Doug-yong Sung

Person

Seoul, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma etching apparatus and method for operating the same
- Patent number 12,046,451
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Nam Kyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled plasma processing apparatus
- Patent number 11,735,396
- Issue date Aug 22, 2023
- Samsung Electronics Co., Ltd.
- Seung Bo Shim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing equipment
- Patent number 11,501,953
- Issue date Nov 15, 2022
- Samsung Electronics Co., Ltd.
- Seung Bo Shim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for monitoring process chamber
- Patent number 10,971,343
- Issue date Apr 6, 2021
- Samsung Electronics Co., Ltd.
- Protopopov Vladimir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing device and method of operating the same
- Patent number 10,964,511
- Issue date Mar 30, 2021
- Samsung Electronics Co., Ltd.
- Seung Bo Shim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,903,053
- Issue date Jan 26, 2021
- Samsung Electronics Co., Ltd.
- Hak Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck and plasma apparatus for processing substrates...
- Patent number 10,629,467
- Issue date Apr 21, 2020
- Samsung Electronics Co., Ltd.
- Ohyung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave probe, plasma monitoring system including the microwave p...
- Patent number 10,566,176
- Issue date Feb 18, 2020
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor substrate measuring apparatus and plasma treatment ap...
- Patent number 10,481,005
- Issue date Nov 19, 2019
- Samsung Electronics Co., Ltd.
- Se Jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,395,900
- Issue date Aug 27, 2019
- Samsung Electronics Co., Ltd.
- Hak Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device
- Patent number 10,276,349
- Issue date Apr 30, 2019
- Samsung Electronics Co., Ltd.
- Hak-Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for monitoring process chamber
- Patent number 10,229,818
- Issue date Mar 12, 2019
- Samsung Electronics Co., Ltd.
- Protopopov Vladimir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave probe, plasma monitoring system including the microwave p...
- Patent number 9,601,397
- Issue date Mar 21, 2017
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagnosis system for pulsed plasma
- Patent number 9,564,295
- Issue date Feb 7, 2017
- Samsung Electronics Co., Ltd.
- Dong-soo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse plasma apparatus and drive method thereof
- Patent number 9,378,931
- Issue date Jun 28, 2016
- Samsung Electronics Co., Ltd.
- Ohyung Kwon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Etching apparatus and method for semiconductor device
- Patent number 8,062,538
- Issue date Nov 22, 2011
- Samsung Electronics Co., Ltd.
- Doug Yong Sung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA ETCHING APPARATUS AND METHOD FOR OPERATING THE SAME
- Publication number 20230120474
- Publication date Apr 20, 2023
- Samsung Electronics Co., Ltd.
- Nam Kyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING EQUIPMENT
- Publication number 20230044703
- Publication date Feb 9, 2023
- Samsung Electronics Co., Ltd.
- SEUNG BO SHIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS
- Publication number 20220005671
- Publication date Jan 6, 2022
- Pusan National University Industry-University Coop
- SEUNG BO SHIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20190378693
- Publication date Dec 12, 2019
- Samsung Electronics Co., Ltd.
- Hak Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS AND PLASMA TREATMENT AP...
- Publication number 20190323893
- Publication date Oct 24, 2019
- Samsung Electronics Co., Ltd.
- SE JIN OH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING EQUIPMENT
- Publication number 20190304754
- Publication date Oct 3, 2019
- Samsung Electronics Co., Ltd.
- SEUNG BO SHIM
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
APPARATUS FOR MONITORING PROCESS CHAMBER
- Publication number 20190164731
- Publication date May 30, 2019
- Samsung Electronics Co., Ltd.
- Protopopov VLADIMIR
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Methods for Fabricating Semiconductor Devices Using a Fringe Signal
- Publication number 20190043768
- Publication date Feb 7, 2019
- Samsung Electronics Co., Ltd.
- Se Jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD OF OPERATING THE SAME
- Publication number 20190006150
- Publication date Jan 3, 2019
- Samsung Electronics Co., Ltd.
- Seung Bo SHIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20170365444
- Publication date Dec 21, 2017
- Samsung Electronics Co., Ltd.
- Hak Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND PLASMA APPARATUS FOR PROCESSING SUBSTRATES...
- Publication number 20170358475
- Publication date Dec 14, 2017
- Samsung Electronics Co., Ltd.
- Ohyung KWON
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
APPARATUS FOR MONITORING PROCESS CHAMBER
- Publication number 20170213710
- Publication date Jul 27, 2017
- Samsung Electronics Co., Ltd.
- Protopopov VLADIMIR
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...
- Publication number 20170148613
- Publication date May 25, 2017
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- G01 - MEASURING TESTING
Information Patent Application
MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...
- Publication number 20170069553
- Publication date Mar 9, 2017
- Samsung Electronics Co., Ltd.
- Se-jin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSIS SYSTEM FOR PULSED PLASMA
- Publication number 20160126068
- Publication date May 5, 2016
- Samsung Electronics Co., Ltd.
- Dong-soo LEE
- G01 - MEASURING TESTING
Information Patent Application
PULSE PLASMA APPARATUS AND DRIVE METHOD THEREOF
- Publication number 20160126069
- Publication date May 5, 2016
- Samsung Electronics Co., Ltd.
- Ohyung KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Device
- Publication number 20160104604
- Publication date Apr 14, 2016
- Samsung Electronics Co., Ltd.
- Hak-Young Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING APPARATUS
- Publication number 20150206716
- Publication date Jul 23, 2015
- Samsung Electronics Co., Ltd.
- HYUNGJOON KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma generating device
- Publication number 20100083902
- Publication date Apr 8, 2010
- SAMSUNG ELECTRONICS CO., LTD.
- Su Hong Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and method thereof
- Publication number 20100048003
- Publication date Feb 25, 2010
- SAMSUNG ELECTRONICS CO., LTD.
- Doug Yong Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition Apparatus and Deposition Method Using the Same
- Publication number 20100009097
- Publication date Jan 14, 2010
- Doug-Yong Sung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus for HDP-CVD and method of forming insulating layer using...
- Publication number 20090064932
- Publication date Mar 12, 2009
- Samsung Electronics Co., Ltd.
- Ki Hyun Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma etching apparatus and chamber cleaning method using the same
- Publication number 20080314408
- Publication date Dec 25, 2008
- Samsung Electronics Co., Ltd.
- Sang Min Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method
- Publication number 20080317965
- Publication date Dec 25, 2008
- Samsung Electronics Co., Ltd.
- Gil Su Son
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and method thereof
- Publication number 20080314318
- Publication date Dec 25, 2008
- Samsung Electronics Co., Ltd.
- Kyung Hyun Han
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA ETCHING METHOD AND APPARATUS
- Publication number 20080119049
- Publication date May 22, 2008
- Samsung Electronics Co., Ltd.
- Doug Yong SUNG
- H01 - BASIC ELECTRIC ELEMENTS

Doug-yong Sung

Person

Patents Grantslast 30 patents

Plasma etching apparatus and method for operating the same

Inductively coupled plasma processing apparatus

Plasma processing equipment

Apparatus for monitoring process chamber

Semiconductor manufacturing device and method of operating the same

Plasma processing apparatus

Electrostatic chuck and plasma apparatus for processing substrates...

Microwave probe, plasma monitoring system including the microwave p...

Semiconductor substrate measuring apparatus and plasma treatment ap...

Plasma processing apparatus

Plasma processing device

Apparatus for monitoring process chamber

Microwave probe, plasma monitoring system including the microwave p...

Diagnosis system for pulsed plasma

Pulse plasma apparatus and drive method thereof

Etching apparatus and method for semiconductor device

Patents Applicationslast 30 patents

PLASMA ETCHING APPARATUS AND METHOD FOR OPERATING THE SAME

PLASMA PROCESSING EQUIPMENT

INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SEMICONDUCTOR SUBSTRATE MEASURING APPARATUS AND PLASMA TREATMENT AP...

PLASMA PROCESSING EQUIPMENT

APPARATUS FOR MONITORING PROCESS CHAMBER

Methods for Fabricating Semiconductor Devices Using a Fringe Signal

SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD OF OPERATING THE SAME

Plasma Processing Apparatus

ELECTROSTATIC CHUCK AND PLASMA APPARATUS FOR PROCESSING SUBSTRATES...

APPARATUS FOR MONITORING PROCESS CHAMBER

MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...

MICROWAVE PROBE, PLASMA MONITORING SYSTEM INCLUDING THE MICROWAVE P...

DIAGNOSIS SYSTEM FOR PULSED PLASMA

PULSE PLASMA APPARATUS AND DRIVE METHOD THEREOF

Plasma Processing Device

PLASMA GENERATING APPARATUS

Plasma generating device

Plasma processing apparatus and method thereof

Deposition Apparatus and Deposition Method Using the Same

Apparatus for HDP-CVD and method of forming insulating layer using...

Plasma etching apparatus and chamber cleaning method using the same

Plasma processing apparatus and method

Plasma processing apparatus and method thereof

PLASMA ETCHING METHOD AND APPARATUS