Diana Ma

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Non-permeable substrate carrier for electroplating
- Patent number 11,280,019
- Issue date Mar 22, 2022
- SunPower Corporation
- Emmanuel Chua Abas
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Maintainable substrate carrier for electroplating
- Patent number RE46088
- Issue date Aug 2, 2016
- SunPower Corporation
- Chen-An Chen
- 001 -
Information Patent Grant
Non-permeable substrate carrier for electroplating
- Patent number 9,222,193
- Issue date Dec 29, 2015
- SunPower Corporation
- Emmanuel Chua Abas
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Non-permeable substrate carrier for electroplating
- Patent number 8,317,987
- Issue date Nov 27, 2012
- SunPower Corporation
- Emmanuel Chua Abas
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Maintainable substrate carrier for electroplating
- Patent number 8,221,601
- Issue date Jul 17, 2012
- SunPower Corporation
- Chen-An Chen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System level in-situ integrated dielectric etch process particularl...
- Patent number 6,949,203
- Issue date Sep 27, 2005
- Applied Materials, Inc.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Monitoring dimensions of features at different locations in the pro...
- Patent number 6,829,056
- Issue date Dec 7, 2004
- Michael Barnes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing using a member comprising an oxide of a group...
- Patent number 6,641,697
- Issue date Nov 4, 2003
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing topography dependent charging effects in a plas...
- Patent number 6,635,577
- Issue date Oct 21, 2003
- Applied Materials, Inc.
- John M. Yamartino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for asymmetric gas distribution in a semicondu...
- Patent number 6,620,289
- Issue date Sep 16, 2003
- Applied Materials, Inc.
- Chun Yan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Corrosion-resistant protective coating for an apparatus and method...
- Patent number 6,592,707
- Issue date Jul 15, 2003
- Applied Materials Inc.
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for enhancing plasma processing performance
- Patent number 6,569,775
- Issue date May 27, 2003
- Applied Materials, Inc.
- Peter K. Loewenhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching low k dielectrics
- Patent number 6,547,977
- Issue date Apr 15, 2003
- Applied Materials Inc.
- Chun Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of heating a semiconductor substrate
- Patent number 6,547,978
- Issue date Apr 15, 2003
- Applied Materials Inc.
- Yan Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control of patterned etching in semiconductor features
- Patent number 6,534,416
- Issue date Mar 18, 2003
- Applied Materials Inc.
- Yan Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etched patterned copper features free from etch process residue
- Patent number 6,488,862
- Issue date Dec 3, 2002
- Applied Materials Inc.
- Yan Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper etch using HCl and HBR chemistry
- Patent number 6,489,247
- Issue date Dec 3, 2002
- Applied Materials, Inc.
- Yan Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF plasma reactor with hybrid conductor and multi-radius dome ceiling
- Patent number 6,475,335
- Issue date Nov 5, 2002
- Applied Materials, Inc.
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring the quality of a protective coating in a reac...
- Patent number 6,466,881
- Issue date Oct 15, 2002
- Applied Materials Inc.
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching dielectric layers using a removable hardmask
- Patent number 6,458,516
- Issue date Oct 1, 2002
- Applied Materials Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for recovering metal from etch by-products
- Patent number 6,413,389
- Issue date Jul 2, 2002
- Applied Materials, Inc.
- Hong Shih
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Method and apparatus for forming metal interconnects
- Patent number 6,372,633
- Issue date Apr 16, 2002
- Applied Materials, Inc.
- Dan Maydan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma assisted processing chamber with separate control of species...
- Patent number 6,352,049
- Issue date Mar 5, 2002
- Applied Materials, Inc.
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic composition for an apparatus and method for processing a su...
- Patent number 6,352,611
- Issue date Mar 5, 2002
- Applied Materials, Inc.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of pattern etching a low K dielectric layer
- Patent number 6,331,380
- Issue date Dec 18, 2001
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for etching organic anti-reflective coating from...
- Patent number 6,296,780
- Issue date Oct 2, 2001
- Applied Materials Inc.
- Chun Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF plasma reactor with hybrid conductor and multi-radius dome ceiling
- Patent number 6,270,617
- Issue date Aug 7, 2001
- Applied Materials, Inc.
- Gerald Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF plasma method
- Patent number 6,270,687
- Issue date Aug 7, 2001
- Applied Materials, Inc.
- Yan Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF plasma reactor with hybrid conductor and multi-radius dome ceiling
- Patent number 6,248,250
- Issue date Jun 19, 2001
- Applied Materials Inc.
- Hiroji Hanawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a helicon wave high density plasma source
- Patent number 6,189,484
- Issue date Feb 20, 2001
- Applied Materials Inc.
- Gerald Zheyao Yin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NON-PERMEABLE SUBSTRATE CARRIER FOR ELECTROPLATING
- Publication number 20190301046
- Publication date Oct 3, 2019
- SunPower Corporation
- Emmanuel Chua ABAS
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
NON-PERMEABLE SUBSTRATE CARRIER FOR ELECTROPLATING
- Publication number 20160108541
- Publication date Apr 21, 2016
- SunPower Corporation
- Emmanuel Chua ABAS
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
NON-PERMEABLE SUBSTRATE CARRIER FOR ELECTROPLATING
- Publication number 20140034488
- Publication date Feb 6, 2014
- SunPower Corporation
- Emmanuel Chua ABAS
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Non-Permeable Substrate Carrier For Electroplating
- Publication number 20120073974
- Publication date Mar 29, 2012
- Emmanuel Chua ABAS
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Maintainable substrate carrier for electroplating
- Publication number 20120073976
- Publication date Mar 29, 2012
- Chen-An CHEN
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
ETCH SYSTEM
- Publication number 20090139657
- Publication date Jun 4, 2009
- Applied Materials, Inc.
- CHANGHUN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF TRIMMING AMORPHOUS CARBON FILM FOR FORMING ULTRA THIN ST...
- Publication number 20090004875
- Publication date Jan 1, 2009
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATIVE INTEGRATION SCHEME FOR CMOS S/D SiGe PROCESS
- Publication number 20070287244
- Publication date Dec 13, 2007
- APPLIED MATERIALS, INC., A Delaware corporation
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CMOS S/D SiGe DEVICE MADE WITH ALTERNATIVE INTEGRATION PROCESS
- Publication number 20070284668
- Publication date Dec 13, 2007
- APPLIED MATERIALS, INC., A Delaware corporation
- Meihua Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma chamber having multiple RF source frequencies
- Publication number 20050106873
- Publication date May 19, 2005
- Daniel J. Hoffman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System level in-situ integrated dielectric etch process particularl...
- Publication number 20030164354
- Publication date Sep 4, 2003
- Applied Materials, Inc.
- Chang-Lin Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated system for oxide etching and metal liner deposition
- Publication number 20030027427
- Publication date Feb 6, 2003
- APPLIED MATERIALS, INC.
- Diana Xiaobing Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing using a member comprising an oxide of a group...
- Publication number 20020100554
- Publication date Aug 1, 2002
- APPLIED MATERIALS, INC.
- Nianci Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Corrosion-resistant protective coating for an apparatus and method...
- Publication number 20020066532
- Publication date Jun 6, 2002
- Hong Shih
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for forming metal interconnects
- Publication number 20020058408
- Publication date May 16, 2002
- APPLIED MATERIALS, INC.
- Dan Maydan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of heating a semiconductor substrate
- Publication number 20020045354
- Publication date Apr 18, 2002
- Yan Ye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Non-permeable substrate carrier for electroplating

Maintainable substrate carrier for electroplating

Non-permeable substrate carrier for electroplating

Non-permeable substrate carrier for electroplating

Maintainable substrate carrier for electroplating

System level in-situ integrated dielectric etch process particularl...

Monitoring dimensions of features at different locations in the pro...

Substrate processing using a member comprising an oxide of a group...

Method for reducing topography dependent charging effects in a plas...

Method and apparatus for asymmetric gas distribution in a semicondu...

Corrosion-resistant protective coating for an apparatus and method...

Method for enhancing plasma processing performance

Method for etching low k dielectrics

Method of heating a semiconductor substrate

Control of patterned etching in semiconductor features

Etched patterned copper features free from etch process residue

Copper etch using HCl and HBR chemistry

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

Method for monitoring the quality of a protective coating in a reac...

Method of etching dielectric layers using a removable hardmask

Method for recovering metal from etch by-products

Method and apparatus for forming metal interconnects

Plasma assisted processing chamber with separate control of species...

Ceramic composition for an apparatus and method for processing a su...

Method of pattern etching a low K dielectric layer

System and method for etching organic anti-reflective coating from...

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

RF plasma method

RF plasma reactor with hybrid conductor and multi-radius dome ceiling

Plasma reactor having a helicon wave high density plasma source

Patents Applicationslast 30 patents

NON-PERMEABLE SUBSTRATE CARRIER FOR ELECTROPLATING

NON-PERMEABLE SUBSTRATE CARRIER FOR ELECTROPLATING

NON-PERMEABLE SUBSTRATE CARRIER FOR ELECTROPLATING

Non-Permeable Substrate Carrier For Electroplating

Maintainable substrate carrier for electroplating

ETCH SYSTEM

METHODS OF TRIMMING AMORPHOUS CARBON FILM FOR FORMING ULTRA THIN ST...

ALTERNATIVE INTEGRATION SCHEME FOR CMOS S/D SiGe PROCESS

CMOS S/D SiGe DEVICE MADE WITH ALTERNATIVE INTEGRATION PROCESS

Plasma chamber having multiple RF source frequencies

System level in-situ integrated dielectric etch process particularl...

Integrated system for oxide etching and metal liner deposition

Substrate processing using a member comprising an oxide of a group...

Corrosion-resistant protective coating for an apparatus and method...

Method and apparatus for forming metal interconnects

Method of heating a semiconductor substrate