Dian Sugiarto

Person

Union City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Low dielectric (low k) barrier films with oxygen doping by plasma-e...
- Patent number 7,745,328
- Issue date Jun 29, 2010
- Applied Materials, Inc.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low dielectric (low k) barrier films with oxygen doping by plasma-e...
- Patent number 7,465,659
- Issue date Dec 16, 2008
- Applied Materials, Inc.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adhesion improvement for low k dielectrics
- Patent number 7,459,404
- Issue date Dec 2, 2008
- Applied Materials, Inc.
- Lihua Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low dielectric (low k) barrier films with oxygen doping by plasma-e...
- Patent number 7,157,384
- Issue date Jan 2, 2007
- Applied Materials, Inc.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD plasma assisted lower dielectric constant SICOH film
- Patent number 7,153,787
- Issue date Dec 26, 2006
- Applied Materials, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing dielectric films
- Patent number 7,117,064
- Issue date Oct 3, 2006
- Applied Materials, Inc.
- Srinivas D Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adhesion improvement for low k dielectrics
- Patent number 7,030,041
- Issue date Apr 18, 2006
- Applied Materials Inc.
- Lihua Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for deposition of low dielectric constant mate...
- Patent number 7,008,484
- Issue date Mar 7, 2006
- Applied Materials Inc.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing dielectric films
- Patent number 7,001,850
- Issue date Feb 21, 2006
- Applied Materials Inc.
- Srinivas D Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CVD plasma assisted lower dielectric constant SICOH film
- Patent number 6,943,127
- Issue date Sep 13, 2005
- Applied Materials Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of reducing plasma-induced damage for advanced plasma CVD d...
- Patent number 6,911,403
- Issue date Jun 28, 2005
- Applied Materials, Inc.
- Lihua Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing semiconductor including forming a layer contai...
- Patent number 6,838,393
- Issue date Jan 4, 2005
- Applied Materials, Inc.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Damascene structure fabricated using a layer of silicon-based photo...
- Patent number 6,825,562
- Issue date Nov 30, 2004
- Applied Materials Inc.
- Mehul B. Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of depositing dielectric films
- Patent number 6,764,958
- Issue date Jul 20, 2004
- Applied Materials Inc.
- Srinivas D Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing low dielectric constant carbon doped silicon o...
- Patent number 6,632,735
- Issue date Oct 14, 2003
- Applied Materials, Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for depositing and developing a plasma polymerized organosi...
- Patent number 6,589,715
- Issue date Jul 8, 2003
- France Telecom
- Olivier Joubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damascene structure fabricated using a layer of silicon-based photo...
- Patent number 6,514,857
- Issue date Feb 4, 2003
- Applied Materials, Inc.
- Mehul B. Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
CVD plasma assisted lower dielectric constant sicoh film
- Patent number 6,486,082
- Issue date Nov 26, 2002
- Applied Materials, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for depositing high deposition rate halogen-doped silicon...
- Patent number 6,395,092
- Issue date May 28, 2002
- Applied Materials, Inc.
- Dian Sugiarto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for using bypass lines to stabilize gas flow and maintain pl...
- Patent number 6,258,735
- Issue date Jul 10, 2001
- Applied Materials, Inc.
- Li-qun Xia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for depositing a plasma polymerized organosilicon photoresi...
- Patent number 6,238,844
- Issue date May 29, 2001
- Applied Materials, Inc.
- Olivier Joubert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Damascene structure fabricated using a layer of silicon-based photo...
- Patent number 6,204,168
- Issue date Mar 20, 2001
- Applied Materials, Inc.
- Mehul B. Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for depositing deep UV photoresist films
- Patent number 6,090,530
- Issue date Jul 18, 2000
- Applied Materials, Inc.
- Timothy Weidman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for depositing high deposition rate halogen-doped silicon o...
- Patent number 6,077,764
- Issue date Jun 20, 2000
- Applied Materials, Inc.
- Dian Sugiarto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for depositing deep UV photoresist films
- Patent number 5,885,751
- Issue date Mar 23, 1999
- Applied Materials, Inc.
- Timothy Weidman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
LOW DIELECTRIC (LOW K) BARRIER FILMS WITH OXYGEN DOPING BY PLASMA-E...
- Publication number 20090053902
- Publication date Feb 26, 2009
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NEW LOW DIELECTRIC (LOW K) BARRIER FILMS WITH OXYGEN DOPING BY PLAS...
- Publication number 20060246737
- Publication date Nov 2, 2006
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adhesion improvement for low k dielectrics
- Publication number 20060189162
- Publication date Aug 24, 2006
- APPLIED MATERIALS, INC.
- Lihua Li Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for deposition of low dielectric constant mate...
- Publication number 20060144334
- Publication date Jul 6, 2006
- APPLIED MATERIALS, INC.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of depositing dielectric films
- Publication number 20060141805
- Publication date Jun 29, 2006
- APPLIED MATERIALS, INC.
- Srinivas D. Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adhesion improvement for low k dielectrics
- Publication number 20050202685
- Publication date Sep 15, 2005
- APPLIED MATERIALS, INC.
- Lihua Li Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD plasma assisted lower dielectric constant sicoh film
- Publication number 20050153572
- Publication date Jul 14, 2005
- APPLIED MATERIALS, INC.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low dielectric (low k) barrier films with oxygen doping by plasma-e...
- Publication number 20050130440
- Publication date Jun 16, 2005
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of reducing plasma-induced damage for advanced plasma CVD d...
- Publication number 20050042885
- Publication date Feb 24, 2005
- APPLIED MATERIALS, INC.
- Lihua Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of depositing dielectric films
- Publication number 20050020048
- Publication date Jan 27, 2005
- Srinivas D. Nemani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reacting an organosilicon compound with an oxidizing gas to form an...
- Publication number 20030211244
- Publication date Nov 13, 2003
- APPLIED MATERIALS, INC.
- Lihua Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for deposition of low dielectric constant mate...
- Publication number 20030207033
- Publication date Nov 6, 2003
- APPLIED MATERIALS, INC.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low dielectric (low k) barrier films with oxygen doping by plasma-e...
- Publication number 20030139035
- Publication date Jul 24, 2003
- APPLIED MATERIALS, INC.
- Kang Sub Yim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD plasma assisted lower dielectric constant sicoh film
- Publication number 20030104708
- Publication date Jun 5, 2003
- APPLIED MATERIALS, INC.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Damascene structure fabricated using a layer of silicon-based photo...
- Publication number 20030062627
- Publication date Apr 3, 2003
- APPLIED MATERIALS, INC.
- Mehul B. Naik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of depositing low dielectric constant carbon doped silicon o...
- Publication number 20030032305
- Publication date Feb 13, 2003
- APPLIED MATERIALS, INC.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CVD PLASMA ASSISTED LOWER DIELECTRIC CONSTANT SICOH FILM
- Publication number 20030003768
- Publication date Jan 2, 2003
- APPLIED MATERIALS, INC.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for depositing and developing a plasma polymerized organosi...
- Publication number 20010012592
- Publication date Aug 9, 2001
- APPLIED MATERIALS, INC.
- Olivier Joubert
- H01 - BASIC ELECTRIC ELEMENTS

Dian Sugiarto

Person

Patents Grantslast 30 patents

Low dielectric (low k) barrier films with oxygen doping by plasma-e...

Low dielectric (low k) barrier films with oxygen doping by plasma-e...

Adhesion improvement for low k dielectrics

Low dielectric (low k) barrier films with oxygen doping by plasma-e...

CVD plasma assisted lower dielectric constant SICOH film

Method of depositing dielectric films

Adhesion improvement for low k dielectrics

Method and apparatus for deposition of low dielectric constant mate...

Method of depositing dielectric films

CVD plasma assisted lower dielectric constant SICOH film

Methods of reducing plasma-induced damage for advanced plasma CVD d...

Method for producing semiconductor including forming a layer contai...

Damascene structure fabricated using a layer of silicon-based photo...

Method of depositing dielectric films

Method of depositing low dielectric constant carbon doped silicon o...

Process for depositing and developing a plasma polymerized organosi...

Damascene structure fabricated using a layer of silicon-based photo...

CVD plasma assisted lower dielectric constant sicoh film

Apparatus for depositing high deposition rate halogen-doped silicon...

Method for using bypass lines to stabilize gas flow and maintain pl...

Process for depositing a plasma polymerized organosilicon photoresi...

Damascene structure fabricated using a layer of silicon-based photo...

Method and apparatus for depositing deep UV photoresist films

Process for depositing high deposition rate halogen-doped silicon o...

Method and apparatus for depositing deep UV photoresist films

Patents Applicationslast 30 patents

LOW DIELECTRIC (LOW K) BARRIER FILMS WITH OXYGEN DOPING BY PLASMA-E...

NEW LOW DIELECTRIC (LOW K) BARRIER FILMS WITH OXYGEN DOPING BY PLAS...

Adhesion improvement for low k dielectrics

Method and apparatus for deposition of low dielectric constant mate...

Method of depositing dielectric films

Adhesion improvement for low k dielectrics

CVD plasma assisted lower dielectric constant sicoh film

Low dielectric (low k) barrier films with oxygen doping by plasma-e...

Methods of reducing plasma-induced damage for advanced plasma CVD d...

Method of depositing dielectric films

Reacting an organosilicon compound with an oxidizing gas to form an...

Method and apparatus for deposition of low dielectric constant mate...

Low dielectric (low k) barrier films with oxygen doping by plasma-e...

CVD plasma assisted lower dielectric constant sicoh film

Damascene structure fabricated using a layer of silicon-based photo...

Method of depositing low dielectric constant carbon doped silicon o...

CVD PLASMA ASSISTED LOWER DIELECTRIC CONSTANT SICOH FILM

Process for depositing and developing a plasma polymerized organosi...