Eric Charles MATTSON

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Ribbon or wire transistor stack with selective dipole threshold vol...
- Patent number 12,183,739
- Issue date Dec 31, 2024
- Intel Corporation
- Nicole Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Halogen treatment for NMOS contact resistance improvement
- Patent number 11,923,290
- Issue date Mar 5, 2024
- Intel Corporation
- Siddharth Chouksey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer high-k gate dielectric for a high performance logic tran...
- Patent number 11,742,407
- Issue date Aug 29, 2023
- Intel Corporation
- Seung Hoon Sung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS AND APPARATUS TO MODIFY CARBIDE SURFACES IN SEMICONDUCTOR D...
- Publication number 20250218778
- Publication date Jul 3, 2025
- Intel Corporation
- Robert Stanley Jordan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Temperature Deposition of Hydrogen-Free Diamond-Like Carbon Films
- Publication number 20250140543
- Publication date May 1, 2025
- Intel Corporation
- Ilya KARPOV
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RIBBON OR WIRE TRANSISTOR STACK WITH SELECTIVE DIPOLE THRESHOLD VOL...
- Publication number 20250133822
- Publication date Apr 24, 2025
- Intel Corporation
- Nicole Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY
- Publication number 20250110408
- Publication date Apr 3, 2025
- Intel Corporation
- Robert JORDAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST
- Publication number 20240201586
- Publication date Jun 20, 2024
- Intel Corporation
- James Blackwell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STACKED TRANSISTOR STRUCTURES WITH DIVERSE GATE MATERIALS
- Publication number 20230197728
- Publication date Jun 22, 2023
- Intel Corporation
- Nicole K. Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHITIC CARBON CONTACTS FOR DEVICES WITH OXIDE CHANNELS
- Publication number 20230102219
- Publication date Mar 30, 2023
- Intel Corporation
- Arnab Sen Gupta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RIBBON OR WIRE TRANSISTOR STACK WITH SELECTIVE DIPOLE THRESHOLD VOL...
- Publication number 20220199620
- Publication date Jun 23, 2022
- Intel Corporation
- Nicole Thomas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALOGEN TREATMENT FOR NMOS CONTACT RESISTANCE IMPROVEMENT
- Publication number 20210407902
- Publication date Dec 30, 2021
- Intel Corporation
- Siddharth CHOUKSEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER HIGH-K GATE DIELECTRIC FOR A HIGH PERFORMANCE LOGIC TRAN...
- Publication number 20210167182
- Publication date Jun 3, 2021
- Intel Corporation
- Seung Hoon SUNG
- H01 - BASIC ELECTRIC ELEMENTS

Eric Charles MATTSON

Person

Patents Grantslast 30 patents

Ribbon or wire transistor stack with selective dipole threshold vol...

Halogen treatment for NMOS contact resistance improvement

Multilayer high-k gate dielectric for a high performance logic tran...

Patents Applicationslast 30 patents

METHODS AND APPARATUS TO MODIFY CARBIDE SURFACES IN SEMICONDUCTOR D...

Low Temperature Deposition of Hydrogen-Free Diamond-Like Carbon Films

RIBBON OR WIRE TRANSISTOR STACK WITH SELECTIVE DIPOLE THRESHOLD VOL...

SWITCHABLE UNDERLAYERS FOR EUV LITHOGRAPHY

PRECURSORS AND METHODS FOR PRODUCING TIN-BASED PHOTORESIST

STACKED TRANSISTOR STRUCTURES WITH DIVERSE GATE MATERIALS

GRAPHITIC CARBON CONTACTS FOR DEVICES WITH OXIDE CHANNELS

RIBBON OR WIRE TRANSISTOR STACK WITH SELECTIVE DIPOLE THRESHOLD VOL...

HALOGEN TREATMENT FOR NMOS CONTACT RESISTANCE IMPROVEMENT

MULTILAYER HIGH-K GATE DIELECTRIC FOR A HIGH PERFORMANCE LOGIC TRAN...