Duan-Fu Stephen HSU

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of determining characteristic of patterning process based on...
- Patent number 12,092,963
- Issue date Sep 17, 2024
- ASML Netherlands B.V.
- Xingyue Peng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,977,334
- Issue date May 7, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging via zeroth order suppression
- Patent number 11,892,776
- Issue date Feb 6, 2024
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for patterning processes
- Patent number 11,886,124
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for diffraction pattern guided source mask opt...
- Patent number 11,846,889
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for high numerical aperture thru-slit source mask optimization
- Patent number 11,815,808
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for imaging using narrowed bandwidth
- Patent number 11,747,739
- Issue date Sep 5, 2023
- ASML Netherlands
- Willard Earl Conley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optimizing a patterning device pattern
- Patent number 11,681,849
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wavefront optimization for tuning scanner based on performance matc...
- Patent number 11,586,114
- Issue date Feb 21, 2023
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simulation of lithography using multiple-sampling of angular distri...
- Patent number 11,506,984
- Issue date Nov 22, 2022
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterning device, a method of making the same, and a patterning de...
- Patent number 11,487,198
- Issue date Nov 1, 2022
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for patterning processes
- Patent number 11,480,882
- Issue date Oct 25, 2022
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for patterning processes
- Patent number 11,137,690
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning device, a method of making the same, and a patterning de...
- Patent number 11,126,077
- Issue date Sep 21, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for source mask optimization configured to inc...
- Patent number 11,086,230
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Profile aware source-mask optimization
- Patent number 11,054,750
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rule-based deployment of assist features
- Patent number 11,022,894
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Binarization method and freeform mask optimization flow
- Patent number 10,990,003
- Issue date Apr 27, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimization of assist features and source
- Patent number 10,955,755
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mapping of patterns between design layout and patterning device
- Patent number 10,796,063
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Coloring aware optimization
- Patent number 10,670,973
- Issue date Jun 2, 2020
- ASML Netherlands B.V.
- Yi Zou
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Patterning devices for use within a lithographic apparatus, methods...
- Patent number 10,509,310
- Issue date Dec 17, 2019
- ASML Netherlands B.V.
- Frank Arnoldus Johannes Maria Driessen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for lithographic processes
- Patent number 10,459,346
- Issue date Oct 29, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization flows of source, mask and projection optics
- Patent number 10,401,732
- Issue date Sep 3, 2019
- ASML Netherlands B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image log slope (ILS) optimization
- Patent number 10,394,131
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern placement error aware optimization
- Patent number 10,386,727
- Issue date Aug 20, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rule-based deployment of assist features
- Patent number 10,331,039
- Issue date Jun 25, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of assist features and source
- Patent number 10,310,386
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Flows of optimization for lithographic processes
- Patent number 10,025,201
- Issue date Jul 17, 2018
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization flows of source, mask and projection optics
- Patent number 9,588,438
- Issue date Mar 7, 2017
- ASML Netherlands B.V.
- Duan-Fu Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...
- Publication number 20240319581
- Publication date Sep 26, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING VIA ZEROTH ORDER SUPPRESSION
- Publication number 20240219843
- Publication date Jul 4, 2024
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONFIGURATION OF PATTERNING PROCESS
- Publication number 20240119212
- Publication date Apr 11, 2024
- ASML NETHERLANDS B.V.
- Jung Hoon SER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE
- Publication number 20240045341
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...
- Publication number 20230333483
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20230161264
- Publication date May 25, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES
- Publication number 20230047402
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED...
- Publication number 20230010700
- Publication date Jan 12, 2023
- CYMER, LLC
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION USING A NON-UNIFORM ILLUMINATION INTENSITY PROFILE
- Publication number 20220390832
- Publication date Dec 8, 2022
- ASML Holding N.V.
- Janardan NATH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS
- Publication number 20220334493
- Publication date Oct 20, 2022
- ASML NETHERLANDS B.V.
- Jingjing LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR DIFFRACTION PATTERN GUIDED SOURCE MASK OPT...
- Publication number 20220179325
- Publication date Jun 9, 2022
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH
- Publication number 20220163899
- Publication date May 26, 2022
- ASML Nethlands B. V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION
- Publication number 20220066327
- Publication date Mar 3, 2022
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus BASELMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR HIGH NUMERICAL APERTURE THRU-SLIT SOURCE MASK OPTIMIZATION
- Publication number 20220050373
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Kars Zeger TROOST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES
- Publication number 20220011674
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE, A METHOD OF MAKING THE SAME, AND A PATTERNING DE...
- Publication number 20220004094
- Publication date Jan 6, 2022
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...
- Publication number 20210364929
- Publication date Nov 25, 2021
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...
- Publication number 20210349404
- Publication date Nov 11, 2021
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN
- Publication number 20210232748
- Publication date Jul 29, 2021
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BINARIZATION METHOD AND FREEFORM MASK OPTIMIZATION FLOW
- Publication number 20200363713
- Publication date Nov 19, 2020
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES
- Publication number 20200257204
- Publication date Aug 13, 2020
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR SOURCE MASK OPTIMIZATION CONFIGURED TO INC...
- Publication number 20200249578
- Publication date Aug 6, 2020
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICE, A METHOD OF MAKING THE SAME, AND A PATTERNING DE...
- Publication number 20200041891
- Publication date Feb 6, 2020
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RULE-BASED DEPLOYMENT OF ASSIST FEATURES
- Publication number 20190294053
- Publication date Sep 26, 2019
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF ASSIST FEATURES AND SOURCE
- Publication number 20190285991
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MAPPING OF PATTERNS BETWEEN DESIGN LAYOUT AND PATTERNING DEVICE
- Publication number 20190130060
- Publication date May 2, 2019
- ASML NETHERLANDS R.V
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES
- Publication number 20180341186
- Publication date Nov 29, 2018
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING DEVICES FOR USE WITHIN A LITHOGRAPHIC APPARATUS, METHODS...
- Publication number 20180120691
- Publication date May 3, 2018
- ASML NETHERLANDS B.V.
- Frank Arnoldus Johannes Maria DRIESSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SIMULATION OF LITHOGRAPHY USING MULTIPLE-SAMPLING OF ANGULAR DISTRI...
- Publication number 20180120709
- Publication date May 3, 2018
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMAGE LOG SLOPE (ILS) OPTIMIZATION
- Publication number 20180011407
- Publication date Jan 11, 2018
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Duan-Fu Stephen HSU

Person

Patents Grantslast 30 patents

Method of determining characteristic of patterning process based on...

Wavefront optimization for tuning scanner based on performance matc...

Imaging via zeroth order suppression

Flows of optimization for patterning processes

Method and apparatus for diffraction pattern guided source mask opt...

Method for high numerical aperture thru-slit source mask optimization

Method and apparatus for imaging using narrowed bandwidth

Method for optimizing a patterning device pattern

Wavefront optimization for tuning scanner based on performance matc...

Simulation of lithography using multiple-sampling of angular distri...

Patterning device, a method of making the same, and a patterning de...

Flows of optimization for patterning processes

Flows of optimization for patterning processes

Patterning device, a method of making the same, and a patterning de...

Method and apparatus for source mask optimization configured to inc...

Profile aware source-mask optimization

Rule-based deployment of assist features

Binarization method and freeform mask optimization flow

Optimization of assist features and source

Mapping of patterns between design layout and patterning device

Coloring aware optimization

Patterning devices for use within a lithographic apparatus, methods...

Flows of optimization for lithographic processes

Optimization flows of source, mask and projection optics

Image log slope (ILS) optimization

Pattern placement error aware optimization

Rule-based deployment of assist features

Optimization of assist features and source

Flows of optimization for lithographic processes

Optimization flows of source, mask and projection optics

Patents Applicationslast 30 patents

MATCH THE ABERRATION SENSITIVITY OF THE METROLOGY MARK AND THE DEVI...

IMAGING VIA ZEROTH ORDER SUPPRESSION

CONFIGURATION OF PATTERNING PROCESS

OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE

OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES

METHOD AND SYSTEM FOR ENHANCING TARGET FEATURES OF A PATTERN IMAGED...

OPTIMIZATION USING A NON-UNIFORM ILLUMINATION INTENSITY PROFILE

METHOD FOR DETERMINING ABERRATION SENSITIVITY OF PATTERNS

METHOD AND APPARATUS FOR DIFFRACTION PATTERN GUIDED SOURCE MASK OPT...

METHOD AND APPARATUS FOR IMAGING USING NARROWED BANDWIDTH

IMPROVED IMAGING VIA ZEROTH ORDER SUPPRESSION

METHOD FOR HIGH NUMERICAL APERTURE THRU-SLIT SOURCE MASK OPTIMIZATION

FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES

PATTERNING DEVICE, A METHOD OF MAKING THE SAME, AND A PATTERNING DE...

WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATC...

METHOD TO CREATE THE IDEAL SOURCE SPECTRA WITH SOURCE AND MASK OPTI...

METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN

BINARIZATION METHOD AND FREEFORM MASK OPTIMIZATION FLOW

FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES

METHOD AND APPARATUS FOR SOURCE MASK OPTIMIZATION CONFIGURED TO INC...

PATTERNING DEVICE, A METHOD OF MAKING THE SAME, AND A PATTERNING DE...

RULE-BASED DEPLOYMENT OF ASSIST FEATURES

OPTIMIZATION OF ASSIST FEATURES AND SOURCE

MAPPING OF PATTERNS BETWEEN DESIGN LAYOUT AND PATTERNING DEVICE

FLOWS OF OPTIMIZATION FOR LITHOGRAPHIC PROCESSES

PATTERNING DEVICES FOR USE WITHIN A LITHOGRAPHIC APPARATUS, METHODS...

SIMULATION OF LITHOGRAPHY USING MULTIPLE-SAMPLING OF ANGULAR DISTRI...

IMAGE LOG SLOPE (ILS) OPTIMIZATION