David W. Myers

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Calibration of photoelectromagnetic sensor in a laser source
- Patent number 9,239,268
- Issue date Jan 19, 2016
- ASML Netherlands B.V.
- Rong Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Calibration of photoelectromagnetic sensor in a laser source
- Patent number 9,239,269
- Issue date Jan 19, 2016
- ASML Netherlands B.V.
- Rong Liu
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,567,607
- Issue date Jul 28, 2009
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
EUV light source
- Patent number 7,323,703
- Issue date Jan 29, 2008
- Cymer, Inc.
- I. Roger Oliver
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
LPP EUV light source
- Patent number 7,317,196
- Issue date Jan 8, 2008
- Cymer, Inc.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,218,661
- Issue date May 15, 2007
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
EUV light source
- Patent number 7,164,144
- Issue date Jan 16, 2007
- Cymer Inc.
- William N. Partlo
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV light source collector erosion mitigation
- Patent number 7,141,806
- Issue date Nov 28, 2006
- Cymer, Inc.
- William N. Partlo
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,061,961
- Issue date Jun 13, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,058,107
- Issue date Jun 6, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 6,801,560
- Issue date Oct 5, 2004
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,625,191
- Issue date Sep 23, 2003
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,567,450
- Issue date May 20, 2003
- Cymer, Inc.
- David W. Myers
- G01 - MEASURING TESTING
Information Patent Grant
Reliable modular production quality narrow-band high REP rate excim...
- Patent number 6,128,323
- Issue date Oct 3, 2000
- Cymer, Inc.
- David W. Myers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Portable gas chromatograph-mass spectrometer
- Patent number 5,525,799
- Issue date Jun 11, 1996
- The United States of America as represented by the United States Department o...
- Brian D. Andresen
- G01 - MEASURING TESTING
Information Patent Grant
Portable mass spectrometer with one or more mechanically adjustable...
- Patent number 5,153,433
- Issue date Oct 6, 1992
- The United States of America as represented by the United States Department o...
- Brian D. Andresen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for film thickness and refractive index determination
- Patent number 4,909,631
- Issue date Mar 20, 1990
- Raul Y. Tan
- G01 - MEASURING TESTING
Information Patent Grant
Characterization of semiconductor resist material during processing
- Patent number 4,874,240
- Issue date Oct 17, 1989
- Hoechst Celanese
- Michael P. C. Watts
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Absorption measurements of materials
- Patent number 4,857,738
- Issue date Aug 15, 1989
- General Signal Corporation
- David W. Myers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE
- Publication number 20160011056
- Publication date Jan 14, 2016
- ASML NETHERLANDS B.V.
- Rong Liu
- G01 - MEASURING TESTING
Information Patent Application
CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE
- Publication number 20160011057
- Publication date Jan 14, 2016
- ASML NETHERLANDS B.V.
- Rong Liu
- G01 - MEASURING TESTING
Information Patent Application
EUV light source
- Publication number 20070158596
- Publication date Jul 12, 2007
- I. Roger Oliver
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Publication number 20060126697
- Publication date Jun 15, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...
- Publication number 20050271109
- Publication date Dec 8, 2005
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
EUV light source
- Publication number 20050199829
- Publication date Sep 15, 2005
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040258122
- Publication date Dec 23, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040174919
- Publication date Sep 9, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Very narrow band, two chamber, high reprate gas discharge laser system
- Publication number 20040047385
- Publication date Mar 11, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Publication number 20020154668
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20020154671
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Publication number 20020044586
- Publication date Apr 18, 2002
- David W. Myers
- G01 - MEASURING TESTING

David W. Myers

Person

Patents Grantslast 30 patents

Calibration of photoelectromagnetic sensor in a laser source

Calibration of photoelectromagnetic sensor in a laser source

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

EUV light source

LPP EUV light source

Line selected F2 two chamber laser system

EUV light source

EUV light source collector erosion mitigation

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

Line selected F2 two chamber laser system

Line selected F2 two chamber laser system

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Reliable modular production quality narrow-band high REP rate excim...

Portable gas chromatograph-mass spectrometer

Portable mass spectrometer with one or more mechanically adjustable...

Method for film thickness and refractive index determination

Characterization of semiconductor resist material during processing

Absorption measurements of materials

Patents Applicationslast 30 patents

CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE

CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE

EUV light source

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...

EUV light source

Line selected F2 two chamber laser system

Line selected F2 two chamber laser system

Very narrow band, two chamber, high reprate gas discharge laser system

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Line selected F2 two chamber laser system

Very narrow band, two chamber, high rep rate gas discharge laser sy...