Emad Aqad

Person

Northborough, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoacid generators, photoresist compositions, and pattern formati...
- Patent number 12,140,866
- Issue date Nov 12, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
- Patent number 11,947,258
- Issue date Apr 2, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomers, polymers and lithographic compositions comprising same
- Patent number 11,932,713
- Issue date Mar 19, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,880,134
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,852,972
- Issue date Dec 26, 2023
- Rohm and Haas Electronic Materials LLC
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoacid-generating monomer, polymer derived therefrom, photoresis...
- Patent number 11,613,519
- Issue date Mar 28, 2023
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating composition for use with an overcoated photoresist
- Patent number 11,567,408
- Issue date Jan 31, 2023
- Rohm and Haas Electronic Materials Korea Ltd.
- Hye-Won Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,550,217
- Issue date Jan 10, 2023
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Zwitterion compounds and photoresists comprising same
- Patent number 11,505,565
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,448,960
- Issue date Sep 20, 2022
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for forming pattern using antireflective coating composition...
- Patent number 11,269,252
- Issue date Mar 8, 2022
- Rohm and Haas Electronic Materials LLC
- Jung-June Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Iodine-containing polymers for chemically amplified resist composit...
- Patent number 10,901,316
- Issue date Jan 26, 2021
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Iodine-containing photoacid generators and compositions comprising...
- Patent number 10,831,100
- Issue date Nov 10, 2020
- Rohm and Haas Electronic Materials, LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cholate photoacid generators and photoresists comprising same
- Patent number 10,809,616
- Issue date Oct 20, 2020
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymers and photoresist compositions
- Patent number 10,670,965
- Issue date Jun 2, 2020
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator
- Patent number 10,509,315
- Issue date Dec 17, 2019
- Rohm and Haas Electronic Materials, LLC
- William Williams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Iodine-containing polymers for chemically amplified resist composit...
- Patent number 10,495,968
- Issue date Dec 3, 2019
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator
- Patent number 10,317,795
- Issue date Jun 11, 2019
- Rohm and Haas Electronic Materials LLC
- William Williams
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Acid-cleavable monomer and polymers including the same
- Patent number 10,095,109
- Issue date Oct 9, 2018
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoacid-generating compound and associated polymer, photoresist c...
- Patent number 10,088,749
- Issue date Oct 2, 2018
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid-generating compound, polymer derived therefrom, photoresi...
- Patent number 9,921,475
- Issue date Mar 20, 2018
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resins for underlayers
- Patent number 9,880,469
- Issue date Jan 30, 2018
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lactone photoacid generators and resins and photoresists comprising...
- Patent number 9,720,321
- Issue date Aug 1, 2017
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cholate photoacid generators and photoresists comprising same
- Patent number 9,671,689
- Issue date Jun 6, 2017
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic resins for underlayers
- Patent number 9,601,325
- Issue date Mar 21, 2017
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of forming electronic devices including filling porous feat...
- Patent number 9,508,549
- Issue date Nov 29, 2016
- Dow Global Technologies LLC
- Jong Keun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition
- Patent number 9,507,259
- Issue date Nov 29, 2016
- Rohm and Haas Electronic Materials LLC
- Mingqi Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generators and photoresists comprising same
- Patent number 9,348,220
- Issue date May 24, 2016
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...
- Publication number 20240393689
- Publication date Nov 28, 2024
- DuPont Electronic Materials International, LLC
- Li Cui
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
- Publication number 20240337946
- Publication date Oct 10, 2024
- DuPont Electronic Materials International, LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...
- Publication number 20240241441
- Publication date Jul 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...
- Publication number 20240241440
- Publication date Jul 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...
- Publication number 20240184201
- Publication date Jun 6, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Conner A. Hoelzel
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
- Publication number 20240027904
- Publication date Jan 25, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20240027905
- Publication date Jan 25, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME
- Publication number 20240019779
- Publication date Jan 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Li Cui
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...
- Publication number 20230314934
- Publication date Oct 5, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230213862
- Publication date Jul 6, 2023
- ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Li Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...
- Publication number 20230212112
- Publication date Jul 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IODINE-CONTAINING ACID CLEAVABLE COMPOUNDS, POLYMERS DERIVED THEREF...
- Publication number 20230103685
- Publication date Apr 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST...
- Publication number 20230094313
- Publication date Mar 30, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...
- Publication number 20220214614
- Publication date Jul 7, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220137506
- Publication date May 5, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220091506
- Publication date Mar 24, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Ke Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
- Publication number 20220066321
- Publication date Mar 3, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20220019143
- Publication date Jan 20, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20210200084
- Publication date Jul 1, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Jong Keun Park
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS AND PHOTORESIST COMPOSITIONS
- Publication number 20210108065
- Publication date Apr 15, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Yang SONG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST
- Publication number 20210109447
- Publication date Apr 15, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Hye-Won Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION...
- Publication number 20210026242
- Publication date Jan 28, 2021
- Rohm and Haas Electronic Materials Korea Ltd.
- Jung-June Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20200377713
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...
- Publication number 20200356001
- Publication date Nov 12, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING PATTERNS WITH...
- Publication number 20200348592
- Publication date Nov 5, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Joshua Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...
- Publication number 20200218149
- Publication date Jul 9, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORES...
- Publication number 20200209743
- Publication date Jul 2, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMERIC CHARGE TRANSFER LAYER AND ORGANIC ELECTRONIC DEVICE COMPR...
- Publication number 20200066993
- Publication date Feb 27, 2020
- DOW GLOBAL TECHNOLOGIES LLC
- Yang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOACID GENERATOR
- Publication number 20190243239
- Publication date Aug 8, 2019
- Rohm and Haas Electronic Materials L.L.C.
- William Williams
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PROCESS FOR MAKING AN ORGANIC CHARGE TRANSPORTING FILM
- Publication number 20190202975
- Publication date Jul 4, 2019
- DOW GLOBAL TECHNOLOGIES LLC
- Chun LIU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Person

Patents Grantslast 30 patents

Photoacid generators, photoresist compositions, and pattern formati...

Photoresist composition, coated substrate including the photoresist...

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Monomers, polymers and lithographic compositions comprising same

Salts and photoresists comprising same

Photoresist compositions and pattern formation methods

Photoresist compositions and methods

Photoacid-generating monomer, polymer derived therefrom, photoresis...

Coating composition for use with an overcoated photoresist

Photoresist composition, coated substrate including the photoresist...

Zwitterion compounds and photoresists comprising same

Salts and photoresists comprising same

Method for forming pattern using antireflective coating composition...

Iodine-containing polymers for chemically amplified resist composit...

Iodine-containing photoacid generators and compositions comprising...

Cholate photoacid generators and photoresists comprising same

Polymers and photoresist compositions

Photoacid generator

Iodine-containing polymers for chemically amplified resist composit...

Photoacid generator

Acid-cleavable monomer and polymers including the same

Photoacid-generating compound and associated polymer, photoresist c...

Photoacid-generating compound, polymer derived therefrom, photoresi...

Resins for underlayers

Lactone photoacid generators and resins and photoresists comprising...

Cholate photoacid generators and photoresists comprising same

Aromatic resins for underlayers

Methods of forming electronic devices including filling porous feat...

Photoresist composition

Photoacid generators and photoresists comprising same

Patents Applicationslast 30 patents

COMPOUNDS, MONOMERS, POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN...

UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...

POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...

POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN F...

PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...

COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME

PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME,...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIS...

IODINE-CONTAINING ACID CLEAVABLE COMPOUNDS, POLYMERS DERIVED THEREF...

PHOTORESIST COMPOSITION, COATED SUBSTRATE INCLUDING THE PHOTORESIST...

PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATI...

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

POLYMERS AND PHOTORESIST COMPOSITIONS

POLYMERS AND PHOTORESIST COMPOSITIONS

COATING COMPOSITION FOR USE WITH AN OVERCOATED PHOTORESIST

METHOD FOR FORMING PATTERN USING ANTIREFLECTIVE COATING COMPOSITION...

POLYMERS, PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...

RESIST UNDERLAYER COMPOSITIONS AND METHODS OF FORMING PATTERNS WITH...

IODINE-CONTAINING POLYMERS FOR CHEMICALLY AMPLIFIED RESIST COMPOSIT...

COMPOSITION FOR PREPARING THICK FILM PHOTOREST, THICK FILM PHOTORES...

POLYMERIC CHARGE TRANSFER LAYER AND ORGANIC ELECTRONIC DEVICE COMPR...

PHOTOACID GENERATOR

PROCESS FOR MAKING AN ORGANIC CHARGE TRANSPORTING FILM