Edward P. Hammond, IV

Person

Hillsborough, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma reactor with center-fed multiple zone gas distribution for i...
- Patent number 8,236,133
- Issue date Aug 7, 2012
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to control uniformity using tri-zone showerhead
- Patent number 8,066,895
- Issue date Nov 29, 2011
- Applied Materials, Inc.
- Rodolfo P. Belen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate profile control through effective frequency of dual HF/VHF sou...
- Patent number 8,017,526
- Issue date Sep 13, 2011
- Applied Materials, Inc.
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process using combined capacitively and inductively coupled plasma...
- Patent number 7,780,864
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual plasma source process using a variable frequency capacitively...
- Patent number 7,727,413
- Issue date Jun 1, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step process for forming a metal barrier in a sputter reactor
- Patent number 7,686,926
- Issue date Mar 30, 2010
- Applied Materials, Inc.
- Tza-Jing Gung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma process for inductively coupling power through a gas distrib...
- Patent number 7,674,394
- Issue date Mar 9, 2010
- Applied Materials, Inc.
- Alexander Paterson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor apparatus with a VHF capacitively coupled plasma sou...
- Patent number 7,645,357
- Issue date Jan 12, 2010
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor apparatus with independent capacitive and toroidal p...
- Patent number 7,264,688
- Issue date Sep 4, 2007
- Applied Materials, Inc.
- Alexander Paterson
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ANTI-ARC ZERO FIELD PLATE
- Publication number 20110197814
- Publication date Aug 18, 2011
- Applied Materials, Inc.
- JONGHOON BAEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Phase-Modulated RF Power for Plasma Chamber Electrode
- Publication number 20110192349
- Publication date Aug 11, 2011
- Edward P. Hammond, IV
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electromagnet array in a sputter reactor
- Publication number 20100155223
- Publication date Jun 24, 2010
- Applied Materials, Inc.
- Tza-Jing GUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...
- Publication number 20090275206
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR WITH CENTER-FED MULTIPLE ZONE GAS DISTRIBUTION FOR I...
- Publication number 20090272492
- Publication date Nov 5, 2009
- Applied Materials, Inc.
- Dan Katz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER
- Publication number 20090236447
- Publication date Sep 24, 2009
- Applied Materials, Inc.
- THEODOROS PANAGOPOULOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...
- Publication number 20090221150
- Publication date Sep 3, 2009
- Applied Materials, Inc.
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO CONTROL UNIFORMITY USING TRI-ZONE SHOWERHEAD
- Publication number 20090218317
- Publication date Sep 3, 2009
- RODOLFO P. BELEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIPLE PORT GAS INJECTION SYSTEM UTILIZED IN A SEMICONDUCTOR PROC...
- Publication number 20090221149
- Publication date Sep 3, 2009
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of controlling CD bias and CD microloading by changing the c...
- Publication number 20090156011
- Publication date Jun 18, 2009
- Rodolfo P. Belen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate profile control through effective frequency of dual HF/VHF sou...
- Publication number 20090142930
- Publication date Jun 4, 2009
- Edward P. Hammond, IV
- H01 - BASIC ELECTRIC ELEMENTS

Edward P. Hammond, IV

Person

Patents Grantslast 30 patents

Plasma reactor with center-fed multiple zone gas distribution for i...

Method to control uniformity using tri-zone showerhead

Gate profile control through effective frequency of dual HF/VHF sou...

Process using combined capacitively and inductively coupled plasma...

Dual plasma source process using a variable frequency capacitively...

Multi-step process for forming a metal barrier in a sputter reactor

Plasma process for inductively coupling power through a gas distrib...

Plasma reactor apparatus with a VHF capacitively coupled plasma sou...

Plasma reactor apparatus with independent capacitive and toroidal p...

Patents Applicationslast 30 patents

ANTI-ARC ZERO FIELD PLATE

Phase-Modulated RF Power for Plasma Chamber Electrode

Electromagnet array in a sputter reactor

PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVE...

PLASMA REACTOR WITH CENTER-FED MULTIPLE ZONE GAS DISTRIBUTION FOR I...

METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER

ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS R...

METHOD TO CONTROL UNIFORMITY USING TRI-ZONE SHOWERHEAD

MULTIPLE PORT GAS INJECTION SYSTEM UTILIZED IN A SEMICONDUCTOR PROC...

Method of controlling CD bias and CD microloading by changing the c...

Gate profile control through effective frequency of dual HF/VHF sou...