Dinger Udo

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Radiation source and device for feeding back emitted radiation to a...
- Patent number 11,303,092
- Issue date Apr 12, 2022
- Carl Zeiss SMT GmbH
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element for EUV lithography and method for adapt...
- Patent number 11,199,780
- Issue date Dec 14, 2021
- Carl Zeiss SMT GmbH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography apparatus and method for operating a lithography apparatus
- Patent number 10,261,424
- Issue date Apr 16, 2019
- Carl Zeiss SMT GmbH
- Udo Dinger
- G02 - OPTICS
Information Patent Grant
Facet mirror for use in a projection exposure apparatus for microli...
- Patent number 9,996,012
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV-mirror, optical system with EUV-mirror and associated operating...
- Patent number 9,997,268
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Udo Dinger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV lithography system
- Patent number 9,448,490
- Issue date Sep 20, 2016
- Carl Zeiss SMT GmbH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam guidance system for the focusing guidance of radiation from a...
- Patent number 9,444,214
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Udo Dinger
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV-mirror arrangement, optical system with EUV-mirror arrangement...
- Patent number 9,442,383
- Issue date Sep 13, 2016
- Carl Zeiss SMT GmbH
- Udo Dinger
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Facet mirror for use in a projection exposure apparatus for microli...
- Patent number 9,411,241
- Issue date Aug 9, 2016
- Carl Zeiss SMT GmbH
- Udo Dinger
- G02 - OPTICS
Information Patent Grant
EUV collector with cooling device
- Patent number 9,007,559
- Issue date Apr 14, 2015
- Carl Zeiss SMT GmbH
- Michael Layh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate for mirrors for EUV lithography
- Patent number 8,976,927
- Issue date Mar 10, 2015
- Carl Zeiss SMT GmbH
- Claudia Ekstein
- G02 - OPTICS
Information Patent Grant
Bundle-guiding optical collector for collecting the emission of a r...
- Patent number 8,934,085
- Issue date Jan 13, 2015
- Carl Zeiss SMT GmbH
- Udo Dinger
- G02 - OPTICS
Information Patent Grant
Projection illumination system for EUV microlithography
- Patent number 8,710,471
- Issue date Apr 29, 2014
- Carl Zeiss SMT GmbH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optics for EUV microlithography and related system and...
- Patent number 8,587,767
- Issue date Nov 19, 2013
- Carl Zeiss SMT GmbH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element with multiple primary light sources
- Patent number 8,253,927
- Issue date Aug 28, 2012
- Carl Zeiss SMT GmbH
- Udo Dinger
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,977,651
- Issue date Jul 12, 2011
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Collector for an illumination system
- Patent number 7,910,900
- Issue date Mar 22, 2011
- Carl Zeiss SMT GmbH
- Ralf Stuetzle
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection system for EUV lithography
- Patent number RE42118
- Issue date Feb 8, 2011
- Carl Zeiss SMT AG
- Russell Hudyma
- 355 - Photocopying
Information Patent Grant
Reflective X-ray microscope and inspection system for examining obj...
- Patent number 7,623,620
- Issue date Nov 24, 2009
- Carl Zeiss SMT AG
- Hans-Jürgen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,592,598
- Issue date Sep 22, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection objective
- Patent number 7,557,902
- Issue date Jul 7, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mirror for use in a projection exposure apparatus
- Patent number 7,481,543
- Issue date Jan 27, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- B24 - GRINDING POLISHING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,456,408
- Issue date Nov 25, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,443,948
- Issue date Oct 28, 2008
- Carl Zeiss SMT AG
- Jörg Schultz
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection system for EUV lithography
- Patent number 7,375,798
- Issue date May 20, 2008
- Carl Zeiss SMT AG
- Russell Hudyma
- G02 - OPTICS
Information Patent Grant
Projection system for EUV lithography
- Patent number 7,355,678
- Issue date Apr 8, 2008
- Carl Zeiss SMT AG
- Russell Hudyma
- G02 - OPTICS
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,348,565
- Issue date Mar 25, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Illumination system particularly for microlithography
- Patent number 7,186,983
- Issue date Mar 6, 2007
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Projection system for EUV lithography
- Patent number 7,151,592
- Issue date Dec 19, 2006
- Carl Zeiss SMT AG
- Russell Hudyma
- G02 - OPTICS
Information Patent Grant
Method of manufacturing an optical element
- Patent number 7,118,449
- Issue date Oct 10, 2006
- Carl Zeiss SMT AG
- Udo Dinger
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
MULTI-MIRROR ARRAY
- Publication number 20240248408
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE AND DEVICE FOR FEEDING BACK EMITTED RADIATION TO A...
- Publication number 20210167569
- Publication date Jun 3, 2021
- Carl Zeiss SMT GMBH
- Udo Dinger
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY AND METHOD FOR ADAPT...
- Publication number 20200174378
- Publication date Jun 4, 2020
- Carl Zeiss SMT GMBH
- Udo DINGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD FOR OPERATING A LITHOGRAPHY APPARATUS
- Publication number 20180107122
- Publication date Apr 19, 2018
- Carl Zeiss SMT GMBH
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV-MIRROR, OPTICAL SYSTEM WITH EUV-MIRROR AND ASSOCIATED OPERATING...
- Publication number 20160379730
- Publication date Dec 29, 2016
- Carl Zeiss SMT GMBH
- Udo DINGER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLI...
- Publication number 20160313646
- Publication date Oct 27, 2016
- Carl Zeiss SMT GMBH
- Udo Dinger
- G02 - OPTICS
Information Patent Application
BEAM GUIDANCE SYSTEM FOR THE FOCUSING GUIDANCE OF RADIATION FROM A...
- Publication number 20150098072
- Publication date Apr 9, 2015
- Carl Zeiss SMT GMBH
- Udo Dinger
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT...
- Publication number 20140285783
- Publication date Sep 25, 2014
- Carl Zeiss SMT GMBH
- Udo DINGER
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV Lithography System
- Publication number 20130265560
- Publication date Oct 10, 2013
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY
- Publication number 20130170056
- Publication date Jul 4, 2013
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20130100426
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Berndt Warm
- G02 - OPTICS
Information Patent Application
EUV COLLECTOR
- Publication number 20120050703
- Publication date Mar 1, 2012
- Carl Zeiss SMT GMBH
- Michael Layh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY
- Publication number 20110235015
- Publication date Sep 29, 2011
- Carl Zeiss GmbH
- Guenther Dengel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND...
- Publication number 20110063598
- Publication date Mar 17, 2011
- Carl Zeiss SMT GMBH
- Damian Fiolka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION ILLUMINATION SYSTEM FOR EUV MICROLITHOGRAPHY
- Publication number 20110014799
- Publication date Jan 20, 2011
- Carl Zeiss SMT AG
- Udo Dinger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLI...
- Publication number 20110001947
- Publication date Jan 6, 2011
- Carl Zeiss SMT AG
- Udo Dinger
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPA...
- Publication number 20110001948
- Publication date Jan 6, 2011
- Carl Zeiss SMT AG
- Udo Dinger
- G02 - OPTICS
Information Patent Application
BUNDLE-GUIDING OPTICAL COLLECTOR FOR COLLECTING THE EMISSION OF A R...
- Publication number 20100231882
- Publication date Sep 16, 2010
- Carl Zeiss SMT AG
- Udo Dinger
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING AN OPTICAL ELEMENT THROUGH A MOLDING PROCESS,...
- Publication number 20100182710
- Publication date Jul 22, 2010
- Carl Zeiss SMT AG
- Udo DINGER
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS
- Publication number 20100007866
- Publication date Jan 14, 2010
- Carl Zeiss SMT AG
- Berndt Warm
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090316128
- Publication date Dec 24, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL ELEMENT WITH MULTIPLE PRIMARY LIGHT SOURCES
- Publication number 20090257040
- Publication date Oct 15, 2009
- Carl Zeiss SMT AG
- Udo Dinger
- G02 - OPTICS
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090073410
- Publication date Mar 19, 2009
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- B82 - NANO-TECHNOLOGY
Information Patent Application
ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY
- Publication number 20090015812
- Publication date Jan 15, 2009
- Carl Zeiss SMT AG
- Joerg Schultz
- B82 - NANO-TECHNOLOGY
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20080130076
- Publication date Jun 5, 2008
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
High-Precision Optical Surface Prepared by Sagging from a Masterpiece
- Publication number 20080099935
- Publication date May 1, 2008
- Wilhelm Egle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COLLECTOR FOR AN ILLUMINATION SYSTEM
- Publication number 20080018876
- Publication date Jan 24, 2008
- Carl Zeiss SMT AG
- Ralf Stuetzle
- G02 - OPTICS
Information Patent Application
Projection system for EUV lithograhphy
- Publication number 20070153252
- Publication date Jul 5, 2007
- Carl Zeiss SMT AG
- Russell Hudyma
- G02 - OPTICS
Information Patent Application
Illumination system particularly for microlithography
- Publication number 20070120072
- Publication date May 31, 2007
- Carl Zeiss SMT AG
- Hans-Juergen Mann
- G02 - OPTICS
Information Patent Application
Projection system for EUV lithography
- Publication number 20070070322
- Publication date Mar 29, 2007
- Carl Zeiss SMT AG
- Russell Hudyma
- G02 - OPTICS

Person

Patents Grantslast 30 patents

Radiation source and device for feeding back emitted radiation to a...

Reflective optical element for EUV lithography and method for adapt...

Lithography apparatus and method for operating a lithography apparatus

Facet mirror for use in a projection exposure apparatus for microli...

EUV-mirror, optical system with EUV-mirror and associated operating...

EUV lithography system

Beam guidance system for the focusing guidance of radiation from a...

EUV-mirror arrangement, optical system with EUV-mirror arrangement...

Facet mirror for use in a projection exposure apparatus for microli...

EUV collector with cooling device

Substrate for mirrors for EUV lithography

Bundle-guiding optical collector for collecting the emission of a r...

Projection illumination system for EUV microlithography

Illumination optics for EUV microlithography and related system and...

Optical element with multiple primary light sources

Illumination system particularly for microlithography

Collector for an illumination system

Projection system for EUV lithography

Reflective X-ray microscope and inspection system for examining obj...

Illumination system particularly for microlithography

Projection objective

Mirror for use in a projection exposure apparatus

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Projection system for EUV lithography

Projection system for EUV lithography

Illumination system particularly for microlithography

Illumination system particularly for microlithography

Projection system for EUV lithography

Method of manufacturing an optical element

Patents Applicationslast 30 patents

MULTI-MIRROR ARRAY

RADIATION SOURCE AND DEVICE FOR FEEDING BACK EMITTED RADIATION TO A...

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY AND METHOD FOR ADAPT...

LITHOGRAPHY APPARATUS AND METHOD FOR OPERATING A LITHOGRAPHY APPARATUS

EUV-MIRROR, OPTICAL SYSTEM WITH EUV-MIRROR AND ASSOCIATED OPERATING...

FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLI...

BEAM GUIDANCE SYSTEM FOR THE FOCUSING GUIDANCE OF RADIATION FROM A...

EUV-MIRROR ARRANGEMENT, OPTICAL SYSTEM WITH EUV-MIRROR ARRANGEMENT...

EUV Lithography System

SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

EUV COLLECTOR

ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY

ILLUMINATION OPTICS FOR EUV MICROLITHOGRAPHY AND RELATED SYSTEM AND...

PROJECTION ILLUMINATION SYSTEM FOR EUV MICROLITHOGRAPHY

FACET MIRROR FOR USE IN A PROJECTION EXPOSURE APPARATUS FOR MICROLI...

ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHY PROJECTION EXPOSURE APPA...

BUNDLE-GUIDING OPTICAL COLLECTOR FOR COLLECTING THE EMISSION OF A R...

METHOD FOR PRODUCING AN OPTICAL ELEMENT THROUGH A MOLDING PROCESS,...

METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

OPTICAL ELEMENT WITH MULTIPLE PRIMARY LIGHT SOURCES

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

ILLUMINATION SYSTEM PARTICULARLY FOR MICROLITHOGRAPHY

Illumination system particularly for microlithography

High-Precision Optical Surface Prepared by Sagging from a Masterpiece

COLLECTOR FOR AN ILLUMINATION SYSTEM

Projection system for EUV lithograhphy

Illumination system particularly for microlithography

Projection system for EUV lithography