Dinesh Saigal

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
PVD buffer layers for LED fabrication
- Patent number 9,396,933
- Issue date Jul 19, 2016
- Applied Materials, Inc.
- Mingwei Zhu
- C30 - CRYSTAL GROWTH
Information Patent Grant
Method for high temperature metal deposition for reducing lateral s...
- Patent number 6,579,783
- Issue date Jun 17, 2003
- Applied Materials, Inc.
- Dinesh Saigal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Physical vapor deposition apparatus with deposition and DC target p...
- Patent number 6,454,919
- Issue date Sep 24, 2002
- Applied Materials, Inc.
- Arvind Sundarrajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming solder bumps on a semiconductor wafer
- Patent number 6,426,282
- Issue date Jul 30, 2002
- Applied Materials, Inc.
- Dinesh Saigal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improved chamber bake-out and cool-down
- Patent number 6,375,743
- Issue date Apr 23, 2002
- Applied Materials, Inc.
- Arvind Sundarrajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for improved chamber bake-out and cool-down
- Patent number 6,193,811
- Issue date Feb 27, 2001
- Applied Materials, Inc.
- Arvind Sundarrajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a multilayered aluminum-comprising structure on...
- Patent number 6,177,350
- Issue date Jan 23, 2001
- Applied Materials, Inc.
- Arvind Sundarrajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PVD BUFFER LAYERS FOR LED FABRICATION
- Publication number 20160293798
- Publication date Oct 6, 2016
- Mingwei Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PVD BUFFER LAYERS FOR LED FABRICATION
- Publication number 20130285065
- Publication date Oct 31, 2013
- Mingwei Zhu
- C30 - CRYSTAL GROWTH
Information Patent Application
Pulsed magnetron for sputter deposition
- Publication number 20050247554
- Publication date Nov 10, 2005
- APPLIED MATERIALS, INC.
- Dinesh Saigal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Pulsed magnetron for sputter deposition
- Publication number 20040112735
- Publication date Jun 17, 2004
- APPLIED MATERIALS, INC.
- Dinesh Saigal
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Adjustable throw reactor
- Publication number 20030116432
- Publication date Jun 26, 2003
- APPLIED MATERIALS, INC.
- Marc O. Schweitzer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIgh temperature metal deposition for reducing lateral silicidation
- Publication number 20020019119
- Publication date Feb 14, 2002
- Dinesh Saigal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for improved chamber bake-out and cool-down
- Publication number 20010029888
- Publication date Oct 18, 2001
- Arvind Sundarrajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Dinesh Saigal

Person

Patents Grantslast 30 patents

PVD buffer layers for LED fabrication

Method for high temperature metal deposition for reducing lateral s...

Physical vapor deposition apparatus with deposition and DC target p...

Method of forming solder bumps on a semiconductor wafer

Method for improved chamber bake-out and cool-down

Method for improved chamber bake-out and cool-down

Method for forming a multilayered aluminum-comprising structure on...

Patents Applicationslast 30 patents

PVD BUFFER LAYERS FOR LED FABRICATION

PVD BUFFER LAYERS FOR LED FABRICATION

Pulsed magnetron for sputter deposition

Pulsed magnetron for sputter deposition

Adjustable throw reactor

HIgh temperature metal deposition for reducing lateral silicidation

Method for improved chamber bake-out and cool-down