Dorel Ioan Toma

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Multi-step system and method for curing a dielectric film
- Patent number 10,068,765
- Issue date Sep 4, 2018
- Tokyo Electron Limited
- Junjun Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Multi-step system and method for curing a dielectric film
- Patent number 9,443,725
- Issue date Sep 13, 2016
- Tokyo Electron Limited
- Junjun Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Multi-step system and method for curing a dielectric film
- Patent number 9,184,047
- Issue date Nov 10, 2015
- Tokyo Electron Limited
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for integrating low-k dielectrics
- Patent number 9,017,933
- Issue date Apr 28, 2015
- Tokyo Electron Limited
- Junjun Liu
- B08 - CLEANING
Information Patent Grant
Thermal processing system for curing dielectric films
- Patent number 8,956,457
- Issue date Feb 17, 2015
- Tokyo Electron Limited
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric treatment module using scanning IR radiation source
- Patent number 8,895,942
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Junjun Liu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-step system and method for curing a dielectric film
- Patent number 8,642,488
- Issue date Feb 4, 2014
- Tokyo Electron Limited
- Junjun Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Electrochemical substrate slicing using electromagnetic wave excita...
- Patent number 8,444,848
- Issue date May 21, 2013
- Tokyo Electron Limited
- Hongyu H. Yue
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Ultraviolet treatment apparatus
- Patent number 8,242,460
- Issue date Aug 14, 2012
- Tokyo Electron Limited
- Hongyu Yue
- B08 - CLEANING
Information Patent Grant
Treatment of low dielectric constant films using a batch processing...
- Patent number 8,039,049
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for removing a pore-generating material from an uncured low-...
- Patent number 7,977,256
- Issue date Jul 12, 2011
- Tokyo Electron Limited
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma-assisted vapor phase treatment of low dielectric constant fi...
- Patent number 7,901,743
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for curing a porous low dielectric constant dielectric film
- Patent number 7,858,533
- Issue date Dec 28, 2010
- Tokyo Electron Limited
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of integrating an air gap structure with a substrate
- Patent number 7,855,123
- Issue date Dec 21, 2010
- Tokyo Electron Limited
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for air gap formation using UV-decomposable materials
- Patent number 7,829,268
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Junjun Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for characterizing porous materials
- Patent number 7,807,213
- Issue date Oct 5, 2010
- Tokyo Electron Limited
- Jianhong Zhu
- G01 - MEASURING TESTING
Information Patent Grant
Method and system for forming an air gap structure
- Patent number 7,666,754
- Issue date Feb 23, 2010
- Tokyo Electron Limited
- Dorel I. Toma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step system and method for curing a dielectric film
- Patent number 7,622,378
- Issue date Nov 24, 2009
- Tokyo Electron Limited
- Junjun Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method for treating a dielectric film
- Patent number 7,553,769
- Issue date Jun 30, 2009
- Tokyo Electron Limited
- Dorel Ioan Toma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plural treatment step process for treating dielectric films
- Patent number 7,405,168
- Issue date Jul 29, 2008
- Tokyo Electron Limited
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for treating a dielectric film
- Patent number 7,345,000
- Issue date Mar 18, 2008
- Tokyo Electron Limited
- Robert Kevwitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of passivating of low dielectric materials in wafer processing
- Patent number 7,270,941
- Issue date Sep 18, 2007
- Tokyo Electron Limited
- Dorel Ioan Toma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for characterizing porous materials
- Patent number 7,238,382
- Issue date Jul 3, 2007
- Tokyo Electron Limited
- Jianhong Zhu
- G01 - MEASURING TESTING
Information Patent Grant
Structure comprising tunable anti-reflective coating and method of...
- Patent number 7,199,046
- Issue date Apr 3, 2007
- Tokyo Electron Ltd.
- Jeffrey T. Wetzel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure comprising amorphous carbon film and method of forming th...
- Patent number 7,115,993
- Issue date Oct 3, 2006
- Tokyo Electron Limited
- Jeffrey T. Wetzel
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM
- Publication number 20160314966
- Publication date Oct 27, 2016
- TOKYO ELECTRON LIMITED
- Junjun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM
- Publication number 20140109432
- Publication date Apr 24, 2014
- TOKYO ELECTRON LIMITED
- Junjun Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ANNEALING METHOD AND ANNEALING APPARATUS
- Publication number 20120225568
- Publication date Sep 6, 2012
- TOKYO ELECTRON LIMITED
- Yusaku IZAWA
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Ultraviolet treatment apparatus
- Publication number 20110233430
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Hongyu YUE
- B08 - CLEANING
Information Patent Application
Method for cleaning low-k dielectrics
- Publication number 20110232677
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Junjun LIU
- B08 - CLEANING
Information Patent Application
Method for integrating low-k dielectrics
- Publication number 20110237080
- Publication date Sep 29, 2011
- TOKYO ELECTRON LIMITED
- Junjun LIU
- B08 - CLEANING
Information Patent Application
Electrochemical substrate slicing using electromagnetic wave excita...
- Publication number 20110186443
- Publication date Aug 4, 2011
- TOKYO ELECTRON LIMITED
- Hongyu H. YUE
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Method of integrating an air gap structure with a substrate
- Publication number 20100248443
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC TREATMENT PLATFORM FOR DIELECTRIC FILM DEPOSITION AND CU...
- Publication number 20100068897
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC MATERIAL TREATMENT SYSTEM AND METHOD OF OPERATING
- Publication number 20100065758
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIELECTRIC TREATMENT MODULE USING SCANNING IR RADIATION SOURCE
- Publication number 20100065759
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Junjun Liu
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
IR LASER OPTICS SYSTEM FOR DIELECTRIC TREATMENT MODULE
- Publication number 20100067886
- Publication date Mar 18, 2010
- TOKYO ELECTRON LIMITED
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM
- Publication number 20100041248
- Publication date Feb 18, 2010
- TOKYO ELECTRON LIMITED
- Junjun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING A PORE-GENERATING MATERIAL FROM AN UNCURED LOW-...
- Publication number 20090227118
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING A DIELECTRIC FILM WITH INFRARED RADIATION
- Publication number 20090226695
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Junjun Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
POROUS SiCOH-CONTAINING DIELECTRIC FILM AND A METHOD OF PREPARING
- Publication number 20090226694
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CURING A POROUS LOW DIELECTRIC CONSTANT DIELECTRIC FILM
- Publication number 20090227119
- Publication date Sep 10, 2009
- TOKYO ELECTRON LIMITED
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for forming an air gap structure
- Publication number 20090130863
- Publication date May 21, 2009
- TOKYO ELECTRON LIMITED
- Dorel I. TOMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for air gap formation using UV-decomposable materials
- Publication number 20090104571
- Publication date Apr 23, 2009
- TOKYO ELECTRON LIMITED
- Junjun LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for curing a dielectric film
- Publication number 20090075491
- Publication date Mar 19, 2009
- TOKYO ELECTRON LIMITED
- Junjun LIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM
- Publication number 20080076262
- Publication date Mar 27, 2008
- TOKYO ELECTRON LIMITED
- Robert Kevwitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR CHARACTERIZING POROUS MATERIALS
- Publication number 20070190232
- Publication date Aug 16, 2007
- TOKYO ELECTRON LIMITED
- Jianhong Zhu
- G01 - MEASURING TESTING
Information Patent Application
Multi-step system and method for curing a dielectric film
- Publication number 20070105401
- Publication date May 10, 2007
- TOKYO ELECTRON LIMITED
- Junjun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plural treatment step process for treating dielectric films
- Publication number 20070077781
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMTED
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma-assisted vapor phase treatment of low dielectric constant fi...
- Publication number 20070077353
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMITED
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Treatment of low dielectric constant films using a batch processing...
- Publication number 20070077782
- Publication date Apr 5, 2007
- TOKYO ELECTRON LIMITED
- Eric M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for characterizing porous materials
- Publication number 20060024849
- Publication date Feb 2, 2006
- TOKYO ELECTRON LIMITED
- Jianhong Zhu
- G01 - MEASURING TESTING
Information Patent Application
Structure comprising tunable anti-reflective coating and method of...
- Publication number 20050230677
- Publication date Oct 20, 2005
- TOKYO ELECTRON LIMITED
- Jeffrey T. Wetzel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for treating a dielectric film
- Publication number 20050215072
- Publication date Sep 29, 2005
- TOKYO ELECTRON LIMITED
- Robert Kevwitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Structure comprising amorphous carbon film and method of forming th...
- Publication number 20050167839
- Publication date Aug 4, 2005
- TOKYO ELECTRON LIMITED
- Jeffrey T. Wetzel
- H01 - BASIC ELECTRIC ELEMENTS

Dorel Ioan Toma

Person

Patents Grantslast 30 patents

Multi-step system and method for curing a dielectric film

Multi-step system and method for curing a dielectric film

Multi-step system and method for curing a dielectric film

Method for integrating low-k dielectrics

Thermal processing system for curing dielectric films

Dielectric treatment module using scanning IR radiation source

Multi-step system and method for curing a dielectric film

Electrochemical substrate slicing using electromagnetic wave excita...

Ultraviolet treatment apparatus

Treatment of low dielectric constant films using a batch processing...

Method for removing a pore-generating material from an uncured low-...

Plasma-assisted vapor phase treatment of low dielectric constant fi...

Method for curing a porous low dielectric constant dielectric film

Method of integrating an air gap structure with a substrate

Method for air gap formation using UV-decomposable materials

Method and system for characterizing porous materials

Method and system for forming an air gap structure

Multi-step system and method for curing a dielectric film

Method for treating a dielectric film

Plural treatment step process for treating dielectric films

Method and system for treating a dielectric film

Method of passivating of low dielectric materials in wafer processing

Method and system for characterizing porous materials

Structure comprising tunable anti-reflective coating and method of...

Structure comprising amorphous carbon film and method of forming th...

Patents Applicationslast 30 patents

MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM

MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM

ANNEALING METHOD AND ANNEALING APPARATUS

Ultraviolet treatment apparatus

Method for cleaning low-k dielectrics

Method for integrating low-k dielectrics

Electrochemical substrate slicing using electromagnetic wave excita...

Method of integrating an air gap structure with a substrate

DIELECTRIC TREATMENT PLATFORM FOR DIELECTRIC FILM DEPOSITION AND CU...

DIELECTRIC MATERIAL TREATMENT SYSTEM AND METHOD OF OPERATING

DIELECTRIC TREATMENT MODULE USING SCANNING IR RADIATION SOURCE

IR LASER OPTICS SYSTEM FOR DIELECTRIC TREATMENT MODULE

MULTI-STEP SYSTEM AND METHOD FOR CURING A DIELECTRIC FILM

METHOD FOR REMOVING A PORE-GENERATING MATERIAL FROM AN UNCURED LOW-...

METHOD FOR TREATING A DIELECTRIC FILM WITH INFRARED RADIATION

POROUS SiCOH-CONTAINING DIELECTRIC FILM AND A METHOD OF PREPARING

METHOD FOR CURING A POROUS LOW DIELECTRIC CONSTANT DIELECTRIC FILM

Method and system for forming an air gap structure

Method for air gap formation using UV-decomposable materials

Method for curing a dielectric film

METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM

METHOD AND SYSTEM FOR CHARACTERIZING POROUS MATERIALS

Multi-step system and method for curing a dielectric film

Plural treatment step process for treating dielectric films

Plasma-assisted vapor phase treatment of low dielectric constant fi...

Treatment of low dielectric constant films using a batch processing...

Method and system for characterizing porous materials

Structure comprising tunable anti-reflective coating and method of...

Method and system for treating a dielectric film

Structure comprising amorphous carbon film and method of forming th...