Edward Carmine Fredericks

Person

Hopewell Junction, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Sub-layer contact technique using in situ doped amorphous silicon a...
- Patent number 5,192,708
- Issue date Mar 9, 1993
- International Business Machines Corporation
- Klaus Beyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography imaging tool and related photolithographic processes
- Patent number 5,087,537
- Issue date Feb 11, 1992
- International Business Machines Corporation
- John F. Conway
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for improving resolution in microelectronic circuits using p...
- Patent number 4,745,045
- Issue date May 17, 1988
- International Business Machines Corporation
- Edward C. Fredericks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor contact protection
- Patent number 4,640,738
- Issue date Feb 3, 1987
- International Business Machines Corporation
- Edward C. Fredericks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-level resist image reversal lithography process
- Patent number 4,567,132
- Issue date Jan 28, 1986
- International Business Machines Corporation
- Edward C. Fredericks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist lift-off process for fabricating semiconductor devices
- Patent number 4,564,584
- Issue date Jan 14, 1986
- IBM Corporation
- Edward C. Fredericks
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming resist masks utilizing O-quinone diazide and py...
- Patent number 4,464,458
- Issue date Aug 7, 1984
- International Business Machines Corporation
- Ming-Fea Chow
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist image hardening process
- Patent number 4,125,650
- Issue date Nov 14, 1978
- International Business Machines Corporation
- George T. Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist mask formation process with haloalkyl methacrylate copolymers
- Patent number 4,096,290
- Issue date Jun 20, 1978
- International Business Machines Corporation
- Edward Carmine Fredericks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Edward Carmine Fredericks

Person

Patents Grantslast 30 patents

Sub-layer contact technique using in situ doped amorphous silicon a...

Lithography imaging tool and related photolithographic processes

Method for improving resolution in microelectronic circuits using p...

Semiconductor contact protection

Multi-level resist image reversal lithography process

Photoresist lift-off process for fabricating semiconductor devices

Process for forming resist masks utilizing O-quinone diazide and py...

Resist image hardening process

Resist mask formation process with haloalkyl methacrylate copolymers