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Douglas H. Burns
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Saratoga, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma reactor with a multiple zone thermal control feed forward co...
Patent number
8,980,044
Issue date
Mar 17, 2015
BE Aerospace, Inc.
Paul Lukas Brillhart
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Method of cooling a wafer support at a uniform temperature in a cap...
Patent number
8,801,893
Issue date
Aug 12, 2014
BE Aerospace, Inc.
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with feed forward thermal control system using a the...
Patent number
8,608,900
Issue date
Dec 17, 2013
B/E Aerospace, Inc.
Douglas A. Buchberger
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Method of processing a workpiece in a plasma reactor using multiple...
Patent number
8,546,267
Issue date
Oct 1, 2013
B/E Aerospace, Inc.
Paul Lukas Brillhart
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Capacitively coupled plasma reactor having very agile wafer tempera...
Patent number
8,337,660
Issue date
Dec 25, 2012
B/E Aerospace, Inc.
Douglas A. Buchberger, Jr.
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of processing a workpiece in a plasma reactor using feed for...
Patent number
8,329,586
Issue date
Dec 11, 2012
Applied Materials, Inc.
Douglas A. Buchberger, Jr.
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Plasma reactor with wafer backside thermal loop, two-phase internal...
Patent number
8,221,580
Issue date
Jul 17, 2012
Applied Materials, Inc.
Douglas A. Buchberger, Jr.
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Capacitively coupled plasma reactor having very agile wafer tempera...
Patent number
8,157,951
Issue date
Apr 17, 2012
Applied Materials, Inc.
Douglas A. Buchberger, Jr.
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with feed forward thermal control system using a the...
Patent number
8,092,639
Issue date
Jan 10, 2012
Advanced Thermal Sciences Corporation
Douglas A. Buchberger, Jr.
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Capacitively coupled plasma reactor having a cooled/heated wafer su...
Patent number
8,092,638
Issue date
Jan 10, 2012
Applied Materials Inc.
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Methods to avoid unstable plasma states during a process transition
Patent number
8,048,806
Issue date
Nov 1, 2011
Applied Materials, Inc.
Michael C. Kutney
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of cooling a wafer support at a uniform temperature in a cap...
Patent number
8,034,180
Issue date
Oct 11, 2011
Applied Materials, Inc.
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for agile workpiece temperature control in a plasma reactor...
Patent number
8,021,521
Issue date
Sep 20, 2011
Applied Materials, Inc.
Douglas A. Buchberger, Jr.
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Balanced purge slit valve
Patent number
8,011,381
Issue date
Sep 6, 2011
Applied Material, Inc.
Jacob Newman
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Plasma reactor with a multiple zone thermal control feed forward co...
Patent number
8,012,304
Issue date
Sep 6, 2011
Applied Materials, Inc.
Paul Lukas Brillhart
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Grant
Method of operating a capacitively coupled plasma reactor with dual...
Patent number
7,988,872
Issue date
Aug 2, 2011
Applied Materials, Inc.
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for providing uniform plasma in a magnetic fie...
Patent number
7,374,636
Issue date
May 20, 2008
Applied Materials, Inc.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of feedback control of ESC voltage using wafer voltage measu...
Patent number
7,375,947
Issue date
May 20, 2008
Applied Materials, Inc.
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Dual bias frequency plasma reactor with feedback control of E.S.C....
Patent number
7,359,177
Issue date
Apr 15, 2008
Applied Materials, Inc.
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method and apparatus for controlling the magnetic field intensity i...
Patent number
7,316,199
Issue date
Jan 8, 2008
Applied Materials, Inc.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with overhead RF source power electrode having a res...
Patent number
7,141,757
Issue date
Nov 28, 2006
Applied Materials, Inc.
Daniel Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
ELECTROSTATIC CARRIER FOR DIE BONDING APPLICATIONS
Publication number
20180374736
Publication date
Dec 27, 2018
Applied Materials, Inc.
Niranjan KUMAR
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR CONTROLLING POWER DISTRIBUTION IN SUBSTRA...
Publication number
20130014894
Publication date
Jan 17, 2013
Applied Materials, Inc.
CANFENG LAI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR CONTROLLING POWER DISTRIBUTION IN SUBSTRA...
Publication number
20130017315
Publication date
Jan 17, 2013
Applied Materials, Inc.
CANFENG LAI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR USING MULTIPLE...
Publication number
20110068085
Publication date
Mar 24, 2011
Paul Lukas Brillhart
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
METHOD OF PROCESSING A WORKPIECE IN A PLASMA REACTOR USING FEED FOR...
Publication number
20110065279
Publication date
Mar 17, 2011
Douglas A. Buchberger, JR.
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
PLASMA REACTOR WITH FEED FORWARD THERMAL CONTROL SYSTEM USING A THE...
Publication number
20100319851
Publication date
Dec 23, 2010
Douglas A. Buchberger, JR.
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
CAPACITIVLEY COUPLED PLASMA REACTOR HAVING A COOLED/HEATED WAFER SU...
Publication number
20100319852
Publication date
Dec 23, 2010
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PLASMA REACTOR WITH A MULTIPLE ZONE THERMAL CONTROL FEED FORWARD CO...
Publication number
20100314046
Publication date
Dec 16, 2010
Paul Lukas Brillhart
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
CAPACITIVELY COUPLED PLASMA REACTOR HAVING VERY AGILE WAFER TEMPERA...
Publication number
20100303680
Publication date
Dec 2, 2010
Douglas A. Buchberger, JR.
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF COOLING A WAFER SUPPORT AT A UNIFORM TEMPERATURE IN A CAP...
Publication number
20100300621
Publication date
Dec 2, 2010
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
BALANCED PURGE SLIT VALVE
Publication number
20100084398
Publication date
Apr 8, 2010
Applied Materials, Inc.
JACOB NEWMAN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of controlling plasma distribution uniformity by superpositi...
Publication number
20090250335
Publication date
Oct 8, 2009
Daniel J. Hoffman
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information
Patent Application
Method of controlling plasma distribution uniformity by time-weight...
Publication number
20090250432
Publication date
Oct 8, 2009
Daniel J. Hoffman
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHOD OF FEEDBACK CONTROL OF ESC VOLTAGE USING WAFER VOLTAGE MEASU...
Publication number
20070127188
Publication date
Jun 7, 2007
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of cooling a wafer support at a uniform temperature in a cap...
Publication number
20070097580
Publication date
May 3, 2007
APPLIED MATERIALS, INC.
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with feed forward thermal control system using a the...
Publication number
20070091539
Publication date
Apr 26, 2007
APPLIED MATERIALS, INC.
Douglas A. Buchberger
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
Plasma reactor with wafer backside thermal loop, two-phase internal...
Publication number
20070091538
Publication date
Apr 26, 2007
Douglas A. Buchberger
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
Plasma reactor with a multiple zone thermal control feed forward co...
Publication number
20070089834
Publication date
Apr 26, 2007
APPLIED MATERIALS, INC.
Paul Lukas Brillhart
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
Method for agile workpiece temperature control in a plasma reactor...
Publication number
20070091537
Publication date
Apr 26, 2007
APPLIED MATERIALS, INC.
Douglas A. Buchberger
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
Method of processing a workpiece in a plasma reactor using multiple...
Publication number
20070091540
Publication date
Apr 26, 2007
APPLIED MATERIALS, INC.
Paul Lukas Brillhart
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
Method of processing a workpiece in a plasma reactor using feed for...
Publication number
20070091541
Publication date
Apr 26, 2007
APPLIED MATERIALS, INC.
Douglas A. Buchberger
F25 - REFRIGERATION OR COOLING COMBINED HEATING AND REFRIGERATION SYSTEMS HEA...
Information
Patent Application
Capacitively coupled plasma reactor having a cooled/heated wafer su...
Publication number
20070081295
Publication date
Apr 12, 2007
APPLIED MATERIALS, INC.
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of operating a capacitively coupled plasma reactor with dual...
Publication number
20070081296
Publication date
Apr 12, 2007
APPLIED MATERIALS, INC.
Paul Lukas Brillhart
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Capacitively coupled plasma reactor having very agile wafer tempera...
Publication number
20070081294
Publication date
Apr 12, 2007
APPLIED MATERIALS, INC.
Douglas A. Buchberger
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Methods to avoid unstable plasma states during a process transition
Publication number
20070066064
Publication date
Mar 22, 2007
Applied Materials, Inc.
Michael C. Kutney
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method to reduce plasma-induced charging damage
Publication number
20070048882
Publication date
Mar 1, 2007
APPLIED MATERIALS, INC.
Michael C. Kutney
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dual bias frequency plasma reactor with feedback control of E.S.C....
Publication number
20060256499
Publication date
Nov 16, 2006
Jang Gyoo Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with overhead RF source power electrode having a res...
Publication number
20040159287
Publication date
Aug 19, 2004
APPLIED MATERIALS, INC.
Daniel Hoffman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for controlling the magnetic field intensity i...
Publication number
20030085000
Publication date
May 8, 2003
APPLIED MATERIALS, INC.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method and apparatus for providing uniform plasma in a magnetic fie...
Publication number
20030006008
Publication date
Jan 9, 2003
APPLIED MATERIALS, INC.
Keiji Horioka
H01 - BASIC ELECTRIC ELEMENTS