Eckehard D. Onkels

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,567,607
- Issue date Jul 28, 2009
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,218,661
- Issue date May 15, 2007
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,061,961
- Issue date Jun 13, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,058,107
- Issue date Jun 6, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Very narrow band, two chamber, high reprate gas discharge laser system
- Patent number 6,985,508
- Issue date Jan 10, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 6,801,560
- Issue date Oct 5, 2004
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Injection seeded F2 laser with pre-injection filter
- Patent number 6,765,945
- Issue date Jul 20, 2004
- Cymer, Inc.
- Richard L. Sandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High power gas discharge laser with line narrowing unit
- Patent number 6,735,236
- Issue date May 11, 2004
- Cymer, Inc.
- Raymond F. Cybulski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,625,191
- Issue date Sep 23, 2003
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Injection seeded F2 laser with line selection and discrimination
- Patent number 6,590,922
- Issue date Jul 8, 2003
- Cymer, Inc.
- Eckehard D. Onkels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,567,450
- Issue date May 20, 2003
- Cymer, Inc.
- David W. Myers
- G01 - MEASURING TESTING
Information Patent Grant
Discharge laser having electrodes with sputter cavities and dischar...
- Patent number 6,560,263
- Issue date May 6, 2003
- Cymer, Inc.
- Richard G. Morton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Injection seeded F2 laser with centerline wavelength control
- Patent number 6,556,600
- Issue date Apr 29, 2003
- Cymer, Inc.
- Richard L. Sandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra pure component purge system for gas discharge laser
- Patent number 6,539,042
- Issue date Mar 25, 2003
- Cymer, Inc.
- Shahryar Rokni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas discharge laser long life electrodes
- Patent number 6,466,602
- Issue date Oct 15, 2002
- Cymer, Inc.
- Vladimir B. Fleurov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Very narrow band injection seeded F2 lithography laser
- Patent number 6,381,257
- Issue date Apr 30, 2002
- Cymer, Inc.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Injection seeded F2 lithography laser
- Patent number 6,370,174
- Issue date Apr 9, 2002
- Cymer, Inc.
- Eckehard D. Onkels
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single chamber gas discharge laser with line narrowed seed beam
- Patent number 6,359,922
- Issue date Mar 19, 2002
- Cymer, Inc.
- William N. Partlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
F2 laser with visible red and IR control
- Patent number 6,330,260
- Issue date Dec 11, 2001
- Cymer, Inc.
- Eckehard D. Onkels
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electric discharge laser with acoustic chirp correction
- Patent number 6,317,447
- Issue date Nov 13, 2001
- Cymer, Inc.
- William N. Partlo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Publication number 20060126697
- Publication date Jun 15, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...
- Publication number 20050271109
- Publication date Dec 8, 2005
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040258122
- Publication date Dec 23, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040174919
- Publication date Sep 9, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Very narrow band, two chamber, high reprate gas discharge laser system
- Publication number 20040047385
- Publication date Mar 11, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Injection seeded F2 laser with wavelength control
- Publication number 20020186739
- Publication date Dec 12, 2002
- Richard L. Sandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Publication number 20020154668
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20020154671
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Injection seeded F2 laser with line selection and discrimination
- Publication number 20020114370
- Publication date Aug 22, 2002
- Eckehard D. Onkels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA PURE COMPONENT PURGE SYSTEM FOR GAS DISCHARGE LASER
- Publication number 20020105996
- Publication date Aug 8, 2002
- Shahryar Rokni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Injection seeded F2 laser with pre-injection filter
- Publication number 20020071468
- Publication date Jun 13, 2002
- Richard L. Sandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Injection seeded F2 laser with pre-injection filter
- Publication number 20020064202
- Publication date May 30, 2002
- Richard L. Sandstrom
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Publication number 20020044586
- Publication date Apr 18, 2002
- David W. Myers
- G01 - MEASURING TESTING
Information Patent Application
HIGH POWER GAS DISCHARGE LASER WITH LINE NARROWING UNIT
- Publication number 20020006147
- Publication date Jan 17, 2002
- RAYMOND F. CYBULSKI
- H01 - BASIC ELECTRIC ELEMENTS

Eckehard D. Onkels

Person

Patents Grantslast 30 patents

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

Line selected F2 two chamber laser system

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

Line selected F2 two chamber laser system

Very narrow band, two chamber, high reprate gas discharge laser system

Line selected F2 two chamber laser system

Injection seeded F2 laser with pre-injection filter

High power gas discharge laser with line narrowing unit

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Injection seeded F2 laser with line selection and discrimination

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Discharge laser having electrodes with sputter cavities and dischar...

Injection seeded F2 laser with centerline wavelength control

Ultra pure component purge system for gas discharge laser

Gas discharge laser long life electrodes

Very narrow band injection seeded F2 lithography laser

Injection seeded F2 lithography laser

Single chamber gas discharge laser with line narrowed seed beam

F2 laser with visible red and IR control

Electric discharge laser with acoustic chirp correction

Patents Applicationslast 30 patents

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...

Line selected F2 two chamber laser system

Line selected F2 two chamber laser system

Very narrow band, two chamber, high reprate gas discharge laser system

Injection seeded F2 laser with wavelength control

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Line selected F2 two chamber laser system

Injection seeded F2 laser with line selection and discrimination

ULTRA PURE COMPONENT PURGE SYSTEM FOR GAS DISCHARGE LASER

Injection seeded F2 laser with pre-injection filter

Injection seeded F2 laser with pre-injection filter

Very narrow band, two chamber, high rep rate gas discharge laser sy...

HIGH POWER GAS DISCHARGE LASER WITH LINE NARROWING UNIT