David J. Brzozowy

Follow

Person

Lincoln, RI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Novolak resins and their use in radiation-sensitive compositions wh...
- Patent number 5,346,799
- Issue date Sep 13, 1994
- OCG Microelectronic Materials, Inc.
- Alfred T. Jeffries
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process of developing an image utilizing positive-working radiation...
- Patent number 5,284,737
- Issue date Feb 8, 1994
- OCG Microelectronic Materials, Inc.
- Tripunithura V. Jayaraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working radiation sensitive mixtures and articles containi...
- Patent number 5,275,909
- Issue date Jan 4, 1994
- OCG Microelectronic Materials, Inc.
- Tripunithura V. Jayaraman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist developer containing fluorinated amphoteric surfactant
- Patent number 5,164,286
- Issue date Nov 17, 1992
- OCG Microelectronic Materials, Inc.
- Andrew J. Blakeney
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY