Ernisse Putna

Person

Beaverton, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Exposure activated chemically amplified directed self-assembly (DSA...
- Patent number 9,625,815
- Issue date Apr 18, 2017
- Intel Corporation
- Paul A. Nyhus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical coatings
- Patent number 7,687,225
- Issue date Mar 30, 2010
- Intel Corporation
- Sergei V. Koveshnikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and compositions for providing photoresist with improved pr...
- Patent number 7,678,527
- Issue date Mar 16, 2010
- Intel Corporation
- Robert P Meagley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon based optically degraded arc for lithographic patterning
- Patent number 7,507,521
- Issue date Mar 24, 2009
- Intel Corporation
- Kyle Y. Flanigan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Immersion liquids with siloxane polymer for immersion lithography
- Patent number 7,391,501
- Issue date Jun 24, 2008
- Intel Corporation
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Anti-reflective coatings
- Patent number 7,361,455
- Issue date Apr 22, 2008
- Intel Corporation
- Shan C. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Basic quencher/developer solutions for photoresists
- Patent number 7,241,560
- Issue date Jul 10, 2007
- Intel Corporation
- Shan C. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist compounds including acid labile groups having hydrophilic gr...
- Patent number 7,147,985
- Issue date Dec 12, 2006
- Intel Corporation
- Wang Yueh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA...
- Publication number 20170207116
- Publication date Jul 20, 2017
- Intel Corporation
- Paul A. Nyhus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA...
- Publication number 20150093702
- Publication date Apr 2, 2015
- Paul A. Nyhus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrically reconfigurable photolithography mask for semiconductor...
- Publication number 20060147845
- Publication date Jul 6, 2006
- Kyle Y. Flanigan
- G02 - OPTICS
Information Patent Application
Generating nano-particles for chemical mechanical planarization
- Publication number 20060090692
- Publication date May 4, 2006
- Juan E. Dominguez
- B82 - NANO-TECHNOLOGY
Information Patent Application
Optical coatings
- Publication number 20060073424
- Publication date Apr 6, 2006
- Sergei V. Koveshnikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon based optically degraded arc for lithographic patterning
- Publication number 20060029879
- Publication date Feb 9, 2006
- Kyle Y. Flanigan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Basic quencher/developer solutions for photoresists
- Publication number 20060024616
- Publication date Feb 2, 2006
- Shan C. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Basic supercritical solutions for quenching and developing photores...
- Publication number 20060003271
- Publication date Jan 5, 2006
- Shan C Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist compounds including acid labile groups having hydrophilic gr...
- Publication number 20050221217
- Publication date Oct 6, 2005
- Intel Corporation
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel anti-reflective coatings
- Publication number 20050221218
- Publication date Oct 6, 2005
- Shan C. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Immersion liquids for immersion lithography
- Publication number 20050164502
- Publication date Jul 28, 2005
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reducing outgassing of reactive material upon exposure of photolith...
- Publication number 20050158654
- Publication date Jul 21, 2005
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and compositions for providing photoresist with improved pr...
- Publication number 20050084794
- Publication date Apr 21, 2005
- Robert P. Meagley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Quantum efficient photoacid generators for photolithographic processes
- Publication number 20050058933
- Publication date Mar 17, 2005
- Robert P. Meagley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ernisse Putna

Person

Patents Grantslast 30 patents

Exposure activated chemically amplified directed self-assembly (DSA...

Optical coatings

Methods and compositions for providing photoresist with improved pr...

Silicon based optically degraded arc for lithographic patterning

Immersion liquids with siloxane polymer for immersion lithography

Anti-reflective coatings

Basic quencher/developer solutions for photoresists

Resist compounds including acid labile groups having hydrophilic gr...

Patents Applicationslast 30 patents

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA...

EXPOSURE ACTIVATED CHEMICALLY AMPLIFIED DIRECTED SELF-ASSEMBLY (DSA...

Electrically reconfigurable photolithography mask for semiconductor...

Generating nano-particles for chemical mechanical planarization

Optical coatings

Silicon based optically degraded arc for lithographic patterning

Basic quencher/developer solutions for photoresists

Basic supercritical solutions for quenching and developing photores...

Resist compounds including acid labile groups having hydrophilic gr...

Novel anti-reflective coatings

Immersion liquids for immersion lithography

Reducing outgassing of reactive material upon exposure of photolith...

Methods and compositions for providing photoresist with improved pr...

Quantum efficient photoacid generators for photolithographic processes