 23, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20070198966
- Publication date Aug 23, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20070192756
- Publication date Aug 16, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System, Masks, and Methods for Photomasks Optimized with Approximat...
- Publication number 20070186206
- Publication date Aug 9, 2007
- Daniel S. Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask-Pattern Determination Using Topology Types
- Publication number 20070186208
- Publication date Aug 9, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Verification Using Guard Bands
- Publication number 20070184369
- Publication date Aug 9, 2007
- Daniel S. Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems, Masks, and Methods for Photolithography
- Publication number 20070184357
- Publication date Aug 9, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Time-Evolving Rectilinear Contours Representing Photo Masks
- Publication number 20070136716
- Publication date Jun 14, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized photomasks for photolithography
- Publication number 20070011647
- Publication date Jan 11, 2007
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems, masks, and methods for manufacturable masks
- Publication number 20070009808
- Publication date Jan 11, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optimized photomasks for photolithography
- Publication number 20070011644
- Publication date Jan 11, 2007
- Daniel Abrams
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR TIME-EVOLVING RECTILINEAR CONTOURS REPRESENTING PHOTO MASKS
- Publication number 20070011645
- Publication date Jan 11, 2007
- Daniel Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fast systems and methods for calculating electromagnetic fields nea...
- Publication number 20070011648
- Publication date Jan 11, 2007
- Daniel S. Abrams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems, masks and methods for printing contact holes and other pat...
- Publication number 20060172204
- Publication date Aug 3, 2006
- Danping Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Daniel S. Abrams

Person

Patents Grantslast 30 patents

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Write-pattern determination for maskless lithography

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Photo-mask and wafer image reconstruction

Write-pattern determination for maskless lithography

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Mask-pattern determination using topology types

Mask-patterns including intentional breaks

Lithography verification using guard bands

Method for time-evolving rectilinear contours representing photo masks

Systems, masks, and methods for photolithography

Technique for determining a mask pattern corresponding to a photo-mask

System, masks, and methods for photomasks optimized with approximat...

Systems, masks, and methods for manufacturable masks using a functi...

Optimized photomasks for photolithography

Optimized photomasks for photolithography

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Method for time-evolving rectilinear contours representing photo masks

Patents Applicationslast 30 patents

PHOTO-MASK AND WAFER IMAGE RECONSTRUCTION

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

PHOTO-MASK AND WAFER IMAGE RECONSTRUCTION

Photo-Mask and Wafer Image Reconstruction

Photo-Mask and Wafer Image Reconstruction

Photo-Mask and Wafer Image Reconstruction

Photo-Mask and Wafer Image Reconstruction

Photo-Mask and Wafer Image Reconstruction

Photo-Mask and Wafer Image Reconstruction

Write-Pattern Determination for Maskless Lithography

Write-Pattern Determination for Maskless Lithography

Mask-Patterns Including Intentional Breaks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

System, Masks, and Methods for Photomasks Optimized with Approximat...

Mask-Pattern Determination Using Topology Types

Lithography Verification Using Guard Bands

Systems, Masks, and Methods for Photolithography

Method for Time-Evolving Rectilinear Contours Representing Photo Masks

Optimized photomasks for photolithography

Systems, masks, and methods for manufacturable masks

Optimized photomasks for photolithography

METHOD FOR TIME-EVOLVING RECTILINEAR CONTOURS REPRESENTING PHOTO MASKS

Fast systems and methods for calculating electromagnetic fields nea...

Systems, masks and methods for printing contact holes and other pat...