Deyan Wang

Person

Hudson, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Optically clear shear thickening fluids and optical display device...
- Patent number 11,999,844
- Issue date Jun 4, 2024
- ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Deyan Wang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,940,732
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflective coating
- Patent number 11,572,476
- Issue date Feb 7, 2023
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymers for display devices
- Patent number 11,332,559
- Issue date May 17, 2022
- Rohm and Haas Electronic Materials LLC
- Yixuan Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compositions comprising base-reactive component and processes for p...
- Patent number 11,106,137
- Issue date Aug 31, 2021
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acoustic wave sensors and methods of sensing a gas-phase analyte
- Patent number 10,794,866
- Issue date Oct 6, 2020
- Rohm and Haas Electronic Materials LLC
- Christopher Gilmore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,578,969
- Issue date Mar 3, 2020
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositions comprising sulfonamide material and processes for phot...
- Patent number 10,558,122
- Issue date Feb 11, 2020
- Rohm and Haas Electronic Materials, LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions comprising hetero-substituted carbocyclic aryl compone...
- Patent number 10,359,698
- Issue date Jul 23, 2019
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions and processes for immersion lithography
- Patent number 10,222,699
- Issue date Mar 5, 2019
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,197,918
- Issue date Feb 5, 2019
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Processes for photolithography
- Patent number 10,180,627
- Issue date Jan 15, 2019
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Neutral layer polymers, methods of manufacture thereof and articles...
- Patent number 10,167,411
- Issue date Jan 1, 2019
- Dow Global Technologies LLC
- Peter Trefonas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Topcoat compositions and pattern-forming methods
- Patent number 10,042,259
- Issue date Aug 7, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating compositions for photoresists
- Patent number 9,958,780
- Issue date May 1, 2018
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyarylene materials
- Patent number 9,868,820
- Issue date Jan 16, 2018
- Rohm and Haas Electronic Materials LLC
- Christopher D. Gilmore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Orientation control layer formed on a free top surface of a first b...
- Patent number 9,802,400
- Issue date Oct 31, 2017
- Dow Global Technologies LLC
- Peter Trefonas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions and processes for immersion lithography
- Patent number 9,696,622
- Issue date Jul 4, 2017
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions comprising base-reactive component and processes for p...
- Patent number 9,696,627
- Issue date Jul 4, 2017
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hardmask
- Patent number 9,563,126
- Issue date Feb 7, 2017
- Rohm and Haas Electronic Materials LLC
- Shintaro Yamada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions and processes for immersion lithography
- Patent number 9,563,128
- Issue date Feb 7, 2017
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal hardmask compositions
- Patent number 9,562,169
- Issue date Feb 7, 2017
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Display device manufacture using a sacrificial layer interposed bet...
- Patent number 9,515,272
- Issue date Dec 6, 2016
- Rohm and Haas Electronic Materials LLC
- Young Seok Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and processes for photolithography
- Patent number 9,507,260
- Issue date Nov 29, 2016
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods of forming photolithographic p...
- Patent number 9,482,948
- Issue date Nov 1, 2016
- Rohm and Haas Electronic Materials LLC
- Young Cheol Bae
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods of forming photolithographic p...
- Patent number 9,482,945
- Issue date Nov 1, 2016
- Rohm and Haas Electronic Materials LLC
- Jong Keun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compositions comprising base-reactive component and processes for p...
- Patent number 9,436,082
- Issue date Sep 6, 2016
- Rohm and Haas Electronics Materials LLC
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Neutral layer polymers, methods of manufacture thereof and articles...
- Patent number 9,382,444
- Issue date Jul 5, 2016
- Dow Global Technologies LLC
- Peter Trefonas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Hardmask
- Patent number 9,296,879
- Issue date Mar 29, 2016
- Rohm and Haas Electronic Materials LLC
- Shintaro Yamada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compositions and processes for photolithography
- Patent number 9,274,427
- Issue date Mar 1, 2016
- Rohm and Haas Electronic Materials LLC
- Deyan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
UV-CURING RESIN COMPOSITIONS FOR HARD COAT APPLICATIONS
- Publication number 20230124713
- Publication date Apr 20, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Michael MULZER
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220214616
- Publication date Jul 7, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220214619
- Publication date Jul 7, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH REFRACTIVE INDEX MATERIALS
- Publication number 20220112321
- Publication date Apr 14, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Anastasia PATTERSON
- G02 - OPTICS
Information Patent Application
COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES
- Publication number 20210341840
- Publication date Nov 4, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Sheng Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
OPTICALLY CLEAR SHEAR THICKENING FLUIDS AND OPTICAL DISPLAY DEVICE...
- Publication number 20210277219
- Publication date Sep 9, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- B82 - NANO-TECHNOLOGY
Information Patent Application
POLYMERS FOR DISPLAY DEVICES
- Publication number 20210017308
- Publication date Jan 21, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Yixuan Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ANTI-REFLECTIVE COATING
- Publication number 20200263041
- Publication date Aug 20, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONE...
- Publication number 20190346763
- Publication date Nov 14, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190235385
- Publication date Aug 1, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ACOUSTIC WAVE SENSORS AND METHODS OF SENSING A GAS-PHASE ANALYTE
- Publication number 20190219543
- Publication date Jul 18, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Christopher GILMORE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD OF FORMING A MULTILAYER STRUCTURE
- Publication number 20180282165
- Publication date Oct 4, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- C01 - INORGANIC CHEMISTRY
Information Patent Application
A METHOD OF MAKING A MULTILAYER STRUCTURE
- Publication number 20180286598
- Publication date Oct 4, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
A METHOD OF MAKING A GRAPHITIC CARBON SHEET
- Publication number 20180273388
- Publication date Sep 27, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- C01 - INORGANIC CHEMISTRY
Information Patent Application
A METHOD OF MAKING A COMPOSITE MULTILAYER STRUCTURE
- Publication number 20180265363
- Publication date Sep 20, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- C01 - INORGANIC CHEMISTRY
Information Patent Application
COMPOSITIONS AND METHODS FOR FORMING A PIXEL-DEFINING LAYER
- Publication number 20180224741
- Publication date Aug 9, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Peng-Wei Chuang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS
- Publication number 20180118970
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20180120703
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
NEUTRAL LAYER POLYMERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES...
- Publication number 20170327712
- Publication date Nov 16, 2017
- DOW GLOBAL TECHNOLOGIES LLC
- Peter Trefonas
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20160333212
- Publication date Nov 17, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
DISPLAY DEVICE MANUFACTURE
- Publication number 20160133864
- Publication date May 12, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Young Seok Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS
- Publication number 20160130462
- Publication date May 12, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Cong LIU
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC P...
- Publication number 20160109800
- Publication date Apr 21, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Young Cheol BAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC P...
- Publication number 20160103393
- Publication date Apr 14, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Jong Keun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOT...
- Publication number 20160070172
- Publication date Mar 10, 2016
- Rohm and Haas Electronic Materials, L.L.C.
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYARYLENE MATERIALS
- Publication number 20160060393
- Publication date Mar 3, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Christopher D. GILMORE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HARDMASK
- Publication number 20160048077
- Publication date Feb 18, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Shintaro YAMADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITIONS COMPRISING CARBOXY COMPONENT AND PROCESSES FOR PHOTOLI...
- Publication number 20150378255
- Publication date Dec 31, 2015
- Rohm and Haas Electronic Materials, L.L.C.
- Deyan Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS
- Publication number 20150323869
- Publication date Nov 12, 2015
- The Dow Chemical Company
- Cong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METAL HARDMASK COMPOSITIONS
- Publication number 20150291829
- Publication date Oct 15, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Deyan Wang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Person

Patents Grantslast 30 patents

Optically clear shear thickening fluids and optical display device...

Coating compositions and methods of forming electronic devices

Anti-reflective coating

Polymers for display devices

Compositions comprising base-reactive component and processes for p...

Acoustic wave sensors and methods of sensing a gas-phase analyte

Photoresist topcoat compositions and methods of processing photores...

Compositions comprising sulfonamide material and processes for phot...

Compositions comprising hetero-substituted carbocyclic aryl compone...

Compositions and processes for immersion lithography

Photoresist topcoat compositions and methods of processing photores...

Processes for photolithography

Neutral layer polymers, methods of manufacture thereof and articles...

Topcoat compositions and pattern-forming methods

Coating compositions for photoresists

Polyarylene materials

Orientation control layer formed on a free top surface of a first b...

Compositions and processes for immersion lithography

Compositions comprising base-reactive component and processes for p...

Hardmask

Compositions and processes for immersion lithography

Metal hardmask compositions

Display device manufacture using a sacrificial layer interposed bet...

Compositions and processes for photolithography

Photoresist compositions and methods of forming photolithographic p...

Photoresist compositions and methods of forming photolithographic p...

Compositions comprising base-reactive component and processes for p...

Neutral layer polymers, methods of manufacture thereof and articles...

Hardmask

Compositions and processes for photolithography

Patents Applicationslast 30 patents

UV-CURING RESIN COMPOSITIONS FOR HARD COAT APPLICATIONS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS

HIGH REFRACTIVE INDEX MATERIALS

COATING COMPOSITIONS AND METHODS OF FORMING ELECTRONIC DEVICES

OPTICALLY CLEAR SHEAR THICKENING FLUIDS AND OPTICAL DISPLAY DEVICE...

POLYMERS FOR DISPLAY DEVICES

ANTI-REFLECTIVE COATING

COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONE...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

ACOUSTIC WAVE SENSORS AND METHODS OF SENSING A GAS-PHASE ANALYTE

METHOD OF FORMING A MULTILAYER STRUCTURE

A METHOD OF MAKING A MULTILAYER STRUCTURE

A METHOD OF MAKING A GRAPHITIC CARBON SHEET

A METHOD OF MAKING A COMPOSITE MULTILAYER STRUCTURE

COMPOSITIONS AND METHODS FOR FORMING A PIXEL-DEFINING LAYER

TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

NEUTRAL LAYER POLYMERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

DISPLAY DEVICE MANUFACTURE

TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC P...

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC P...

COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOT...

POLYARYLENE MATERIALS

HARDMASK

COMPOSITIONS COMPRISING CARBOXY COMPONENT AND PROCESSES FOR PHOTOLI...

TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS

METAL HARDMASK COMPOSITIONS