David H. Ziger

Person

San Antonio, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Managing resources for multiple trial distributed processing tasks
- Patent number 10,929,177
- Issue date Feb 23, 2021
- Synopsys, Inc.
- David Howard Ziger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Determination of dimensional changes of features across mask patter...
- Patent number 10,810,339
- Issue date Oct 20, 2020
- Synopsys, Inc.
- David Howard Ziger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Calibration of optical line shortening measurements
- Patent number 8,717,539
- Issue date May 6, 2014
- Infineon Technologies AG
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration of optical line shortening measurements
- Patent number 7,842,439
- Issue date Nov 30, 2010
- Infineon Technologies AG
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining relative swing curve amplitude
- Patent number 7,790,480
- Issue date Sep 7, 2010
- NXP B.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring the effect of flare on line width
- Patent number 7,709,166
- Issue date May 4, 2010
- NXP B.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring the effect of flare on line width
- Patent number 7,556,900
- Issue date Jul 7, 2009
- NXP B.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration of optical line shortening measurements
- Patent number 7,541,121
- Issue date Jun 2, 2009
- Infineon Technologies AG
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for characterizing lithography effects on a wafer
- Patent number 7,537,939
- Issue date May 26, 2009
- NXP B.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining optimal resist thickness
- Patent number 7,492,465
- Issue date Feb 17, 2009
- NXP B.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement of optical properties of radiation sensitive materials
- Patent number 7,099,018
- Issue date Aug 29, 2006
- Infineon Technologies AG
- David Ziger
- G01 - MEASURING TESTING
Information Patent Grant
Measuring flare in semiconductor lithography
- Patent number 7,096,127
- Issue date Aug 22, 2006
- Infineon Technologies AG
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration wafer for a stepper
- Patent number 7,054,007
- Issue date May 30, 2006
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Techniques to characterize iso-dense effects for microdevice manufa...
- Patent number 6,800,403
- Issue date Oct 5, 2004
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G01 - MEASURING TESTING
Information Patent Grant
Method for improving substrate alignment
- Patent number 6,716,649
- Issue date Apr 6, 2004
- Koninklijke Philips Electronics N.V.
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for improving substrate alignment
- Patent number 6,613,589
- Issue date Sep 2, 2003
- Koninklijke Philips Electronics N.V.
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for calculating alignment of layers during se...
- Patent number 6,591,155
- Issue date Jul 8, 2003
- Koninklijke Philips Electronics N.V.
- David Ziger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for forming photoresist pattern with target cr...
- Patent number 6,590,219
- Issue date Jul 8, 2003
- Koninklijke Philips Electronics N.V.
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for compensating critical dimension deviations...
- Patent number 6,566,016
- Issue date May 20, 2003
- Koninklijke Philips Electronics N.V.
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing methods and structures for determining ali...
- Patent number 6,544,859
- Issue date Apr 8, 2003
- Koninklijke Philips Electronics N.V.
- David Ziger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to measure alignment using latent image grating structures
- Patent number 6,498,640
- Issue date Dec 24, 2002
- Koninklijke Philips Electronics N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor processing methods and structures for determining ali...
- Patent number 6,465,322
- Issue date Oct 15, 2002
- Koninklijke Philips Electronics N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing contamination induced scumming, for semiconductor device,...
- Patent number 6,372,658
- Issue date Apr 16, 2002
- KoninKlijke Philips Electronics N.V. (KPENV)
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for calculating alignment of layers during se...
- Patent number 6,327,513
- Issue date Dec 4, 2001
- VLSI Technology, Inc.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing contamination induced scumming, for semiconductor device,...
- Patent number 6,309,804
- Issue date Oct 30, 2001
- Philips Semiconductor, Inc.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement and method for calibrating optical line shortening meas...
- Patent number 6,301,008
- Issue date Oct 9, 2001
- Philips Semiconductor, Inc.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for residue entrapment utilizing a polish and sac...
- Patent number 6,287,972
- Issue date Sep 11, 2001
- Philips Semiconductor, Inc.
- David Ziger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of inspecting for mask-defined, feature dimensional conform...
- Patent number 6,068,955
- Issue date May 30, 2000
- VLSI Technology, Inc.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adaptive sampling for building accurate computer models
- Patent number 6,063,127
- Issue date May 16, 2000
- VLSI Technology, Inc.
- David H. Ziger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Thin film thickness and optimal focus measuring using reflectivity
- Patent number 5,982,496
- Issue date Nov 9, 1999
- VLSI Technology, Inc.
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MANAGING RESOURCES FOR MULTIPLE TRIAL DISTRIBUTED PROCESSING TASKS
- Publication number 20180121251
- Publication date May 3, 2018
- Synopsys, Inc.
- David Howard Ziger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Calibration of Optical Line Shortening Measurements
- Publication number 20110035171
- Publication date Feb 10, 2011
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING THE EFFECT OF FLARE ON LINE WIDTH
- Publication number 20090220870
- Publication date Sep 3, 2009
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration of Optical Line Shortening Measurements
- Publication number 20090198468
- Publication date Aug 6, 2009
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING RELATIVE SWING CURVE AMPLITUDE
- Publication number 20090119069
- Publication date May 7, 2009
- Koninklijke Philips Electronics, N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Determining Optimal Resist Thickness
- Publication number 20080206687
- Publication date Aug 28, 2008
- Koninklijke Philips Electronics N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Characterizing Lithography Effects on a Wafer
- Publication number 20070275329
- Publication date Nov 29, 2007
- Koninklijke Philips Electronics N.V.
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring the effect of flare on line width
- Publication number 20060210885
- Publication date Sep 21, 2006
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measuring flare in semiconductor lithography
- Publication number 20060080046
- Publication date Apr 13, 2006
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration of optical line shortening measurements
- Publication number 20060078804
- Publication date Apr 13, 2006
- David Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration wafer for a stepper
- Publication number 20060033917
- Publication date Feb 16, 2006
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Measurement of optical properties of radiation sensitive materials
- Publication number 20050151962
- Publication date Jul 14, 2005
- David Ziger
- G01 - MEASURING TESTING
Information Patent Application
Techniques to characterize iso-dense effects for microdevice manufa...
- Publication number 20030232253
- Publication date Dec 18, 2003
- Pierre Leroux
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for compensating critical dimension deviations...
- Publication number 20030157415
- Publication date Aug 21, 2003
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Calibration wafer for a stepper
- Publication number 20030152848
- Publication date Aug 14, 2003
- Koninklijke Philips Electronics N.V.
- Pierre Leroux
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improving substrate alignment
- Publication number 20030104640
- Publication date Jun 5, 2003
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for improving substrate alignment
- Publication number 20030005405
- Publication date Jan 2, 2003
- David H. Ziger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor processing methods and structures for determining ali...
- Publication number 20020048922
- Publication date Apr 25, 2002
- DAVID ZIGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for calculating alignment of layers during se...
- Publication number 20020038161
- Publication date Mar 28, 2002
- David Ziger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING METHODS AND STRUCTURES FOR DETERMINING ALI...
- Publication number 20010051441
- Publication date Dec 13, 2001
- DAVID ZIGER
- H01 - BASIC ELECTRIC ELEMENTS

David H. Ziger

Person

Patents Grantslast 30 patents

Managing resources for multiple trial distributed processing tasks

Determination of dimensional changes of features across mask patter...

Calibration of optical line shortening measurements

Calibration of optical line shortening measurements

Method for determining relative swing curve amplitude

Measuring the effect of flare on line width

Measuring the effect of flare on line width

Calibration of optical line shortening measurements

System and method for characterizing lithography effects on a wafer

Method for determining optimal resist thickness

Measurement of optical properties of radiation sensitive materials

Measuring flare in semiconductor lithography

Calibration wafer for a stepper

Techniques to characterize iso-dense effects for microdevice manufa...

Method for improving substrate alignment

Method for improving substrate alignment

Methods and apparatus for calculating alignment of layers during se...

Apparatus and method for forming photoresist pattern with target cr...

Apparatus and method for compensating critical dimension deviations...

Semiconductor processing methods and structures for determining ali...

Method to measure alignment using latent image grating structures

Semiconductor processing methods and structures for determining ali...

Reducing contamination induced scumming, for semiconductor device,...

Methods and apparatus for calculating alignment of layers during se...

Reducing contamination induced scumming, for semiconductor device,...

Arrangement and method for calibrating optical line shortening meas...

System and method for residue entrapment utilizing a polish and sac...

Methods of inspecting for mask-defined, feature dimensional conform...

Method for adaptive sampling for building accurate computer models

Thin film thickness and optimal focus measuring using reflectivity

Patents Applicationslast 30 patents

MANAGING RESOURCES FOR MULTIPLE TRIAL DISTRIBUTED PROCESSING TASKS

Calibration of Optical Line Shortening Measurements

MEASURING THE EFFECT OF FLARE ON LINE WIDTH

Calibration of Optical Line Shortening Measurements

METHOD FOR DETERMINING RELATIVE SWING CURVE AMPLITUDE

Method for Determining Optimal Resist Thickness

System and Method for Characterizing Lithography Effects on a Wafer

Measuring the effect of flare on line width

Measuring flare in semiconductor lithography

Calibration of optical line shortening measurements

Calibration wafer for a stepper

Measurement of optical properties of radiation sensitive materials

Techniques to characterize iso-dense effects for microdevice manufa...

Apparatus and method for compensating critical dimension deviations...

Calibration wafer for a stepper

Method for improving substrate alignment

Method for improving substrate alignment

Semiconductor processing methods and structures for determining ali...

Methods and apparatus for calculating alignment of layers during se...

SEMICONDUCTOR PROCESSING METHODS AND STRUCTURES FOR DETERMINING ALI...