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David P. Hurley
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Dublin, IE
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Patents Grants
last 30 patents
Information
Patent Grant
Semiconductor processing systems with in-situ electrical bias
Patent number
11,894,240
Issue date
Feb 6, 2024
Tokyo Electron Limited
David Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor processing system with in-situ electrical bias and me...
Patent number
11,837,652
Issue date
Dec 5, 2023
Tokyo Electron Limited
David Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Workpiece magnetizing system and method of operating
Patent number
11,527,345
Issue date
Dec 13, 2022
Tokyo Electron Limited
Ian Colgan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor processing system with in-situ electrical bias and me...
Patent number
11,335,792
Issue date
May 17, 2022
Tokyo Electron Limited
David Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and system for performing post-etch annealing of a workpiece
Patent number
10,319,905
Issue date
Jun 11, 2019
Tokyo Electron Limited
David F. Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Vertical multi-batch magnetic annealing systems for reduced footpri...
Patent number
10,003,018
Issue date
Jun 19, 2018
Tokyo Electron Limited
Ian Colgan
C21 - METALLURGY OF IRON
Information
Patent Grant
Device for generating a variable magnetic field
Patent number
6,535,092
Issue date
Mar 18, 2003
Magnetic Solutions (Holdings) Limited
David Patrick Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Magnetic materials and processes for their production
Patent number
5,478,411
Issue date
Dec 26, 1995
Provost, Fellows and Scholars of the College of the Holy and Undivided Trinit...
John M. D. Coey
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
Magnetic Annealing Equipment and Method
Publication number
20230304741
Publication date
Sep 28, 2023
TOKYO ELECTRON LIMITED
Ian Colgan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Semiconductor Processing System with In-Situ Electrical Bias and Me...
Publication number
20220262921
Publication date
Aug 18, 2022
TOKYO ELECTRON LIMITED
David Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR MANUFACTURING PLATFORM WITH IN-SITU ELECTRICAL BIAS A...
Publication number
20210367046
Publication date
Nov 25, 2021
TOKYO ELECTRON LIMITED
Dina H. Triyoso
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR PROCESSING SYSTEMS WITH IN-SITU ELECTRICAL BIAS
Publication number
20210313189
Publication date
Oct 7, 2021
TOKYO ELECTRON LIMITED
David Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SEMICONDUCTOR PROCESSING SYSTEM WITH IN-SITU ELECTRICAL BIAS AND ME...
Publication number
20210313444
Publication date
Oct 7, 2021
TOKYO ELECTRON LIMITED
David Hurley
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SUBSTRATE PROCESSING DEVICE AND PROCESSING SYSTEM
Publication number
20200232090
Publication date
Jul 23, 2020
TOKYO ELECTRON LIMITED
Hiroki MAEHARA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
WORKPIECE MAGNETIZING SYSTEM AND METHOD OF OPERATING
Publication number
20190371506
Publication date
Dec 5, 2019
TOKYO ELECTRON LIMITED
Ian COLGAN
C21 - METALLURGY OF IRON
Information
Patent Application
METHOD AND SYSTEM FOR PERFORMING POST-ETCH ANNEALING OF A WORKPIECE
Publication number
20150214473
Publication date
Jul 30, 2015
TOKYO ELECTRON LIMITED
David F. Hurley
H01 - BASIC ELECTRIC ELEMENTS