Farhad Moghadam

Person

Saratoga, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Cost effective radio frequency impedance matching networks
- Patent number 12,136,537
- Issue date Nov 5, 2024
- Applied Materials, Inc.
- Yue Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power source operation in plasma enhanced processes
- Patent number 11,631,583
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Farhad Moghadam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,799,698
- Issue date Sep 21, 2010
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,691,753
- Issue date Apr 6, 2010
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 7,560,377
- Issue date Jul 14, 2009
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Contact metallization scheme using a barrier layer over a silicide...
- Patent number 7,514,353
- Issue date Apr 7, 2009
- Applied Materials, Inc.
- Timothy W. Weidman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for heating substrates
- Patent number 7,431,585
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Jun Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sequential gas flow oxide deposition technique
- Patent number 7,399,388
- Issue date Jul 15, 2008
- Applied Materials, Inc.
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for heating substrates
- Patent number 7,381,052
- Issue date Jun 3, 2008
- Applied Materials, Inc.
- Jun Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for e-beam treatment used to fabricate integr...
- Patent number 7,256,139
- Issue date Aug 14, 2007
- Applied Materials, Inc.
- Farhad Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated low k dielectrics and etch stops
- Patent number 7,227,244
- Issue date Jun 5, 2007
- Applied Materials, Inc.
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing low k films
- Patent number 7,160,821
- Issue date Jan 9, 2007
- Applied Materials, Inc.
- Tzu-Fang Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing dielectric materials including oxygen-doped si...
- Patent number 7,151,053
- Issue date Dec 19, 2006
- Applied Materials, Inc.
- Ju-Hyung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition process for high aspect ratio trenches
- Patent number 7,097,886
- Issue date Aug 29, 2006
- Applied Materials, Inc.
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition-selective etch-deposition process for dielectric film ga...
- Patent number 7,081,414
- Issue date Jul 25, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...
- Patent number 6,958,112
- Issue date Oct 25, 2005
- Applied Materials, Inc.
- M. Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for E-beam treatment used to fabricate integr...
- Patent number 6,936,551
- Issue date Aug 30, 2005
- Applied Materials Inc.
- Farhad Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,930,061
- Issue date Aug 16, 2005
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon carbide deposited by high density plasma chemical-vapor dep...
- Patent number 6,926,926
- Issue date Aug 9, 2005
- Applied Materials, Inc.
- Seon-Mee Cho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing dielectric materials in damascene applications
- Patent number 6,890,850
- Issue date May 10, 2005
- Applied Materials, Inc.
- Ju-Hyung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,869,896
- Issue date Mar 22, 2005
- Applied Materials, Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated low K dielectrics and etch stops
- Patent number 6,858,153
- Issue date Feb 22, 2005
- Applied Materials Inc.
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing low K films
- Patent number 6,806,207
- Issue date Oct 19, 2004
- Applied Materials Inc.
- Tzu-Fang Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for improving barrier layer adhesion to HDP-FSG thin films
- Patent number 6,803,325
- Issue date Oct 12, 2004
- Applied Materials Inc.
- Hichem M'Saad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of improving moisture resistance of low dielectric constant...
- Patent number 6,743,737
- Issue date Jun 1, 2004
- Applied Materials, Inc.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,734,115
- Issue date May 11, 2004
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable dual frequency voltage dividing plasma reactor
- Patent number 6,706,138
- Issue date Mar 16, 2004
- Applied Materials Inc.
- Michael S. Barnes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated low k dielectrics and etch stops
- Patent number 6,669,858
- Issue date Dec 30, 2003
- Applied Materials Inc.
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-bias-deposited high-density-plasma chemical-vapor-deposition si...
- Patent number 6,667,248
- Issue date Dec 23, 2003
- Applied Materials Inc.
- Hichem M'Saad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processes for depositing low dielectric constant films
- Patent number 6,660,656
- Issue date Dec 9, 2003
- Applied Materials Inc.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALG...
- Publication number 20240152114
- Publication date May 9, 2024
- Applied Materials, Inc.
- Yue GUO
- G05 - CONTROLLING REGULATING
Information Patent Application
SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS
- Publication number 20240145230
- Publication date May 2, 2024
- Applied Materials, Inc.
- Abhishek Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COST EFFECTIVE RADIO FREQUENCY IMPEDANCE MATCHING NETWORKS
- Publication number 20240120178
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Power Source Operation In Plasma Enhanced Processes
- Publication number 20210125820
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Farhad Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR E-BEAM TREATMENT USED TO FABRICATE INTEGR...
- Publication number 20070275569
- Publication date Nov 29, 2007
- Farhad Moghadam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...
- Publication number 20060286764
- Publication date Dec 21, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact metallization scheme using a barrier layer over a silicide...
- Publication number 20060251800
- Publication date Nov 9, 2006
- Timothy W. Weidman
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...
- Publication number 20060228886
- Publication date Oct 12, 2006
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for heating substrates
- Publication number 20060223233
- Publication date Oct 5, 2006
- Applied Materials, Inc.
- Jun Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of depositing low k films
- Publication number 20050260864
- Publication date Nov 24, 2005
- APPLIED MATERIALS, INC.
- Tzu-Fang Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of depositing dielectric materials in damascene applications
- Publication number 20050233576
- Publication date Oct 20, 2005
- Ju-Hyung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20050191846
- Publication date Sep 1, 2005
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and apparatus for selectively changing thin film composition...
- Publication number 20050181226
- Publication date Aug 18, 2005
- APPLIED MATERIALS, INC.
- Timothy W. Weidman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and apparatus for e-beam treatment used to fabricate integr...
- Publication number 20050130404
- Publication date Jun 16, 2005
- APPLIED MATERIALS, INC.
- Farhad Moghadam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Integrated low k dielectrics and etch stops
- Publication number 20050023694
- Publication date Feb 3, 2005
- Claes H. Bjorkman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sequential gas flow oxide deposition technique
- Publication number 20050019494
- Publication date Jan 27, 2005
- APPLIED MATERIALS, INC., A Delaware corporation
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
[DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM G...
- Publication number 20040251236
- Publication date Dec 16, 2004
- Applied Materials, Inc.
- Lin Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...
- Publication number 20040241342
- Publication date Dec 2, 2004
- Applied Materials, Inc.
- M. Ziaul Karim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition process for high aspect ratio trenches
- Publication number 20040115898
- Publication date Jun 17, 2004
- Applied Materials, Inc.
- Farhad K. Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20040082199
- Publication date Apr 29, 2004
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cluster tool for E-beam treated films
- Publication number 20040069410
- Publication date Apr 15, 2004
- Farhad Moghadam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20040038545
- Publication date Feb 26, 2004
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process and an integrated tool for low k dielectric deposition incl...
- Publication number 20040020601
- Publication date Feb 5, 2004
- Applied Materials, Inc.
- Jun Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compact and high throughput semiconductor fabrication system
- Publication number 20040018070
- Publication date Jan 29, 2004
- Applied Materials, Inc.
- Jun Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and apparatus for E-beam treatment used to fabricate integr...
- Publication number 20030232495
- Publication date Dec 18, 2003
- Farhad Moghadam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of depositing low K films
- Publication number 20030162410
- Publication date Aug 28, 2003
- APPLIED MATERIALS, INC.
- Tzu-Fang Huang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Apparatus and method for heating substrates
- Publication number 20030138560
- Publication date Jul 24, 2003
- Applied Materials, Inc.
- Jun Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of depositing dielectric materials in damascene applications
- Publication number 20030129827
- Publication date Jul 10, 2003
- APPLIED MATERIALS, INC.
- Ju-Hyung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processes for depositing low dielectric constant films
- Publication number 20030064610
- Publication date Apr 3, 2003
- APPLIED MATERIALS, INC.
- David Cheung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of improving moisture resistance of low dielectric constant...
- Publication number 20030054667
- Publication date Mar 20, 2003
- APPLIED MATERIALS, INC.
- Wai-Fan Yau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Farhad Moghadam

Person

Patents Grantslast 30 patents

Cost effective radio frequency impedance matching networks

RF power source operation in plasma enhanced processes

Deposition-selective etch-deposition process for dielectric film ga...

Deposition-selective etch-deposition process for dielectric film ga...

Plasma processes for depositing low dielectric constant films

Contact metallization scheme using a barrier layer over a silicide...

Apparatus and method for heating substrates

Sequential gas flow oxide deposition technique

Apparatus and method for heating substrates

Methods and apparatus for e-beam treatment used to fabricate integr...

Integrated low k dielectrics and etch stops

Method of depositing low k films

Method of depositing dielectric materials including oxygen-doped si...

Deposition process for high aspect ratio trenches

Deposition-selective etch-deposition process for dielectric film ga...

Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...

Methods and apparatus for E-beam treatment used to fabricate integr...

Plasma processes for depositing low dielectric constant films

Silicon carbide deposited by high density plasma chemical-vapor dep...

Method of depositing dielectric materials in damascene applications

Plasma processes for depositing low dielectric constant films

Integrated low K dielectrics and etch stops

Method of depositing low K films

Apparatus for improving barrier layer adhesion to HDP-FSG thin films

Method of improving moisture resistance of low dielectric constant...

Plasma processes for depositing low dielectric constant films

Adjustable dual frequency voltage dividing plasma reactor

Integrated low k dielectrics and etch stops

Low-bias-deposited high-density-plasma chemical-vapor-deposition si...

Plasma processes for depositing low dielectric constant films

Patents Applicationslast 30 patents

RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALG...

SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS

COST EFFECTIVE RADIO FREQUENCY IMPEDANCE MATCHING NETWORKS

RF Power Source Operation In Plasma Enhanced Processes

METHODS AND APPARATUS FOR E-BEAM TREATMENT USED TO FABRICATE INTEGR...

DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...

Contact metallization scheme using a barrier layer over a silicide...

DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM GA...

Apparatus and method for heating substrates

Method of depositing low k films

Method of depositing dielectric materials in damascene applications

Plasma processes for depositing low dielectric constant films

Method and apparatus for selectively changing thin film composition...

Methods and apparatus for e-beam treatment used to fabricate integr...

Integrated low k dielectrics and etch stops

Sequential gas flow oxide deposition technique

[DEPOSITION-SELECTIVE ETCH-DEPOSITION PROCESS FOR DIELECTRIC FILM G...

Methods and systems for high-aspect-ratio gapfill using atomic-oxyg...

Deposition process for high aspect ratio trenches

Plasma processes for depositing low dielectric constant films

Cluster tool for E-beam treated films

Plasma processes for depositing low dielectric constant films

Process and an integrated tool for low k dielectric deposition incl...

Compact and high throughput semiconductor fabrication system

Methods and apparatus for E-beam treatment used to fabricate integr...

Method of depositing low K films

Apparatus and method for heating substrates

Method of depositing dielectric materials in damascene applications

Plasma processes for depositing low dielectric constant films

Method of improving moisture resistance of low dielectric constant...