Dennis Hausmann

Person

Lake Oswego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective processing with etch residue-based inhibitors
- Patent number 11,823,909
- Issue date Nov 21, 2023
- Lam Research Corporation
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition using hydrolysis
- Patent number 11,404,275
- Issue date Aug 2, 2022
- Lam Research Corporation
- Dennis M. Hausmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum-integrated hardmask processes and apparatus
- Patent number 11,209,729
- Issue date Dec 28, 2021
- Lam Research Corporation
- Jeffrey Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 11,133,180
- Issue date Sep 28, 2021
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective growth of metal-containing hardmask thin films
- Patent number 11,107,683
- Issue date Aug 31, 2021
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition with atomic layer etch reset
- Patent number 10,998,187
- Issue date May 4, 2021
- Lam Research Corporation
- Kapu Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of silicon oxide
- Patent number 10,903,071
- Issue date Jan 26, 2021
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformality modulation of metal oxide films using chemical inhibition
- Patent number 10,843,618
- Issue date Nov 24, 2020
- Lam Research Corporation
- David C. Smith
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Vacuum-integrated hardmask processes and apparatus
- Patent number 10,831,096
- Issue date Nov 10, 2020
- Lam Research Corporation
- Jeffrey Marks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective growth of SIO2 on dielectric surfaces in the presence of...
- Patent number 10,825,679
- Issue date Nov 3, 2020
- Lam Research Corporation
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of aluminum oxide etch stop layers
- Patent number 10,804,144
- Issue date Oct 13, 2020
- Lam Research Corporation
- Meliha Gozde Rainville
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective inhibition in atomic layer deposition of silicon-containi...
- Patent number 10,804,099
- Issue date Oct 13, 2020
- Lam Research Corporation
- Jon Henri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of silicon nitride on silicon oxide using cata...
- Patent number 10,777,407
- Issue date Sep 15, 2020
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Geometrically selective deposition of a dielectric film
- Patent number 10,763,108
- Issue date Sep 1, 2020
- Lam Research Corporation
- Dennis M. Hausmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of Aluminum oxide etch stop layers
- Patent number 10,665,501
- Issue date May 26, 2020
- Lam Research Corporation
- Meliha Gozde Rainville
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for selective deposition using a base-catalyzed inhibitor
- Patent number 10,662,526
- Issue date May 26, 2020
- Lam Research Corporation
- Dennis Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective growth of metal-containing hardmask thin films
- Patent number 10,643,846
- Issue date May 5, 2020
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pre-treatment method to improve selectivity in a selective depositi...
- Patent number 10,643,889
- Issue date May 5, 2020
- Lam Rasearch Corporation
- Dennis Hausmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of silicon oxide
- Patent number 10,629,429
- Issue date Apr 21, 2020
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition with atomic layer etch reset
- Patent number 10,559,461
- Issue date Feb 11, 2020
- Lam Research Corporation
- Kapu Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum-integrated hardmask processes and apparatus
- Patent number 10,514,598
- Issue date Dec 24, 2019
- Lam Research Corporation
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 10,515,816
- Issue date Dec 24, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective growth of silicon nitride
- Patent number 10,490,413
- Issue date Nov 26, 2019
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective growth of SiO2 on dielectric surfaces in the presence of...
- Patent number 10,460,930
- Issue date Oct 29, 2019
- Lam Research Corporation
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for reducing the wet etch rate of a sin film without damagin...
- Patent number 10,454,029
- Issue date Oct 22, 2019
- Lam Research Corporation
- Andrew John McKerrow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Technique to deposit sidewall passivation for high aspect ratio cyl...
- Patent number 10,373,840
- Issue date Aug 6, 2019
- Lam Research Corporation
- Eric A. Hudson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 10,361,076
- Issue date Jul 23, 2019
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of silicon nitride on silicon oxide using cata...
- Patent number 10,242,866
- Issue date Mar 26, 2019
- Lam Research Corporation
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective growth of silicon oxide or silicon nitride on silicon sur...
- Patent number 10,199,212
- Issue date Feb 5, 2019
- Lam Research Corporation
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrating atomic scale processes: ALD (atomic layer deposition) a...
- Patent number 10,186,426
- Issue date Jan 22, 2019
- Lam Research Corporation
- Keren Jacobs Kanarik
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND R...
- Publication number 20240030062
- Publication date Jan 25, 2024
- LAM RESEARCH CORPORATION
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF METAL OXIDES USING SILANES AS AN INHIBITOR
- Publication number 20230386831
- Publication date Nov 30, 2023
- LAM RESEARCH CORPORATION
- Kashish SHARMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20230273516
- Publication date Aug 31, 2023
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20230266662
- Publication date Aug 24, 2023
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION USING HYDROLYSIS
- Publication number 20220319854
- Publication date Oct 6, 2022
- LAM RESEARCH CORPORATION
- Dennis M. Hausmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20220075260
- Publication date Mar 10, 2022
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...
- Publication number 20220059348
- Publication date Feb 24, 2022
- LAM RESEARCH CORPORATION
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
- Publication number 20210098257
- Publication date Apr 1, 2021
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION USING HYDROLYSIS
- Publication number 20210005460
- Publication date Jan 7, 2021
- LAM RESEARCH CORPORATION
- Dennis M. Hausmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF ALUMINUM OXIDE ETCH STOP LAYERS
- Publication number 20200251384
- Publication date Aug 6, 2020
- LAM RESEARCH CORPORATION
- Meliha Gozde Rainville
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS
- Publication number 20200227260
- Publication date Jul 16, 2020
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF SILICON OXIDE
- Publication number 20200219718
- Publication date Jul 9, 2020
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20200161139
- Publication date May 21, 2020
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION WITH ATOMIC LAYER ETCH RESET
- Publication number 20200118809
- Publication date Apr 16, 2020
- LAM RESEARCH CORPORATION
- Kapu Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR SELECTIVE DEPOSITION USING A BASE-CATALYZED INHIBITOR
- Publication number 20200102650
- Publication date Apr 2, 2020
- LAM RESEARCH CORPORATION
- Dennis Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20200089104
- Publication date Mar 19, 2020
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO INCREASE DEPOSITION RATE OF ALD PROCESS
- Publication number 20200040454
- Publication date Feb 6, 2020
- LAM RESEARCH CORPORATION
- Dennis HAUSMANN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRE-TREATMENT METHOD TO IMPROVE SELECTIVITY IN A SELECTIVE DEPOSITI...
- Publication number 20200043776
- Publication date Feb 6, 2020
- LAM RESEARCH CORPORATION
- Dennis HAUSMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE GROWTH OF SIO2 ON DIELECTRIC SURFACES IN THE PRESENCE OF...
- Publication number 20200013615
- Publication date Jan 9, 2020
- LAM RESEARCH CORPORATION
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS
- Publication number 20200006073
- Publication date Jan 2, 2020
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...
- Publication number 20190311897
- Publication date Oct 10, 2019
- LAM RESEARCH CORPORATION
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMALITY MODULATION OF METAL OXIDE FILMS USING CHEMICAL INHIBITION
- Publication number 20190203354
- Publication date Jul 4, 2019
- LAM RESEARCH CORPORATION
- David C. Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE GROWTH OF SIO2 ON DIELECTRIC SURFACES IN THE PRESENCE OF...
- Publication number 20190157076
- Publication date May 23, 2019
- LAM RESEARCH CORPORATION
- Dennis M. Hausmann
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF SILICON NITRIDE ON SILICON OXIDE USING CATA...
- Publication number 20190148128
- Publication date May 16, 2019
- LAM RESEARCH CORPORATION
- David Charles Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...
- Publication number 20190139778
- Publication date May 9, 2019
- LAM RESEARCH CORPORATION
- Keren Jacobs Kanarik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METAL OXIDE SUBSTRATES USING ALE AND SELECTIVE DEPOSITION
- Publication number 20190131130
- Publication date May 2, 2019
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF SILICON OXIDE
- Publication number 20190115207
- Publication date Apr 18, 2019
- LAM RESEARCH CORPORATION
- David Charles Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS
- Publication number 20190094685
- Publication date Mar 28, 2019
- LAM RESEARCH CORPORATION
- Jeffrey Marks
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GEOMETRICALLY SELECTIVE DEPOSITION OF A DIELECTRIC FILM
- Publication number 20190057858
- Publication date Feb 21, 2019
- LAM RESEARCH CORPORATION
- Dennis M. Hausmann
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION WITH ATOMIC LAYER ETCH RESET
- Publication number 20180308680
- Publication date Oct 25, 2018
- LAM RESEARCH CORPORATION
- Kapu Sirish Reddy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Dennis Hausmann

Person

Patents Grantslast 30 patents

Selective processing with etch residue-based inhibitors

Selective deposition using hydrolysis

Vacuum-integrated hardmask processes and apparatus

Gapfill of variable aspect ratio features with a composite PEALD an...

Selective growth of metal-containing hardmask thin films

Selective deposition with atomic layer etch reset

Selective deposition of silicon oxide

Conformality modulation of metal oxide films using chemical inhibition

Vacuum-integrated hardmask processes and apparatus

Selective growth of SIO2 on dielectric surfaces in the presence of...

Deposition of aluminum oxide etch stop layers

Selective inhibition in atomic layer deposition of silicon-containi...

Selective deposition of silicon nitride on silicon oxide using cata...

Geometrically selective deposition of a dielectric film

Deposition of Aluminum oxide etch stop layers

Method for selective deposition using a base-catalyzed inhibitor

Selective growth of metal-containing hardmask thin films

Pre-treatment method to improve selectivity in a selective depositi...

Selective deposition of silicon oxide

Selective deposition with atomic layer etch reset

Vacuum-integrated hardmask processes and apparatus

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Selective growth of silicon nitride

Selective growth of SiO2 on dielectric surfaces in the presence of...

Method for reducing the wet etch rate of a sin film without damagin...

Technique to deposit sidewall passivation for high aspect ratio cyl...

Gapfill of variable aspect ratio features with a composite PEALD an...

Selective deposition of silicon nitride on silicon oxide using cata...

Selective growth of silicon oxide or silicon nitride on silicon sur...

Integrating atomic scale processes: ALD (atomic layer deposition) a...

Patents Applicationslast 30 patents

INTEGRATION OF FULLY ALIGNED VIA THROUGH SELECTIVE DEPOSITION AND R...

SELECTIVE DEPOSITION OF METAL OXIDES USING SILANES AS AN INHIBITOR

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

SELECTIVE DEPOSITION USING HYDROLYSIS

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...

SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS

SELECTIVE DEPOSITION USING HYDROLYSIS

DEPOSITION OF ALUMINUM OXIDE ETCH STOP LAYERS

SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS

SELECTIVE DEPOSITION OF SILICON OXIDE

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

SELECTIVE DEPOSITION WITH ATOMIC LAYER ETCH RESET

METHOD FOR SELECTIVE DEPOSITION USING A BASE-CATALYZED INHIBITOR

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

METHOD TO INCREASE DEPOSITION RATE OF ALD PROCESS

PRE-TREATMENT METHOD TO IMPROVE SELECTIVITY IN A SELECTIVE DEPOSITI...

SELECTIVE GROWTH OF SIO2 ON DIELECTRIC SURFACES IN THE PRESENCE OF...

SELECTIVE GROWTH OF METAL-CONTAINING HARDMASK THIN FILMS

GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...

CONFORMALITY MODULATION OF METAL OXIDE FILMS USING CHEMICAL INHIBITION

SELECTIVE GROWTH OF SIO2 ON DIELECTRIC SURFACES IN THE PRESENCE OF...

SELECTIVE DEPOSITION OF SILICON NITRIDE ON SILICON OXIDE USING CATA...

INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) A...

ETCHING METAL OXIDE SUBSTRATES USING ALE AND SELECTIVE DEPOSITION

SELECTIVE DEPOSITION OF SILICON OXIDE

VACUUM-INTEGRATED HARDMASK PROCESSES AND APPARATUS

GEOMETRICALLY SELECTIVE DEPOSITION OF A DIELECTRIC FILM

SELECTIVE DEPOSITION WITH ATOMIC LAYER ETCH RESET