Donald W. Berrian

Person

Topsfield, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Magnetic field fluctuation for beam smoothing
- Patent number 10,361,059
- Issue date Jul 23, 2019
- Advanced Ion Beam Technology, Inc.
- Xiao Bai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic field fluctuation for beam smoothing
- Patent number 9,340,870
- Issue date May 17, 2016
- Advanced Ion Beam Technology, Inc.
- Xiao Bai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implant method and implanter by using a variable aperture
- Patent number 9,057,129
- Issue date Jun 16, 2015
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion implanter and ion implant method thereof
- Patent number 8,987,691
- Issue date Mar 24, 2015
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Implant method and implanter by using a variable aperture
- Patent number 8,669,539
- Issue date Mar 11, 2014
- Advanced Ion Beam Technology, Inc.
- Zhimin Wan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for monitoring ion implantation
- Patent number 8,581,217
- Issue date Nov 12, 2013
- Advanced Ion Beam Technology, Inc.
- Don Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for uniformly implanting a wafer with an ion beam
- Patent number 8,168,962
- Issue date May 1, 2012
- Advanced Ion Beam Technology, Inc.
- Cheng-Hui Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for monitoring leakage current of a faraday cup
- Patent number 8,040,124
- Issue date Oct 18, 2011
- Advanced Ion Beam Technology, Inc.
- Don Berrian
- G01 - MEASURING TESTING
Information Patent Grant
Implant beam utilization in an ion implanter
- Patent number 7,772,571
- Issue date Aug 10, 2010
- Advanced Ion Beam Technology, Inc.
- Cheng-Hui Shen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Particulate prevention in ion implantation
- Patent number 7,547,898
- Issue date Jun 16, 2009
- Axcelis Technologies, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam profiler
- Patent number 7,381,977
- Issue date Jun 3, 2008
- Axcelis Technologies, Inc.
- John D. Pollock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reciprocating drive for scanning a workpiece
- Patent number 7,323,695
- Issue date Jan 29, 2008
- Axcelis Technologies, Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for rapidly controlling the output of an ion sour...
- Patent number 7,247,863
- Issue date Jul 24, 2007
- Axcellis Technologies, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reciprocating a workpiece through an ion beam
- Patent number 7,141,809
- Issue date Nov 28, 2006
- Axcelis Technologies, Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reciprocating drive for scanning a workpiece through an ion beam
- Patent number 7,135,691
- Issue date Nov 14, 2006
- Axcelis Technologies, Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning system
- Patent number 6,921,907
- Issue date Jul 26, 2005
- Axcelis Technologies, Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for implanting a wafer with an ion beam
- Patent number 6,833,552
- Issue date Dec 21, 2004
- Applied Materials, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate positioning system
- Patent number 6,777,687
- Issue date Aug 17, 2004
- Axcelis Technologies, Inc.
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hybrid scanning system and methods for ion implantation
- Patent number 6,765,219
- Issue date Jul 20, 2004
- Variah Semiconductor Equipment Associates, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for uniformly implanting a wafer with an ion beam
- Patent number 6,677,599
- Issue date Jan 13, 2004
- Applied Materials, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation uniformity correction using beam current control
- Patent number 6,661,016
- Issue date Dec 9, 2003
- Proteros, LLC
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High efficiency scanning in ion implanters
- Patent number 6,580,083
- Issue date Jun 17, 2003
- Varian Semiconductor Equipment Associates, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for flowing gases into a manifold at high pote...
- Patent number 5,996,528
- Issue date Dec 7, 1999
- Novellus Systems, Inc.
- Donald W. Berrian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Disposable electronic monitor device
- Patent number RE36200
- Issue date Apr 27, 1999
- Sensitech Inc.
- Donald W. Berrian
- 073 - Measuring and testing
Information Patent Grant
Methods and apparatus for measuring temperatures at high potential
- Patent number 5,806,980
- Issue date Sep 15, 1998
- Novellus Systems, Inc.
- Donald W. Berrian
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for igniting plasma in a process module
- Patent number 5,789,867
- Issue date Aug 4, 1998
- TEL America, Inc.
- Han Westendorp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for igniting plasma in a process module
- Patent number 5,565,036
- Issue date Oct 15, 1996
- TEL America, Inc.
- Han Westendorp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Disposable electronic monitor device
- Patent number 5,313,848
- Issue date May 24, 1994
- Sensitech, Inc.
- Ernest M. Santin
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for high efficiency scanning in an ion implanter
- Patent number 4,980,562
- Issue date Dec 25, 1990
- Varian Associates, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam scanning method and apparatus
- Patent number 4,922,106
- Issue date May 1, 1990
- Varian Associates, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MAGNETIC FIELD FLUCTUATION FOR BEAM SMOOTHING
- Publication number 20160225577
- Publication date Aug 4, 2016
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Xiao BAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC FIELD FLUCTUATION FOR BEAM SMOOTHING
- Publication number 20140212595
- Publication date Jul 31, 2014
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Xiao BAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE
- Publication number 20140161987
- Publication date Jun 12, 2014
- ADVANCED ION BEAM TECHNOLOGY., INC.
- ZHIMIN WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTER AND ION IMPLANT METHOD THEREOF
- Publication number 20130130484
- Publication date May 23, 2013
- ADVANCED ION BEAM TECHNOLOGY, INC.
- ZHIMIN WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MONITORING ION IMPLANTATION
- Publication number 20120085936
- Publication date Apr 12, 2012
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Don BERRIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE
- Publication number 20110233431
- Publication date Sep 29, 2011
- Zhimin WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION IMPLANTER AND ION IMPLANT METHOD THEREOF
- Publication number 20110049383
- Publication date Mar 3, 2011
- ADVANCED ION BEAM TECHNOLOGY, INC.
- ZHIMIN WAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method And Apparatus for Uniformly Implanting A Wafer With An Ion Beam
- Publication number 20110037000
- Publication date Feb 17, 2011
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Cheng-Hui SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Monitoring Leakage of a Faraday Cup
- Publication number 20100207601
- Publication date Aug 19, 2010
- Don Berrian
- G01 - MEASURING TESTING
Information Patent Application
IMPLANT BEAM UTILIZATION IN AN ION IMPLANTER
- Publication number 20090090876
- Publication date Apr 9, 2009
- ADVANCED ION BEAM TECHNOLOGY, INC.
- Cheng-Hui Shen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Ion beam profiler
- Publication number 20070069156
- Publication date Mar 29, 2007
- Axcelis Technologies, Inc.
- John D. Pollock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Particulate prevention in ion implantation
- Publication number 20060284116
- Publication date Dec 21, 2006
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for reciprocating a workpiece through an ion beam
- Publication number 20050232749
- Publication date Oct 20, 2005
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reciprocating drive for scanning a workpiece through an ion beam
- Publication number 20050230643
- Publication date Oct 20, 2005
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reciprocating drive for scanning a workpiece
- Publication number 20050232748
- Publication date Oct 20, 2005
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate positioning system
- Publication number 20040245480
- Publication date Dec 9, 2004
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for implanting a wafer with an ion beam
- Publication number 20040084636
- Publication date May 6, 2004
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for amplifying an angle of divergence of a scanne...
- Publication number 20030001110
- Publication date Jan 2, 2003
- Harald Enge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate positioning system
- Publication number 20020134950
- Publication date Sep 26, 2002
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate positioning system
- Publication number 20020125446
- Publication date Sep 12, 2002
- John W. Vanderpot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hybrid scanning system and methods for ion implantation
- Publication number 20020109106
- Publication date Aug 15, 2002
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for rapidly controlling the output of an ion sour...
- Publication number 20020053642
- Publication date May 9, 2002
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetic scanning system with a nonzero field
- Publication number 20020050569
- Publication date May 2, 2002
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High efficiency scanning in ion implanters
- Publication number 20020003215
- Publication date Jan 10, 2002
- Varian Semiconductor Equipment Associates, Inc.
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implantation uniformity correction using beam current control
- Publication number 20010054698
- Publication date Dec 27, 2001
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and method for uniformity enhancement during ion implantation
- Publication number 20010032937
- Publication date Oct 25, 2001
- Donald W. Berrian
- H01 - BASIC ELECTRIC ELEMENTS

Donald W. Berrian

Person

Patents Grantslast 30 patents

Magnetic field fluctuation for beam smoothing

Magnetic field fluctuation for beam smoothing

Implant method and implanter by using a variable aperture

Ion implanter and ion implant method thereof

Implant method and implanter by using a variable aperture

Method for monitoring ion implantation

Method and apparatus for uniformly implanting a wafer with an ion beam

Method and apparatus for monitoring leakage current of a faraday cup

Implant beam utilization in an ion implanter

Particulate prevention in ion implantation

Ion beam profiler

Reciprocating drive for scanning a workpiece

System and method for rapidly controlling the output of an ion sour...

Method for reciprocating a workpiece through an ion beam

Reciprocating drive for scanning a workpiece through an ion beam

Substrate positioning system

System and method for implanting a wafer with an ion beam

Substrate positioning system

Hybrid scanning system and methods for ion implantation

System and method for uniformly implanting a wafer with an ion beam

Ion implantation uniformity correction using beam current control

High efficiency scanning in ion implanters

Method and apparatus for flowing gases into a manifold at high pote...

Disposable electronic monitor device

Methods and apparatus for measuring temperatures at high potential

Apparatus and method for igniting plasma in a process module

Apparatus and method for igniting plasma in a process module

Disposable electronic monitor device

Method and apparatus for high efficiency scanning in an ion implanter

Ion beam scanning method and apparatus

Patents Applicationslast 30 patents

MAGNETIC FIELD FLUCTUATION FOR BEAM SMOOTHING

MAGNETIC FIELD FLUCTUATION FOR BEAM SMOOTHING

IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE

ION IMPLANTER AND ION IMPLANT METHOD THEREOF

METHOD FOR MONITORING ION IMPLANTATION

IMPLANT METHOD AND IMPLANTER BY USING A VARIABLE APERTURE

ION IMPLANTER AND ION IMPLANT METHOD THEREOF

Method And Apparatus for Uniformly Implanting A Wafer With An Ion Beam

Method and Apparatus for Monitoring Leakage of a Faraday Cup

IMPLANT BEAM UTILIZATION IN AN ION IMPLANTER

Ion beam profiler

Particulate prevention in ion implantation

Method for reciprocating a workpiece through an ion beam

Reciprocating drive for scanning a workpiece through an ion beam

Reciprocating drive for scanning a workpiece

Substrate positioning system

System and method for implanting a wafer with an ion beam

System and method for amplifying an angle of divergence of a scanne...

Substrate positioning system

Substrate positioning system

Hybrid scanning system and methods for ion implantation

System and method for rapidly controlling the output of an ion sour...

Magnetic scanning system with a nonzero field

High efficiency scanning in ion implanters

Ion implantation uniformity correction using beam current control

System and method for uniformity enhancement during ion implantation