David T. Or

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-step pre-clean for selective metal gap fill
- Patent number 11,776,806
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Xi Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step pre-clean for selective metal gap fill
- Patent number 11,380,536
- Issue date Jul 5, 2022
- Applied Materials, Inc.
- Xi Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a metal gapfill
- Patent number 11,355,391
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Xi Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional SiO2 etch using plasma pre-treatment and high-temperatu...
- Patent number 9,653,318
- Issue date May 16, 2017
- Applied Materials, Inc.
- David T. Or
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma cleaning apparatus and method
- Patent number 9,552,968
- Issue date Jan 24, 2017
- Applied Materials, Inc.
- Martin Deehan
- B08 - CLEANING
Information Patent Grant
Directional SiO2 etch using plasma pre-treatment and high-temperatu...
- Patent number 9,245,769
- Issue date Jan 26, 2016
- Applied Materials, Inc.
- David T. Or
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional SiO2 etch using low-temperature etchant deposition and...
- Patent number 9,202,745
- Issue date Dec 1, 2015
- Applied Materials, Inc.
- David T. Or
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional SiO2 etch using plasma pre-treatment and high-temperatu...
- Patent number 9,177,780
- Issue date Nov 3, 2015
- Applied Materials, Inc.
- David T. Or
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber lid design with built-in plasma source for short li...
- Patent number 9,004,006
- Issue date Apr 14, 2015
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Directional SIO2 etch using low-temperature etchant deposition and...
- Patent number 8,980,761
- Issue date Mar 17, 2015
- Applied Materials, Inc.
- David T. Or
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide recess etch
- Patent number 8,748,322
- Issue date Jun 10, 2014
- Applied Materials, Inc.
- Nancy Fung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma cleaning apparatus and method
- Patent number 8,721,796
- Issue date May 13, 2014
- Applied Materials, Inc.
- Martin Deehan
- B08 - CLEANING
Information Patent Grant
Selective etching of silicon nitride
- Patent number 8,252,696
- Issue date Aug 28, 2012
- Applied Materials, Inc.
- Xinliang Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct real-time monitoring and feedback control of RF plasma outpu...
- Patent number 7,910,853
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- David T. Or
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support lift mechanism
- Patent number 7,871,470
- Issue date Jan 18, 2011
- Applied Materials, Inc.
- Eric W. Schieve
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support lift pin
- Patent number D568914
- Issue date May 13, 2008
- Applied Materials, Inc.
- David T. Or
- D15 - Machines not elsewhere specified
Information Patent Grant
Reduced friction lift pin
- Patent number 6,887,317
- Issue date May 3, 2005
- Applied Materials, Inc.
- David T. Or
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
300 mm CVD chamber design for metal-organic thin film deposition
- Patent number 6,364,949
- Issue date Apr 2, 2002
- Applied Materials, Inc.
- David T. Or
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron with cooling system for process chamber of processing system
- Patent number 5,953,827
- Issue date Sep 21, 1999
- Applied Materials, Inc.
- David T. Or
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MITIGATION OF FIRST WAFER EFFECT
- Publication number 20240379343
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Yongqian Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A MEOL CONTACT STRUCTURE
- Publication number 20240379768
- Publication date Nov 14, 2024
- Applied Materials, Inc.
- Shumao ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER WITH PRESSURE CHARGING AND PULSING CAPABILITY
- Publication number 20240153790
- Publication date May 9, 2024
- Applied Materials, Inc.
- Borui Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Passivation Of Damaged Nitride
- Publication number 20230136499
- Publication date May 4, 2023
- Applied Materials, Inc.
- Shumao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP PRE-CLEAN FOR SELECTIVE METAL GAP FILL
- Publication number 20220270871
- Publication date Aug 25, 2022
- Applied Materials, Inc.
- Xi Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Step Pre-Clean for Selective Metal Gap Fill
- Publication number 20210351032
- Publication date Nov 11, 2021
- Applied Materials, Inc.
- Xi Cen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING A METAL GAPFILL
- Publication number 20200303250
- Publication date Sep 24, 2020
- Applied Materials, Inc.
- Xi CEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SIO2 ETCH USING PLASMA PRE-TREATMENT AND HIGH-TEMPERATU...
- Publication number 20160247689
- Publication date Aug 25, 2016
- Applied Materials, Inc.
- David T. OR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH ENHANCEMENT VIA CONTROLLED INTRODUCTION OF CHAMBER CONTAMINANTS
- Publication number 20160133441
- Publication date May 12, 2016
- Applied Materials, Inc.
- JONATHAN GERMAIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL SIO2 ETCH USING PLASMA PRE-TREATMENT AND HIGH-TEMPERATU...
- Publication number 20150072508
- Publication date Mar 12, 2015
- Applied Materials, Inc.
- David T. OR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SIO2 ETCH USING LOW-TEMPERATURE ETCHANT DEPOSITION AND...
- Publication number 20140363979
- Publication date Dec 11, 2014
- David T. OR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CLEANING APPARATUS AND METHOD
- Publication number 20140283872
- Publication date Sep 25, 2014
- Applied Materials, Inc.
- Martin DEEHAN
- B08 - CLEANING
Information Patent Application
DIRECTIONAL SIO2 ETCH USING PLASMA PRE-TREATMENT AND HIGH-TEMPERATU...
- Publication number 20140193979
- Publication date Jul 10, 2014
- David T. OR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROVIDING PLASMA TO A PROCESS CHAMBER
- Publication number 20140165911
- Publication date Jun 19, 2014
- Applied Materials, Inc.
- CHIEN-TEH KAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL SIO2 ETCH USING LOW-TEMPERATURE ETCHANT DEPOSITION AND...
- Publication number 20140094036
- Publication date Apr 3, 2014
- David T. OR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER LID DESIGN WITH BUILT-IN PLASMA SOURCE FOR SHORT LI...
- Publication number 20110265721
- Publication date Nov 3, 2011
- Applied Materials, Inc.
- Chien-Teh Kao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CLEANING APPARATUS AND METHOD
- Publication number 20100101602
- Publication date Apr 29, 2010
- Applied Materials, Inc.
- Martin Deehan
- B08 - CLEANING
Information Patent Application
NF3/H2 REMOTE PLASMA PROCESS WITH HIGH ETCH SELECTIVITY OF PSG/BPSG...
- Publication number 20100099263
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Chien-Teh Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECT REAL-TIME MONITORING AND FEEDBACK CONTROL OF RF PLASMA OUTPU...
- Publication number 20090218324
- Publication date Sep 3, 2009
- APPLIED MATERIALS, INC.
- David T. Or
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE ETCHING OF SILICON NITRIDE
- Publication number 20090104782
- Publication date Apr 23, 2009
- Applied Materials, Inc.
- XINLAING LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT LIFT MECHANISM
- Publication number 20060240542
- Publication date Oct 26, 2006
- Eric W. Schieve
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
In-situ chamber clean process to remove by-product deposits from ch...
- Publication number 20060051966
- Publication date Mar 9, 2006
- APPLIED MATERIALS, INC.
- David T. Or
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reduced friction lift pin
- Publication number 20050194100
- Publication date Sep 8, 2005
- APPLIED MATERIALS, INC.
- David T. Or
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate support lift mechanism
- Publication number 20040177813
- Publication date Sep 16, 2004
- APPLIED MATERIALS, INC.
- Eric W. Schieve
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reduced friction lift pin
- Publication number 20040045509
- Publication date Mar 11, 2004
- David T. Or
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

David T. Or

Person

Patents Grantslast 30 patents

Multi-step pre-clean for selective metal gap fill

Multi-step pre-clean for selective metal gap fill

Method for forming a metal gapfill

Directional SiO2 etch using plasma pre-treatment and high-temperatu...

Plasma cleaning apparatus and method

Directional SiO2 etch using plasma pre-treatment and high-temperatu...

Directional SiO2 etch using low-temperature etchant deposition and...

Directional SiO2 etch using plasma pre-treatment and high-temperatu...

Process chamber lid design with built-in plasma source for short li...

Directional SIO2 etch using low-temperature etchant deposition and...

Silicon oxide recess etch

Plasma cleaning apparatus and method

Selective etching of silicon nitride

Direct real-time monitoring and feedback control of RF plasma outpu...

Substrate support lift mechanism

Substrate support lift pin

Reduced friction lift pin

300 mm CVD chamber design for metal-organic thin film deposition

Magnetron with cooling system for process chamber of processing system

Patents Applicationslast 30 patents

MITIGATION OF FIRST WAFER EFFECT

METHOD OF FORMING A MEOL CONTACT STRUCTURE

PROCESS CHAMBER WITH PRESSURE CHARGING AND PULSING CAPABILITY

Selective Passivation Of Damaged Nitride

MULTI-STEP PRE-CLEAN FOR SELECTIVE METAL GAP FILL

Multi-Step Pre-Clean for Selective Metal Gap Fill

METHOD FOR FORMING A METAL GAPFILL

DIRECTIONAL SIO2 ETCH USING PLASMA PRE-TREATMENT AND HIGH-TEMPERATU...

ETCH ENHANCEMENT VIA CONTROLLED INTRODUCTION OF CHAMBER CONTAMINANTS

DIRECTIONAL SIO2 ETCH USING PLASMA PRE-TREATMENT AND HIGH-TEMPERATU...

DIRECTIONAL SIO2 ETCH USING LOW-TEMPERATURE ETCHANT DEPOSITION AND...

PLASMA CLEANING APPARATUS AND METHOD

DIRECTIONAL SIO2 ETCH USING PLASMA PRE-TREATMENT AND HIGH-TEMPERATU...

APPARATUS FOR PROVIDING PLASMA TO A PROCESS CHAMBER

DIRECTIONAL SIO2 ETCH USING LOW-TEMPERATURE ETCHANT DEPOSITION AND...

PROCESS CHAMBER LID DESIGN WITH BUILT-IN PLASMA SOURCE FOR SHORT LI...

PLASMA CLEANING APPARATUS AND METHOD

NF3/H2 REMOTE PLASMA PROCESS WITH HIGH ETCH SELECTIVITY OF PSG/BPSG...

DIRECT REAL-TIME MONITORING AND FEEDBACK CONTROL OF RF PLASMA OUTPU...

SELECTIVE ETCHING OF SILICON NITRIDE

SUBSTRATE SUPPORT LIFT MECHANISM

In-situ chamber clean process to remove by-product deposits from ch...

Reduced friction lift pin

Substrate support lift mechanism

Reduced friction lift pin