Donald W. Sweeney

Person

Livermore, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
EUV lithography reticles fabricated without the use of a patterned...
- Patent number 7,049,033
- Issue date May 23, 2006
- The EUV LLC
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for the manufacture of phase shifting masks for EUV lithography
- Patent number 7,022,435
- Issue date Apr 4, 2006
- EUV Limited Liability Corporation
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method to repair localized amplitude defects in a EUV lithography m...
- Patent number 6,967,168
- Issue date Nov 22, 2005
- The EUV Limited Liability Corporation
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Repair of localized defects in multilayer-coated reticle blanks for...
- Patent number 6,821,682
- Issue date Nov 23, 2004
- The EUV LLC
- Daniel G. Stearns
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method for fabricating reticles for EUV lithography without the use...
- Patent number 6,635,391
- Issue date Oct 21, 2003
- The Regents of the University of California
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for mask repair using defect compensation
- Patent number 6,235,434
- Issue date May 22, 2001
- EUV LLC
- Donald W. Sweeney
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Extreme-UV lithography condenser
- Patent number 6,210,865
- Issue date Apr 3, 2001
- EUV LLC
- William C. Sweatt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography machine
- Patent number 6,031,598
- Issue date Feb 29, 2000
- EUV LLC
- Daniel A. Tichenor
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Deformable mirror for short wavelength applications
- Patent number 5,986,795
- Issue date Nov 16, 1999
- Henry N. Chapman
- G02 - OPTICS
Information Patent Grant
Reflective optical imaging system with balanced distortion
- Patent number 5,973,826
- Issue date Oct 26, 1999
- Regents of the University of California
- Henry N. Chapman
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
Method for repairing mask-blank defects using repair-zone compensation
- Publication number 20060234135
- Publication date Oct 19, 2006
- The Regents of the University of CA
- Stefan P. Hau-Riege
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV lithography reticles fabricated without the use of a patterned...
- Publication number 20040142250
- Publication date Jul 22, 2004
- The Regents of the University of California.
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for the manufacture of phase shifting masks for EUV lithography
- Publication number 20040062999
- Publication date Apr 1, 2004
- The Regents of the University of California.
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method to repair localized amplitude defects in a EUV lithography m...
- Publication number 20030006214
- Publication date Jan 9, 2003
- The Regents of the University of California.
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for fabricating reticles for EUV lithography without the use...
- Publication number 20020122989
- Publication date Sep 5, 2002
- Daniel G. Stearns
- B82 - NANO-TECHNOLOGY
Information Patent Application
Composite holographic multifocal lens
- Publication number 20010050751
- Publication date Dec 13, 2001
- William Charles Banyai
- G02 - OPTICS

Donald W. Sweeney

Person

Patents Grantslast 30 patents

EUV lithography reticles fabricated without the use of a patterned...

Method for the manufacture of phase shifting masks for EUV lithography

Method to repair localized amplitude defects in a EUV lithography m...

Repair of localized defects in multilayer-coated reticle blanks for...

Method for fabricating reticles for EUV lithography without the use...

Method for mask repair using defect compensation

Extreme-UV lithography condenser

Extreme ultraviolet lithography machine

Deformable mirror for short wavelength applications

Reflective optical imaging system with balanced distortion

Patents Applicationslast 30 patents

Method for repairing mask-blank defects using repair-zone compensation

EUV lithography reticles fabricated without the use of a patterned...

Method for the manufacture of phase shifting masks for EUV lithography

Method to repair localized amplitude defects in a EUV lithography m...

Method for fabricating reticles for EUV lithography without the use...

Composite holographic multifocal lens