David B. James

Person

Newark, DE, US

People

Patents Grantslast 30 patents

Information Patent Grant
Broad spectrum, endpoint detection monophase olefin copolymer windo...
- Patent number 9,446,497
- Issue date Sep 20, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Angus Repper
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with polishing layer and window
- Patent number 9,259,820
- Issue date Feb 16, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical window polishing pad
- Patent number 9,238,295
- Issue date Jan 19, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Multilayer chemical mechanical polishing pad stack with soft and co...
- Patent number 9,238,296
- Issue date Jan 19, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- James Murnane
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad stack
- Patent number 9,233,451
- Issue date Jan 12, 2016
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- James Murnane
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad with broad spectrum, endpoint det...
- Patent number 9,186,772
- Issue date Nov 17, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Angus Repper
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad
- Patent number 9,144,880
- Issue date Sep 29, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Alkaline-earth metal oxide-polymeric polishing pad
- Patent number 9,073,172
- Issue date Jul 7, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Soft and conditionable chemical mechanical polishing pad with window
- Patent number 9,064,806
- Issue date Jun 23, 2015
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- Bainian Qian
- B24 - GRINDING POLISHING
Information Patent Grant
Method for chemical mechanical polishing silicon wafers
- Patent number 8,980,749
- Issue date Mar 17, 2015
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Yasuyuki Itai
- B24 - GRINDING POLISHING
Information Patent Grant
Hollow polymeric-alkaline earth metal oxide composite
- Patent number 8,894,732
- Issue date Nov 25, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Andrew R. Wank
- B24 - GRINDING POLISHING
Information Patent Grant
Forming alkaline-earth metal oxide polishing pad
- Patent number 8,888,877
- Issue date Nov 18, 2014
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Donna M. Alden
- B24 - GRINDING POLISHING
Information Patent Grant
Acrylate polyurethane chemical mechanical polishing layer
- Patent number 8,512,427
- Issue date Aug 20, 2013
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Jia Xie
- B24 - GRINDING POLISHING
Information Patent Grant
Dual-pore structure polishing pad
- Patent number 8,408,977
- Issue date Apr 2, 2013
- Rohm and Haas Electronic Materials CMP Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Dual-pore structure polishing pad
- Patent number 8,162,728
- Issue date Apr 24, 2012
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Method for electrochemical mechanical polishing
- Patent number 7,807,038
- Issue date Oct 5, 2010
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Joseph G. Ameen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Polishing pad for electrochemical mechanical polishing
- Patent number 7,618,529
- Issue date Nov 17, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Joseph G. Ameen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for forming a porous reaction injection molded chemical m...
- Patent number 7,537,446
- Issue date May 26, 2009
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing pad
- Patent number 7,438,636
- Issue date Oct 21, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming a porous polishing pad
- Patent number 7,435,364
- Issue date Oct 14, 2008
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Method for forming a porous reaction injection molded chemical mech...
- Patent number 7,399,437
- Issue date Jul 15, 2008
- Rohm and Haas Electronics Materials CMP Holdings, Inc.
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Elastomer-modified chemical mechanical polishing pad
- Patent number 7,371,160
- Issue date May 13, 2008
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- Carlos A. Cruz
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad
- Patent number 7,074,115
- Issue date Jul 11, 2006
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,869,350
- Issue date Mar 22, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads for chemical mechanical planarization
- Patent number 6,860,802
- Issue date Mar 1, 2005
- Rohm and Haas Electric Materials CMP Holdings, Inc.
- Arun Vishwanathan
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for electrochemical mechanical polishing
- Patent number 6,848,977
- Issue date Feb 1, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Lee Melbourne Cook
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,843,712
- Issue date Jan 18, 2005
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- John H. V. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Hydrolytically stable grooved polishing pads for chemical mechanica...
- Patent number 6,749,485
- Issue date Jun 15, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pads and methods relating thereto
- Patent number 6,739,962
- Issue date May 25, 2004
- Rodel Holdings, Inc.
- John V. H. Roberts
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved polishing pads for chemical mechanical planarization
- Patent number 6,736,709
- Issue date May 18, 2004
- Rodel Holdings, Inc.
- David B. James
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING PAD WITH POLISHING LAYER AND WINDOW
- Publication number 20150273652
- Publication date Oct 1, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Bainian Qian
- G02 - OPTICS
Information Patent Application
POLYURETHANE POLISHING PAD
- Publication number 20150059254
- Publication date Mar 5, 2015
- DOW GLOBAL TECHNOLOGIES LLC
- Fengji Yeh
- B24 - GRINDING POLISHING
Information Patent Application
Multilayer Chemical Mechanical Polishing Pad Stack With Soft And Co...
- Publication number 20140357163
- Publication date Dec 4, 2014
- James Murnane
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Soft And Conditionable Chemical Mechanical Polishing Pad Stack
- Publication number 20140357169
- Publication date Dec 4, 2014
- James Murnane
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Soft and Conditionable Chemical Mechanical Window Polishing Pad
- Publication number 20140357170
- Publication date Dec 4, 2014
- Bainian Qian
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Broad Spectrum, Endpoint Detection Window Multilayer Chemical Mecha...
- Publication number 20140256232
- Publication date Sep 11, 2014
- DOW GLOBAL TECHNOLOGIES LLC
- Angus Repper
- B24 - GRINDING POLISHING
Information Patent Application
Multilayer Chemical Mechanical Polishing Pad With Broad Spectrum, E...
- Publication number 20140256231
- Publication date Sep 11, 2014
- DOW GLOBAL TECHNOLOGIES LLC
- Angus Repper
- B32 - LAYERED PRODUCTS
Information Patent Application
Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Det...
- Publication number 20140256225
- Publication date Sep 11, 2014
- DOW GLOBAL TECHNOLOGIES LLC
- Angus Repper
- B24 - GRINDING POLISHING
Information Patent Application
Broad spectrum, endpoint detection window chemical mechanical polis...
- Publication number 20140256226
- Publication date Sep 11, 2014
- Angus Repper
- B24 - GRINDING POLISHING
Information Patent Application
Soft And Conditionable Chemical Mechanical Polishing Pad
- Publication number 20140120809
- Publication date May 1, 2014
- Bainian Qian
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Forming Alkaline-Earth Metal Oxide Polishing Pad
- Publication number 20130298472
- Publication date Nov 14, 2013
- Donna M. Alden
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Alkaline-Earth Metal Oxide-Polymeric Polishing Pad
- Publication number 20130303061
- Publication date Nov 14, 2013
- David B. James
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Hollow Polymeric-Alkaline Earth Metal Oxide Composite
- Publication number 20130298473
- Publication date Nov 14, 2013
- Andrew R. WANK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACRYLATE POLYURETHANE CHEMICAL MECHANICAL POLISHING LAYER
- Publication number 20130084702
- Publication date Apr 4, 2013
- Jia Xie
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Dual-Pore Structure Polishing Pad
- Publication number 20120171940
- Publication date Jul 5, 2012
- Rohm and Haas Electronic Materials CMP Holdings Inc.
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Dual-pore structure polishing pad
- Publication number 20110076928
- Publication date Mar 31, 2011
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method for electrochemical mechanical polishing
- Publication number 20100000877
- Publication date Jan 7, 2010
- Joseph G. Ameen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Chemical mechanical polishing pad
- Publication number 20080153395
- Publication date Jun 26, 2008
- Mary Jo Kulp
- B24 - GRINDING POLISHING
Information Patent Application
Multilayered polishing pads having improved defectivity and methods...
- Publication number 20070141312
- Publication date Jun 21, 2007
- David B. James
- B24 - GRINDING POLISHING
Information Patent Application
Method for forming a porous reaction injection molded chemical mech...
- Publication number 20060226568
- Publication date Oct 12, 2006
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Apparatus for forming a porous reaction injection molded chemical m...
- Publication number 20060228439
- Publication date Oct 12, 2006
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Method for forming a porous polishing pad
- Publication number 20060226567
- Publication date Oct 12, 2006
- David B. James
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Water-based polishing pads and methods of manufacture
- Publication number 20060202384
- Publication date Sep 14, 2006
- Chau H. Duong
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
Polishing pad for electrochemical mechanical polishing
- Publication number 20050263406
- Publication date Dec 1, 2005
- Joseph G. Ameen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Polishing pad
- Publication number 20050079806
- Publication date Apr 14, 2005
- David B. James
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Polishing pads for chemical mechanical planarization
- Publication number 20050020082
- Publication date Jan 27, 2005
- Arun Vishwanathan
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20040048562
- Publication date Mar 11, 2004
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20040048564
- Publication date Mar 11, 2004
- John V.H. Roberts
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads for chemical mechanical planarization
- Publication number 20030027500
- Publication date Feb 6, 2003
- David B. James
- B24 - GRINDING POLISHING
Information Patent Application
Polishing pads and methods relating thereto
- Publication number 20020155801
- Publication date Oct 24, 2002
- John V.H. Roberts
- B24 - GRINDING POLISHING

David B. James

Person

Patents Grantslast 30 patents

Broad spectrum, endpoint detection monophase olefin copolymer windo...

Chemical mechanical polishing pad with polishing layer and window

Soft and conditionable chemical mechanical window polishing pad

Multilayer chemical mechanical polishing pad stack with soft and co...

Soft and conditionable chemical mechanical polishing pad stack

Chemical mechanical polishing pad with broad spectrum, endpoint det...

Soft and conditionable chemical mechanical polishing pad

Alkaline-earth metal oxide-polymeric polishing pad

Soft and conditionable chemical mechanical polishing pad with window

Method for chemical mechanical polishing silicon wafers

Hollow polymeric-alkaline earth metal oxide composite

Forming alkaline-earth metal oxide polishing pad

Acrylate polyurethane chemical mechanical polishing layer

Dual-pore structure polishing pad

Dual-pore structure polishing pad

Method for electrochemical mechanical polishing

Polishing pad for electrochemical mechanical polishing

Apparatus for forming a porous reaction injection molded chemical m...

Chemical mechanical polishing pad

Method for forming a porous polishing pad

Method for forming a porous reaction injection molded chemical mech...

Elastomer-modified chemical mechanical polishing pad

Polishing pad

Polishing pads and methods relating thereto

Polishing pads for chemical mechanical planarization

Polishing pad for electrochemical mechanical polishing

Polishing pads and methods relating thereto

Hydrolytically stable grooved polishing pads for chemical mechanica...

Polishing pads and methods relating thereto

Grooved polishing pads for chemical mechanical planarization

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING PAD WITH POLISHING LAYER AND WINDOW

POLYURETHANE POLISHING PAD

Multilayer Chemical Mechanical Polishing Pad Stack With Soft And Co...

Soft And Conditionable Chemical Mechanical Polishing Pad Stack

Soft and Conditionable Chemical Mechanical Window Polishing Pad

Broad Spectrum, Endpoint Detection Window Multilayer Chemical Mecha...

Multilayer Chemical Mechanical Polishing Pad With Broad Spectrum, E...

Chemical Mechanical Polishing Pad With Broad Spectrum, Endpoint Det...

Broad spectrum, endpoint detection window chemical mechanical polis...

Soft And Conditionable Chemical Mechanical Polishing Pad

Forming Alkaline-Earth Metal Oxide Polishing Pad

Alkaline-Earth Metal Oxide-Polymeric Polishing Pad

Hollow Polymeric-Alkaline Earth Metal Oxide Composite

ACRYLATE POLYURETHANE CHEMICAL MECHANICAL POLISHING LAYER

Dual-Pore Structure Polishing Pad

Dual-pore structure polishing pad

Method for electrochemical mechanical polishing

Chemical mechanical polishing pad

Multilayered polishing pads having improved defectivity and methods...

Method for forming a porous reaction injection molded chemical mech...

Apparatus for forming a porous reaction injection molded chemical m...

Method for forming a porous polishing pad

Water-based polishing pads and methods of manufacture

Polishing pad for electrochemical mechanical polishing

Polishing pad

Polishing pads for chemical mechanical planarization

Polishing pads and methods relating thereto

Polishing pads and methods relating thereto

Polishing pads for chemical mechanical planarization

Polishing pads and methods relating thereto