David Liu

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Etch rate loading improvement
- Patent number 6,017,825
- Issue date Jan 25, 2000
- Lam Research Corporation
- Sung Ho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative offset bipolar electrostatic chucks
- Patent number 5,835,333
- Issue date Nov 10, 1998
- Lam Research Corporation
- Edward Ross Castro
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Gas dispersion window for plasma apparatus and method of use thereof
- Patent number 5,824,605
- Issue date Oct 20, 1998
- Lam Research Corporation
- Ching-Hwa Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic feedback electrostatic wafer chuck
- Patent number 5,812,361
- Issue date Sep 22, 1998
- Lam Research Corporation
- Phillip Lawrence Jones
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating an article with a plasma apparatus in which a un...
- Patent number 5,368,710
- Issue date Nov 29, 1994
- Lam Research Corporation
- Ching-Hwa Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma cleaning method for removing residues in a plasma treatment...
- Patent number 5,356,478
- Issue date Oct 18, 1994
- Lam Research Corporation
- Ching-Hwa Chen
- B08 - CLEANING
Information Patent Grant
Plasma apparatus including dielectric window for inducing a uniform...
- Patent number 5,226,967
- Issue date Jul 13, 1993
- Lam Research Corporation
- Ching-Hwa Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Etch rate loading improvement

Negative offset bipolar electrostatic chucks

Gas dispersion window for plasma apparatus and method of use thereof

Dynamic feedback electrostatic wafer chuck

Method of treating an article with a plasma apparatus in which a un...

Plasma cleaning method for removing residues in a plasma treatment...

Plasma apparatus including dielectric window for inducing a uniform...